Solar cell having an emitter region with wide bandgap semiconductor material
View Patent ↗Solar cells having emitter regions composed of wide bandgap semiconductor material are described. In an example, a method includes forming, in a process tool having a controlled atmosphere, a thin dielectric layer on a surface of a semiconductor substrate of the solar cell. The semiconductor substrate has a bandgap. Without removing the semiconductor substrate from the controlled atmosphere of the process tool, a semiconductor layer is formed on the thin dielectric layer. The semiconductor layer has a bandgap at least approximately 0.2 electron Volts (eV) above the bandgap of the semiconductor substrate.
1. A solar cell, comprising:
a semiconductor substrate;
a first oxide layer disposed on a first region of the semiconductor substrate;
a first emitter region of a first conductivity type above the first region of the semiconductor substrate and on the first oxide layer, wherein the first emitter region comprises a polycrystalline semiconductor material;
a second oxide layer disposed on a second region of the semiconductor substrate; and
a second emitter region of a second conductivity type above the second region of the semiconductor substrate and on second oxide layer, the second conductivity type opposite the first conductivity type, wherein the second emitter region comprises an amorphous silicon.
2. The solar cell of claim 1 , wherein the semiconductor substrate is an N-type doped single crystalline silicon substrate.
3. The solar cell of claim 1 , wherein the polycrystalline semiconductor material comprises silicon.
4. The solar cell of claim 1 , wherein the first conductivity type is N-type, and the second conductivity type is P-type.
5. The solar cell of claim 1 , wherein the first conductivity type is P-type, and the second conductivity type is N-type.
6. The solar cell of claim 1 , wherein the amorphous silicon has a dopant concentration approximately in the range of 1×10 17 -1×10 21 atoms/cm 3 .
7. The solar cell of claim 1 , wherein the first oxide layer comprises silicon.
8. The solar cell of claim 1 , wherein the second oxide layer comprises silicon.
9. A solar cell, comprising:
a semiconductor substrate;
a first oxide layer disposed on a first region of the semiconductor substrate;
a first emitter region of a first conductivity type above the first region of the semiconductor substrate and on the first oxide layer, wherein the first emitter region comprises a polycrystalline semiconductor material;
a second oxide layer disposed on a second region of the semiconductor substrate;
a second emitter region of a second conductivity type above the second region of the semiconductor substrate and on second oxide layer, the second conductivity type opposite the first conductivity type, wherein the second emitter region comprises an amorphous silicon; and
a doping material on the second emitter region.
10. The solar cell of claim 9 , wherein the semiconductor substrate is an N-type doped single crystalline silicon substrate.
11. The solar cell of claim 9 , wherein the polycrystalline semiconductor material comprises silicon.
12. The solar cell of claim 9 , wherein the first conductivity type is N-type, and the second conductivity type is P-type.
13. The solar cell of claim 9 , wherein the first conductivity type is P-type, and the second conductivity type is N-type.
14. The solar cell of claim 9 , wherein the amorphous silicon has a dopant concentration approximately in the range of 1×10 17 -1×10 21 atoms/cm 3 .
15. The solar cell of claim 9 , wherein the first oxide layer comprises silicon.
16. The solar cell of claim 9 , wherein the second oxide layer comprises silicon.