Microbial growth and dust retardant roofing shingles

1. A microbial growth and dust retardant roofing shingle, comprising a substrate having a surface; and a pore filling composition applied on the surface of the substrate, wherein the substrate comprises at least one substrate material selected from the group consisting of an asphalt shingle, a fiberglass shingle, laminate shingles and a siding material, wherein

the pore filling composition a composition comprising:

(a) about 6 wt % to 20 wt % of an alcohol;

(b) about 60 wt % to 70 wt % of an organosilane active quaternary halide salt, wherein the organosilane active quaternary halide salt is selected from the group consisting of N-tert-butyldimethylsilylimidazole chloride, Tetradecyldimethyl (3-Trimethoxysilylpropyl) Ammonium Chloride and N-Trimethoxysilylpropyl-N, N, N-Tri-N-Butylammonium Chloride;

(c) about 4 wt % to 10 wt % of an alkyltriphenylphosphonium acetate; and

(d) optionally about 1 wt % of an ammonium salt.

2. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , wherein the substrate optionally comprises ceramic granules.

3. The microbial growth and dust retardant roofing shingle as claimed in claim 2 , wherein the ceramic granule optionally consist of copper coated ceramic granule.

4. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , wherein the pore filling composition is applied on the surface of the substrate to reduce microbial growth and soiling deposits on the roofing shingle.

5. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , wherein the pore filling composition is either applied on the surface of the substrate in-situ or during fabrication of the roofing shingle in a factory.

6. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , wherein the said pore filling composition penetrates the pores on the surface of the substrate without forming a layer or film over the roofing shingle.

7. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , wherein the said pore filling composition is transparent.

8. The microbial growth and dust retardant shingles as claimed in claim 1 , wherein the alcohol is selected from the group consisting of ethanol, methanol, propanol, isopropanol and a combination thereof.

9. The microbial growth and dust retardant roofing shingles as claimed in claim 1 , wherein the ammonium salt is a quaternary ammonium salt.

10. The microbial growth and dust retardant roofing shingles as claimed in claim 9 , wherein the said quaternary ammonium salt is selected from the group consisting of copper ammonium sulfate, methylpropyldimethyloctadecyl ammonium chloride and a combination thereof.

11. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , wherein the pore filling composition retards the growth of microbes over the roofing shingles.

12. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , wherein the pore filling composition are also soiling retardant over the roofing shingles.

13. The microbial growth and dust retardant roofing shingle as claimed in claim 1 , where the pore filling composition retards the growth of microbes selected from the group consisting of algae, bacteria and a combination thereof.

14. A method of making microbial growth and dust retardant roofing shingle as claimed in claim 1 , comprising;

a. cleaning the surface of the substrate;

b. drying the surface of the substrate;

c. preparing dilutions of a pore filling, composition with water to provide a diluted pore filling composition;

d. applying the diluted pore filling composition on the surface of the substrate;

e. drying the surface having the diluted pore filling composition applied thereto; and

f. applying again the diluted pore filling composition on the surface of the substrate,

wherein the pore filling composition is a composition comprising:

(a) about 6 wt % to 20 wt % of an alcohol;

(b) about 6 wt % to 70 wt % of an organosilane active quaternary halide salt,

wherein the organosilane active quaternary halide salt is selected from the group consisting of N-tert-butyldimethylsilylimidazole chloride, Tetradecyldimethyl (3-Trimethoxysilylpropyl) Ammonium Chloride and N-Trimethoxysilylpropyl-N, N,N-Tri-N-Butylammonium Chloride;

(c) about 4 wt % to 10 wt % of an alkyltriphenylphosphonium acetate; and

(d) optionally about 1 wt % of an ammonium salt.

15. The method as claimed in claim 14 , wherein the dilution of the pore filling composition with water is in the range from 1:15 to 1:25.