Ceramic pedestal having atomic protective layer
A method of manufacturing a pedestal includes having a support plate including a substrate, an electric element embedded in the substrate, and a conductive member connected to the electric element, preparing a tubular shaft that defines a chamber, securing the tubular shaft to the support plate, the conductive member being exposed in the chamber of the tubular shaft, and applying a protective layer on the conductive member by an atomic layer deposition (ALD) process. A system for manufacturing the pedestal and a pedestal are also provided in the present disclosure.
1. A system for manufacturing a pedestal, the pedestal including a support plate and a tubular shaft secured to the support plate, the system comprising:
a first precursor source in fluid communication with a wall of a chamber of the tubular shaft
a second precursor source in fluid communication with the wall of the chamber of the tubular shaft; and
a heating device for heating the pedestal.
2. The system according to claim 1 , wherein the heating device includes a plasma chamber.
3. The system according to claim 1 , wherein the heating device is an internal resistive heating element inside the pedestal.
4. The system according to claim 1 , wherein the heating device includes a heating chamber surrounding the pedestal.
5. The system according to claim 1 , wherein the first precursor source comprises a first precursor in fluid communication with the chamber of the tubular shaft and the second precursor source comprises a second precursor in fluid communication with the chamber of the tubular shaft.
6. A system for manufacturing a pedestal, the pedestal including a support plate and a tubular shaft secured to the support plate, the system comprising:
a first precursor source comprising a first precursor in fluid communication with a chamber of the tubular shaft
a second precursor source comprising a second precursor in fluid communication with the chamber of the tubular shaft; and
a heating device for heating the pedestal.
7. The system according to claim 6 , wherein the heating device includes a plasma chamber.
8. The system according to claim 6 , wherein the heating device is an internal resistive heating element inside the pedestal.
9. The system according to claim 6 , wherein the heating device includes a heating chamber surrounding the pedestal.