IP Library Granted Patent US 11,270,951
Granted Patent B2
US 11,270,951 · App. 16/219,071 · Granted Mar 8, 2022

Substrate comprising at least one patterned ground plane for shielding

Inventors: Rui Tang (San Diego, CA); Zhongning Liu (San Diego, CA); Chenqian Gan (Shanghai, CN)
Assignee: QUALCOMM Incorporated
H01L23/552H01L23/645H01L28/10H05K9/0064H05K9/0081
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Quick Facts
Patent No.
US 11,270,951
App. No.
16/219,071
Granted
Mar 8, 2022
Kind
B2
Abstract

A substrate that includes at least one dielectric layer, a first inductor formed in the at least one dielectric layer, a second inductor formed in the at least one dielectric layer, and a patterned ground layer formed on a metal layer of the substrate. The patterned ground layer is configured to provide electromagnetic (EM) shielding. The patterned ground layer includes a plurality of slots. The plurality of slots may be filled with the at least one dielectric layer. The plurality of slots may include a slot with a rectangular shape, a slot with a polygon shape, a slot with a circular shape, or combinations thereof. The patterned ground layer may include at least one slot that, individually or collectively, has a shape of a spiral.

Claims (57)

1. An apparatus comprising:

a substrate comprising:

a plurality of metal layers including a first metal layer and a second metal layer, the first metal layer including patterns that form a first patterned ground layer that includes a plurality of slots, wherein the plurality of slots is arranged in a row of slots;

at least one dielectric layer;

a first inductor formed in the at least one dielectric layer; and

a second inductor formed in the at least one dielectric layer,

wherein the first patterned ground layer is configured to provide electromagnetic (EM) shielding, and

wherein the first inductor and the second are between the first patterned ground layer and the second metal layer.

2. The apparatus of claim 1 ,

wherein each slot includes a length and a width,

wherein the first inductor includes a first dimension and a second dimension, and

wherein the length of each slot is at most 50 percent of the first dimension of the first inductor.

3. The apparatus of claim 2 ,

wherein the plurality of slots is filled with the at least one dielectric layer, and

wherein a cumulative width of the rows of slots is at most 50 percent of the second dimension of the first inductor.

4. The apparatus of claim 1 , wherein the plurality of slots includes a slot with a rectangular shape, a slot with a polygon shape, a slot with a circular shape, or combinations thereof.

5. The apparatus of claim 1 , wherein the first patterned ground layer includes at least one slot that, individually or collectively, has a shape of a spiral.

6. The apparatus of claim 1 , wherein the patterned ground layer provides at least negative 60 decibels (dB) of isolation between the first inductor and the second inductor.

7. The apparatus of claim 1 , the second metal layer including patterns that form a second patterned ground layer, wherein the first inductor and the second inductor are between the first patterned ground layer and the second patterned ground layer.

8. The apparatus of claim 7 , wherein the first patterned ground layer and the second patterned ground layer collectively provide negative 60-85 decibels (dB) of isolation between the first inductor and the second inductor.

9. The apparatus of claim 1 , wherein the first patterned ground layer is coupled to ground.

10. The apparatus of claim 1 , wherein the substrate is incorporated into a device selected from a group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle.

11. A apparatus comprising:

a substrate comprising,

a plurality of metal layers including a first metal layer and a second metal layer, the first metal layer including patterns that form means for first electromagnetic (EM) shielding that includes a plurality of slots;

at least one dielectric layer;

means for first inductance formed in the at least one dielectric layer, wherein the means for first inductance is configured to generate a first electromagnetic field having a first wavelength; and

means for second inductance formed in the at least one dielectric layer,

wherein each slot from the plurality of slots includes a width that is at least 1/50 of the first wavelength of the first electromagnetic field that is generated by the means for first inductance, and

wherein the means for first inductance and the means for second inductance are between the means for first EM shielding and the second metal layer.

12. The apparatus of claim 11 ,

wherein the means for second inductance is configured to generate a second electromagnetic field having a second wavelength, and

wherein each slot from the plurality of slots includes a width that is at least 1/50 of the first wavelength of the first electromagnetic field that is generated by the means for first inductance.

13. The apparatus of claim 11 ,

wherein the plurality of slots is filled with the at least one dielectric layer, and

wherein a spacing between two adjacent slots from the plurality of slots includes a minimum width that is at least 1/50 of the first wavelength of the first electromagnetic field that is generated by the means for first inductance,

wherein the plurality of slots vertically overlaps with at most, 55 percent of the means for first inductance.

14. The apparatus of claim 11 , wherein the plurality of slots includes a slot with a rectangular shape, a slot with a polygon shape, a slot with a circular shape, or combinations thereof.

15. The apparatus of claim 11 , wherein the means for first EM shielding includes at least one slot that, individually or collectively, has a shape of a spiral.

16. The apparatus of claim 11 , wherein the means for first EM shielding provides at least negative 60 decibels (dB) of isolation between the first inductor and the second inductor.

17. The apparatus of claim 11 , wherein the second metal layer includes patterns that form means for second EM shielding, wherein the means for first inductance and the means for second inductance are between the means for second EM shielding and the means for second EM shielding.

18. The apparatus of claim 17 , wherein the means for first EM shielding and the means for second EM shielding collectively provide negative 60-85 decibels (dB) of isolation between the means for first inductance and the means for second inductance.

19. The apparatus of claim 11 , wherein the means for first EM shielding is coupled to ground.

20. The apparatus of claim 11 , wherein the substrate is incorporated into a device selected from a group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, and a device in an automotive vehicle.

21. A method for fabricating a substrate, comprising:

forming a plurality of metal layers including a first metal layer and a second metal layer;

forming at least one dielectric layer;

forming a first inductor in the at least one dielectric layer, wherein the first inductor is configured to generated an electromagnetic field having a wavelength;

forming a second inductor in the at least one dielectric layer; and

patterning the first metal layer so that the first metal layer includes a first patterned ground layer that includes a plurality of slots,

wherein each slot from the plurality of slots includes a minimum width that is at least 1/50 of the wavelength of the electromagnetic field that is generated by the first inductor,

wherein the first patterned ground layer is configured to provide electromagnetic (EM) shielding, and

wherein forming the first inductor and the second inductor include forming the first inductor and the second inductor between the first patterned ground layer the second metal layer.

22. The method of claim 21 , wherein a spacing between two slots from the plurality of slots includes a minimum width that is at least 1/50 of the wavelength of the electromagnetic field that is generated by the first inductor.

23. The method of claim 21 , wherein the plurality of slots is filled with the at least one dielectric layer.

24. The method of claim 21 , wherein the plurality of slots includes a slot with a rectangular shape, a slot with a polygon shape, a slot with a circular shape, or combinations thereof.

25. The method of claim 21 , wherein forming the first patterned ground layer includes forming the first patterned ground layer with at least one slot that, individually or collectively, has a shape of a spiral.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 27, 2019
From: TANG, RUI; LIU, ZHONGNING; GAN, CHENQIAN
To: QUALCOMM INCORPORATED
Reel/Frame 048709/0811 →
Continuity (1)
Related Publication 20200194378A1 · Jun 18, 2020