Metal compound chemically anchored colloidal particles and methods of production and use thereof
Metal compound chemically anchored colloidal particles wherein the metal compound is in molecular form are disclosed. A facile and fast process to chemically anchor metal compounds uniformly onto colloidal particle surfaces via chemical bonding has been developed. Metal compounds are chemically anchored to the surface of colloidal particles via an organic linking agent. Uniformly distributed metal compounds remain in molecular form after the process. The metal compound chemically anchored colloidal particles can be used as solid catalyst in metal chemical-mechanical planarization process.
1. A polishing composition comprising:
0.01-1.00 wt. % metal compound chemically anchored colloidal particles,
wherein the metal compound is uniformly anchored on surfaces of colloidal particles via chemical bonding and is in molecular form;
0-10 wt. % abrasive;
0.05-10 wt. % oxidizer; and
liquid carrier;
wherein
pH of the composition is from about 2.0 to about 12;
the metal compound is selected from the groups consisting of iron salt, cerium salt, and combinations thereof;
and
the metal compound is uniformly anchored on surfaces of colloidal particles through an organic linking agent having a general molecular structure selected from the group consisting of
and combinations thereof;
wherein n, m, p, q are the numbers of methylene (—CH 2 —) groups, and each is independently selected from a number from 1 to 12.
2. The polishing composition of claim 1 , wherein
the colloidal particles are selected from the group consisting of silica particles, lattice doped silica particles, germania particles, alumina particles, lattice doped alumina particles, titania particles, zirconium oxide particles, ceria particles, organic polymeric particles, and combinations thereof; and size of colloidal particle ranges between 5-1000 nm.
3. The polishing composition of claim 1 , wherein the metal compound chemically anchored colloidal particles are iron compound chemically anchored colloidal silica particles.
4. The polishing composition of claim 1 , wherein the abrasive is selected from the group consisting of silica, alumina, titania, ceria, zirconia, nano-sized diamond particles, nano-sized silicon nitride particles, mono-modal, bi-modal, multi-modal colloidal abrasive particles, organic polymer-based soft abrasives, surface-coated or modified abrasives, and combinations thereof.
5. The polishing composition of claim 1 , wherein the oxidizer is selected from the group consisting of hydrogen peroxide and other per-oxy compounds, periodic acid, potassium iodate, potassium permanganate, ammonium persulfate, ammonium molybdate, ferric nitrate, nitric acid, potassium nitrate, and combinations thereof.
6. The polishing composition of claim 1 , wherein the polishing composition comprising iron compound chemically anchored colloidal silica particles; colloidal silica particles; hydrogen peroxide; distilled water or deionized (DI) water; and the pH ranges from 6-9.
7. The polishing composition of claim 1 , wherein the polishing composition further comprises at least one selected from the group consisting of:
0.0001 wt. % to 2 wt. % corrosion inhibitor;
0.01 wt. % to 0.5 wt. % pH adjusting agents;
0.0001 wt. % to 0.50 wt. % surfactant; and
0.0001 wt. % to 0.1 wt. % biocide.
8. The polishing composition of claim 1 , wherein
the metal compounds is an iron salt selected from the group consisting of ammonium iron citrate, iron oxalates, iron acetates, iron tartrates, and combinations thereof.