Titanium nano-scale etching on an implant surface
A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises the act of immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce a nanoscale roughened surface consisting of nanopitting superimposed on the microscale roughened surface. The nanoscale roughened surface has a property that promotes osseointegration.
1. A method of forming an implant to be implanted into living bone, the method comprising:
acid etching at least a portion of the implant surface to produce a microscale roughened surface; and
treating the microscale roughened surface to provide a nanoscale topography superimposed on the microscale roughened surface, wherein treating the microscale roughened surface to include the nanoscale topography includes immersing the implant in a solution including hydrogen peroxide and a basic solution.
2. The method of claim 1 , wherein the basic solution is a potassium hydroxide solution.
3. The method of claim 1 , wherein the basic solution is a sodium hydroxide solution.
4. The method of claim 1 , wherein the nanoscale roughened surface includes nanopitting.
5. The method of claim 1 , further including:
depositing discrete nanoparticles on the nanoscale roughened surface, the nanoscale roughened surface including nanopitting.
6. The method claim 1 , wherein, prior to acid etching, the method includes:
removing the native oxide layer from least the portion of the implant surface.
7. A method of forming an implant to be implanted into living bone, the method comprising:
roughening at least a portion of the implant surface to produce a dual microscale roughened surface including a first microscale surface having first peak-to-valley distances and a second microscale surface superimposed on the first microscale surface, the second microscale surface having second peak-to-valley distances that are less than the first peak-to-valley distances; and
treating the dual microscale roughened surface to provide a nanoscale topography superimposed on the dual microscale roughened surface.
8. The method of claim 7 , roughening at least the portion of the implant surface includes:
grit blasting the portion of the implant surface to form the first microscale surface.
9. The method of claim 8 , wherein the first peak-to-valley distances of the first microscale surface are about 10 microns to 30 microns.
10. The method of claim 8 , wherein roughening at least the portion of the implant surface includes:
acid etching the first microscale surface to form the second microscale surface superimposed on the first microscale surface.
11. The method of claim 10 , wherein the second peak-to-valley distances of the second microscale surface are less than 10 microns.
12. The method of claim 10 , wherein the second peak-to-valley distances of the second microscale surface are about 1 micron to about 3 microns.
13. The method of claim 10 , wherein the second microscale surface includes micropitting superimposed on the grit blasted surface.
14. The method of claim 7 , wherein treating the dual microscale roughened surface to include the nanoscale topography includes immersing the implant in a solution including hydrogen peroxide and a basic solution.
15. The method of claim 14 , wherein the basic solution is a potassium hydroxide solution.
16. The method of claim 14 , wherein the basic solution is a sodium hydroxide solution.
17. The method of claim 7 , wherein the nanoscale roughened surface includes nanopitting.
18. The method of claim 17 , further including:
depositing discrete nanoparticles on the nanoscale roughened surface.
19. The method claim 7 , wherein, prior to roughening at least the portion of the implant, the method includes:
removing the native oxide layer from at least the portion of the implant surface.