Apparatus and method to maintaining trivalent chromium bath plating
An apparatus for maintaining trivalent chromium plating bath efficiency includes an aqueous electroplating bath, which includes trivalent chromium ions and a sulfur compound, and an ultraviolet (UV) radiation source that provides UV radiation to the bath effective to inhibit a reduction in plating efficiency of the bath.
1. An apparatus for maintaining trivalent chromium plating bath efficiency, the apparatus comprising:
an electroplating assembly that contains at least a portion of an aqueous trivalent chromium electroplating bath, the aqueous trivalent chromium electroplating bath including trivalent chromium ions and a sulfur compound; and
a UV treatment assembly that includes a UV radiation source
that provides UV radiation continuously to a portion of the bath during electroplating effective to inhibit a reduction in plating efficiency of the bath, wherein the UV treatment assembly is in fluid communication with the electroplating assembly such that the trivalent chromium electroplating bath flows from the electroplating assembly through the UV treatment assembly and back to the electroplating assembly.
2. The apparatus of claim 1 , further including a cathode workpiece in the bath and an anode contacting the bath.
3. The apparatus of claim 2 , wherein the trivalent chromium electroplating bath provides a dark trivalent chromium coating on the cathode workpiece upon operation of the apparatus.
4. The apparatus of claim 2 , wherein the UV radiation is provided at a wavelength of about 300 nm to about 100 nm.
5. The apparatus of claim 1 , wherein flow of the trivalent chromium electroplating bath through the UV treatment assembly is continuous during electroplating of the cathode workpiece.
6. The apparatus of claim 1 , wherein the trivalent chromium electroplating bath produces at least 10 microinches of deposit thickness on the cathode workpiece during operation of the apparatus.
7. An apparatus for applying a darkened or black trivalent chromium electroplate to a workpiece, the apparatus comprising:
an electroplating assembly that includes at least a portion of an aqueous trivalent chromium electroplating bath, the aqueous trivalent chromium electroplating bath including trivalent chromium ions and an amount of sulfur compound effective to darken the trivalent chromium electroplate; and
a UV treatment assembly that includes a UV radiation source that provides UV radiation continuously to a portion of the bath during electroplating effective to inhibit a reduction in plating efficiency of the bath during electroplating the workpiece, wherein the UV treatment assembly is in fluid communication with the electroplating assembly such that the trivalent chromium electroplating bath flows from the electroplating assembly through the UV treatment assembly and back to the electroplating assembly.
8. The apparatus of claim 7 , further including a cathode workpiece in the bath and an anode contacting the bath.
9. The apparatus of claim 8 , wherein the UV radiation is provided at a wavelength of about 300 nm to about 100 nm.
10. The apparatus of claim 7 , wherein flow of the trivalent chromium electroplating bath through the UV treatment assembly is continuous during electroplating of the cathode workpiece.
11. The apparatus of claim 7 , wherein the trivalent chromium electroplating bath produces at least 10 microinches of electroplate thickness on the cathode workpiece during operation of the apparatus.
12. The apparatus of claim 1 , wherein the UV radiation is provided at a wavelength of 185 nm.
13. The apparatus of claim 7 , wherein the UV radiation is provided at a wavelength of 185 nm.