Vapor ablation systems and methods
A vapor delivery system and method is provided that includes a number of features. In one embodiment, a method comprises inserting a vapor delivery needle into tissue of a patient, activating a flow of vapor from a vapor generator through vapor delivery ports of the vapor delivery needle to cause condensed liquid to exit vapor delivery ports of the vapor delivery needle, generating vapor in the vapor generator, delivering a dose of vapor through the vapor delivery ports of the vapor delivery needle into the tissue, and after the dose of vapor is delivered, re-activating the flow of vapor from the vapor generator through the vapor delivery ports of the vapor delivery needle to prevent a vacuum from forming in the vapor delivery needle. Vapor therapy systems are also provided.
1. A vapor delivery system, comprising:
a shaft configured to be inserted into a urethra of a patient;
a vapor delivery needle disposed within the shaft and including a lumen in fluid communication with a vapor delivery port;
a vapor source in fluid communication with the lumen of the vapor delivery needle; and
an electronic controller configured to:
deliver an ablative treatment dose of vapor from the vapor source through the vapor delivery port of the vapor delivery needle; and
automatically deliver a non-ablative interim flow of the vapor from the vapor source through the vapor delivery port of the vapor delivery needle to introduce positive pressure in the lumen of the vapor delivery needle after delivery of the treatment dose, wherein an amount of the vapor in the interim flow is less than an amount of the vapor in the treatment dose.
2. The system of claim 1 , wherein a flow rate of the interim flow of the vapor ranges from approximately 0.1 ml/minute to 0.3 ml/minute.
3. The system of claim 1 , wherein the treatment dose is a first treatment dose and wherein the controller is further configured to, after delivering the interim flow of the vapor, deliver a second treatment dose of the vapor from the vapor source through the vapor delivery needle.
4. The system of claim 3 , wherein the positive pressure is configured to exist for an entirety of a time between the delivery of the first treatment dose of the vapor and the delivery of the second treatment dose of the vapor.
5. The system of claim 4 , wherein the positive pressure is configured to vary over at least a portion of the entirety of the time.
6. The system of claim 1 , wherein the vapor source comprises a vapor generator, and wherein the controller is further configured to:
monitor a parameter of the vapor generator;
perform a comparison of the parameter to a predetermined value; and
adjust the vapor generator based on the comparison of the parameter to the predetermined value.
7. The system of claim 6 , wherein the parameter is a temperature of the vapor emitted from the vapor generator.
8. The system of claim 7 , wherein the vapor generator includes a heating element, and wherein the temperature of the vapor emitted from the vapor generator is monitored by measuring an impedance of the heating element.
9. The system of claim 6 , wherein the predetermined value is a first predetermined value, and wherein the controller is further configured to:
perform a comparison of the parameter to the first predetermined value during the delivery of the treatment dose of the vapor;
perform a comparison of the parameter to a second predetermined value during the delivery of the interim flow of the vapor; and
adjust the vapor generator based on the comparison of the parameter to the first predetermined value or the second predetermined value.
10. A vapor delivery system, comprising:
a shaft configured to be inserted into a urethra of a patient;
a vapor delivery needle disposed within the shaft and including a lumen in fluid communication with a vapor delivery port;
a vapor source fluidly coupled to the lumen of the vapor delivery needle; and
an electronic controller configured to:
deliver a first ablative treatment dose of vapor from the vapor source through the vapor delivery port of the vapor delivery needle;
automatically deliver a non-ablative interim flow of the vapor from the vapor source through the vapor delivery port of the vapor delivery after delivering the first treatment dose of the vapor, the interim flow of the vapor including a lesser quantity of the vapor than a quantity of the first treatment dose; and
deliver a second ablative treatment dose of the vapor from the vapor source through the vapor delivery port of the vapor delivery needle after delivering the interim flow of the vapor.
11. The system of claim 10 , wherein a flow rate of the interim flow of the vapor ranges from approximately 0.1 ml/minute to 0.3 ml/minute.
12. The system of claim 10 , wherein the controller is further configured to sustain a non-negative pressure in the lumen of the vapor delivery needle between the delivery of the first treatment dose and the delivery of the second treatment dose.
13. The system of claim 10 , wherein the vapor source includes a vapor generator, and wherein the controller is further configured to:
monitor a parameter of the vapor generator;
perform a comparison of the parameter to a predetermined value; and
adjust the vapor generator based on the comparison of the parameter to the predetermined value.
14. The system of claim 13 , wherein the parameter is a temperature of the vapor emitted from the vapor generator.
15. The system of claim 14 , wherein the vapor generator includes a heating element, and wherein the temperature of the vapor emitted from the vapor generator is monitored by measuring an impedance of the heating element.
16. The system of claim 13 , wherein the predetermined value is a first predetermined value, and wherein the controller is further configured to:
perform a comparison of the parameter to the first predetermined value during the delivery of the first treatment dose of the vapor and the second treatment dose of the vapor; and
perform a comparison of the parameter to a second predetermined value during the delivery of the interim flow of the vapor; and
adjust the vapor generator based on the comparison of the parameter to the first predetermined value or the second predetermined value.
17. A vapor delivery system, comprising:
a shaft configured to be inserted into a urethra of a patient;
a vapor delivery needle disposed within the shaft and comprising a lumen in fluid communication with a vapor delivery port;
a vapor source in fluid communication with the vapor delivery port of the vapor delivery needle; and
an electronic controller configured to:
deliver an ablative treatment dose of vapor from the vapor source through the vapor delivery port of the vapor delivery needle; and
automatically deliver a non-ablative flow of the vapor after delivering the treatment dose of the vapor, the non-ablative flow of the vapor having a flow rate ranging from approximately 0.1 ml/minute to 0.3 ml/minute.
18. The system of claim 17 , wherein the vapor source comprises a vapor generator, and wherein the controller is further configured to:
monitor a parameter of the vapor generator;
perform a comparison of the parameter to a predetermined value; and
adjust the vapor generator based on the comparison of the parameter to the predetermined value.
19. The system of claim 18 , wherein the parameter is a temperature of the vapor emitted from the vapor generator, wherein the vapor generator includes a heating element, and wherein the temperature of the vapor emitted from the vapor generator is monitored by measuring an impedance of the heating element.
20. The system of claim 17 , wherein the vapor source includes a vapor generator, and wherein the controller is further configured to:
monitor a parameter of the vapor generator;
perform a comparison of the parameter to a first predetermined value during the delivery of the treatment dose of the vapor;
perform a comparison of the parameter to a second predetermined value during the delivery of the flow of the vapor; and
adjust the vapor generator based on the comparison of the parameter to the first predetermined value or the second predetermined value.