IP Library Granted Patent US 11,864,782
Granted Patent B2
US 11,864,782 · App. 16/205,401 · Granted Jan 9, 2024

Shock wave device

Inventors: Jiri Dasek (Soprec u Prelouce, CZ); Tomas Schwarz (Prague, CZ)
Assignee: BTL Medical Solutions A. S.
A61B17/2251A61N7/00B06B1/0644G10K9/122G10K11/02G10K11/30G10K15/043A61B17/225A61B18/12A61B2017/22027A61B2018/00994A61N2007/006A61N2007/0056
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Quick Facts
Patent No.
US 11,864,782
App. No.
16/205,401
Granted
Jan 9, 2024
Kind
B2
Abstract

A device for shock wave production to treat a patient's body comprises a base with a condenser as power supply, an applicator having a pad, at least one piezo-element configured to generate a shock wave in response to a pulse of electric current having a pulse width, an acoustic lens configured to focus the shock wave, and a coil configured to increase the pulse width of the pulse of electric current.

Claims (70)

1. A device for shock wave production to treat a patient's body, comprising:

a condenser and a switch configured to discharge a pulse of electric current with a voltage in a range from 2 kV to 50 kV;

an applicator comprising:

an applicator cell providing a cavity;

at least one coil;

a conductive plate;

a single piezo-element coupled to the conductive plate and attached to the applicator cell at a bottom of the cavity;

a dielectric material positioned in the cavity, fixing the single piezo-element in the cavity; and

an acoustic lens attached to the applicator cell below the single piezo-element;

wherein the single piezo element is configured to generate at least one shock wave pulse having a duration in a range from 200 ns to 30 μs in response to the pulse of electric current;

wherein the applicator is configured to provide pressure to the patient's body in a range from 5 MPa to 250 MPa;

wherein the dielectric material has a dielectric constant in a range from 1.0005 to 2000 and dielectric strength in a range from 1 kV·mm −1 to 90 kV·mm −1 ;

wherein the single piezo-element has a volume in a range from 1.5 cm 3 to 600 cm 3 ; and

wherein the at least one coil and the conductive plate are separated by a spacing distance.

2. The device according to claim 1 , wherein the at least one coil has an inductance in a range from 1 μH to 6 mH.

3. The device according to claim 2 , wherein the at least one coil has an adjustable inductance.

4. The device according to claim 2 , wherein the at least one coil comprises a plurality of coils; and

wherein the applicator is configured such that individual coils from the plurality of coils may be connected or disconnected in the circuit.

5. The device according to claim 1 , wherein the pulse of electric current is in a range from 10 A to 1 kA.

6. The device according to claim 1 , wherein the pulse of electric current has a full width at half maximum in a range from 0.05 μs to 30 μs.

7. The device according to claim 1 , wherein the dielectric material has a flexural strength in a range from 10 MN·m −2 to 500 MN·m −2 .

8. The device according to claim 1 , wherein the dielectric material has a tensile strength in a range of 10 MN·m −2 to 300 MN·m −2 .

9. The device according to claim 1 , wherein the dielectric material has an acoustic impedance in a range of 0.9·10 6 kg·m −2 ·s −1 to 6·10 6 kg·m −2 ·s −1 .

10. The device according to claim 1 , wherein the spacing distance is in the range from 0.5 mm to 5 cm.

11. The device according to claim 1 , wherein the rise time of the at least one shock wave pulse is in a range from 50 ns to 2000 ns.

12. The device according to claim 1 , wherein the single piezo-element has a diameter of 1 cm to 20 cm.

13. The device according to claim 1 , wherein the single piezo-element is configured to generate the shock wave with a focus volume having a maximum horizontal focus volume cross-sectional dimension in a range from 0.1 mm to 100 mm.

14. The device according to claim 1 , wherein the at least one shock wave pulse has a focus volume having a maximum vertical focus volume cross-sectional dimension in a range of 0.1 mm to 100 mm.

15. The device according to claim 1 , wherein the dielectric material has a flexural strength in a range from 10 MN·m −2 to 500 MN·m −2 ;

wherein the dielectric material has a tensile strength in a range of 10 MN·m −2 to 300 MN·m −2 ; and

wherein the dielectric material has an acoustic impedance in a range of 0.9·10 6 kg·m −2 ·s −1 to 6·10 6 kg·m −2 ·s −1 .

16. The device according to claim 1 , wherein the acoustic lens has an acoustic impedance in a range from 10·10 6 kg·m −2 ·s −1 to 46·10 6 kg·m −2 ·s −1 .

17. The device according to claim 1 , wherein at least one of the applicator cell, the cavity, the conductive plate, the single piezo-element or the acoustic lens is exchangeable.

18. The device according to claim 1 , wherein the acoustic lens has a radius of curvature in a range of 30 mm to 350 mm.

19. The device according to claim 1 , wherein a surface of the acoustic lens comprises at least one V-shaped protrusion having an angle α in a range of 90° to 20°.

20. The device according to claim 1 , wherein the acoustic lens comprises at least one protrusion, and wherein the at least one protrusion is configured to extend a horizontal focus volume area of the shock wave.

21. The device according to claim 1 , wherein the cavity is filled with the dielectric material surrounding the piezo-element and the conductive plate, configured to increase durability of the piezo-element.

22. The device according to claim 1 , wherein the single piezo-element has a volume in a range from 3.5 cm 3 to 35 cm 3 .

23. A device for shock wave production to treat a patient's body, comprising:

a condenser and a switch configured to discharge a high voltage pulse of electric current;

an applicator comprising:

an applicator cell comprising a cavity;

a coil positioned inside the cavity and configured to be coupled to the condenser and the switch on an input of the coil;

a conductive plate positioned inside the cavity and connected to an output of the coil;

a large piezo-element having a diameter in a range of 1 cm to 20 cm positioned inside the cavity and coupled to the conductive plate and attached to the applicator cell at the bottom of the cavity;

wherein the cavity is filled with a dielectric material having a dielectric constant in a range from 1.0005 to 2000 and dielectric strength in a range of 1 kV·mm −1 to 90 kV·mm −1 configured to fix and increase durability of the large piezo-element inside the cavity;

wherein the applicator cell is configured to provide a shock wave in response to the high voltage pulse of the electric current passing through the coil to the conductive plate and the large piezo-element, with a duration of created shock wave pulse in a range of 200 ns to 30 μs; and

an acoustic lens having an acoustic impedance in a range from 10·10 6 kg·m −2 ·s −1 to 46·10 6 kg·m −2 ·s −1 and configured to be attached to the applicator cell below the single piezo-element and configured to focus the shock wave pulse to the patient's body such that a pressure delivered to the patient's body is in a range from 5 MPa to 250 MPa.

24. The device of claim 23 , wherein the large piezo-element has a volume in a range from 1.5 cm 3 to 600 cm 3 .

25. The device of claim 23 , wherein the high voltage pulse is in a range of 10 A to 1 kA with a voltage in a range from 2 kV to 50 kV.

26. The device of claim 25 , wherein the high voltage pulse of electric current has a full width at half maximum in a range from 0.05 μs to 30 μs.

27. The device according to claim 23 , wherein the large piezo-element is configured to generate the shock wave with a focus volume; and

wherein the energy of the shock wave in at least part of the focus volume is in a range from 0.01 mJ·mm −2 to 20 mJ·mm −2 .

28. A device for shock wave production to treat a patient's body, comprising:

a base comprising a condenser and a switch configured to discharge a pulse of electric current;

an applicator configured to be coupled to the base, the applicator comprising:

an applicator cell with a cavity, the inside of the cavity comprising:

a single piezo-element having a volume in a range of 1.5 cm 3 to 600 cm 3 and attached to the applicator cell at the bottom of the cavity;

a conductive plate attached to the single piezo-element; and

a coil configured to be electrically connected in a series with the conductive plate and the switch,

wherein the single piezo-element is configured to provide a shock wave in response to the pulse of the electric current passing through the coil to the conductive plate based on a piezoelectric effect;

wherein the cavity is filled with a dielectric material having a flexural strength in a range from 10 MN·m −2 to 500 MN·m −2 and a tensile strength in a range of 10 MN·m −2 to 300 MN·m −2 , configured to fix and to protect the single piezo-element inside the cavity; and

an acoustic lens having a radius of curvature in a range of 30 mm to 350 mm attached to the applicator cell below the single piezo-element and configured to focus the shock wave pulse to the patient's body;

wherein the shock wave has a full width at half maximum in a range of 0.1 μs to 30 μs and is configured to deliver a pressure to the patient's body in a range from 5 MPa to 250 MPa.

29. The device of claim 28 , wherein a repetition frequency of delivery of the shock wave is in a range of 1 Hz to 40 Hz.

30. The device of claim 28 , wherein the single piezo-element is configured to generate the shock wave with a focus volume, and wherein a width of the focus volume at a horizontal maximum focal volume cross section is in a range from 0.1 mm to 100 mm.

31. The device of claim 28 , wherein the dielectric material has an acoustic impedance in a range of 0.9·10 6 kg·m −2 ·s −1 to 6·10 6 kg·m −2 ·s −1 ; and

wherein the acoustic lens has an acoustic impedance in a range from 10·10 6 kg·m −2 ·s −1 to 46·10 6 kg·m −2 ·s −1 .

32. The device of claim 28 , configured to produce first and second shock waves generated by one excitation electric pulse; and

wherein a maximal pressure value of the second shock wave is greater than a maximal pressure value of the first shock wave.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 5, 2022
From: BTL HEALTHCARE TECHNOLOGIES A.S.
To: BTL MEDICAL SOLUTIONS A.S.
Reel/Frame 060736/0763 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 9, 2021
From: BTL MEDICAL TECHNOLOGIES S.R.O.
To: BTL HEALTHCARE TECHNOLOGIES A.S.
Reel/Frame 056526/0492 →
MERGER Recorded Sep 11, 2019
From: MEDICAL TECHNOLOGIES CZ A.S.
To: BTL MEDICAL TECHNOLOGIES S.R.O.
Reel/Frame 050339/0236 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2019
From: BTL INDUSTRIES LTD.
To: MEDICAL TECHNOLOGIES CZ A.S.
Reel/Frame 048200/0191 →
CORRECTIVE ASSIGNMENT TO CORRECT THE JIRI DA?EK AND TOMÁ? SCHWARZ PREVIOUSLY RECORDED ON REEL 047812 FRAME 0347. ASSIGNOR(S) HEREBY CONFIRMS THE JIRI DA?EK AND TOMÁ? SCHWARZ. Recorded Jan 14, 2019
From: DA?EK, JIRI; SCHWARZ, TOMÁ?
To: BTL INDUSTRIES LTD.
Reel/Frame 048068/0847 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 19, 2018
From: DA?EK, JIRI; SCHWARZ, TOMÁ?
To: BTL INDUSTRIES LTD.
Reel/Frame 047812/0347 →
Continuity (2)
Provisional Application 62592464 · Nov 30, 2017
Related Publication 20190159794A1 · May 30, 2019