Semiconductor device and display unit
A display unit includes a substrate that includes an organic insulating material and a plurality of micro conductors dispersed in the organic insulating material; a semiconductor element provided on the substrate; and a display element layer that is provided on a side opposite to the substrate with respect to the semiconductor element. The display element layer includes a display surface and a plurality of display element that is driven to perform image displaying on the display surface by the semiconductor element.
1. A display unit comprising:
a substrate that includes an organic insulating material and a plurality of micro conductors dispersed in the organic insulating material;
a semiconductor element provided on the substrate; and
a display element layer that is provided on a side opposite to the substrate with respect to the semiconductor element, and includes a display surface and a plurality of display element that is driven to perform image displaying on the display surface by the semiconductor element wherein
the substrate has a first surface on which the semiconductor element is provided, and a second surface that faces the first surface, and
a density of the micro conductors in an internal portion adjacent to the second surface of the substrate is higher than a density of the micro conductors in an internal portion adjacent to the first surface of the substrate.
2. An imaging unit comprising:
a substrate that includes an organic insulating material and a plurality of micro conductors dispersed in the organic insulating material;
a semiconductor element provided on the substrate; and
an imaging element layer that is provided on a side opposite to the substrate with respect to the semiconductor element, and includes a plurality of imaging element that is driven to read signals from the imaging element by the semiconductor element, wherein
the substrate has a first surface on which the semiconductor element is provided, and a second surface that faces the first surface, and
a density of the micro conductors in an internal portion adjacent to the second surface of the substrate is higher than a density of the micro conductors in an internal portion adjacent to the first surface of the substrate.
3. A semiconductor device comprising:
a substrate that includes an organic insulating material and a plurality of micro conductors dispersed in the organic insulating material; and
a semiconductor element provided on the substrate, wherein
the substrate has a first surface on which the semiconductor element is provided, and a second surface that faces the first surface, and
a density of the micro conductors in an internal portion adjacent to the second surface of the substrate is higher than a density of the micro conductors in an internal portion adjacent to the first surface of the substrate.
4. The semiconductor device according to claim 3 , further comprising an inorganic insulating film between the substrate and the semiconductor element.
5. The semiconductor device according to claim 3 , wherein the organic insulating material includes polyimide.
6. The semiconductor device according to claim 3 , wherein the substrate has a surface resistivity of 10 9 Ω/sq. or less.
7. The semiconductor device according to claim 3 , wherein each of the micro conductors has a diameter of 2 μm or smaller.
8. The semiconductor device according to claim 3 , wherein
the substrate includes a laminate of a first layer and a second layer, and
the micro conductors are included in one or both of the first layer and the second layer.
9. The semiconductor device according to claim 8 , further comprising an insulating layer between the first layer and the second layer.
10. The semiconductor device according to claim 3 , wherein the substrate has a high-density region having a predetermined density of the micro conductors, and a low-density region having a density of the micro conductors lower than the predetermined density of the micro conductors in the high-density region.
11. The semiconductor device according to claim 10 , further comprising a wiring line that is provided on the substrate and is opposed to the low-density region, out of the high-density region and the low-density region.
12. The semiconductor device according to claim 3 , wherein the substrate is coupled to a ground potential.
13. The semiconductor device according to claim 3 , wherein the semiconductor element comprises a thin-film transistor.
14. The semiconductor device according to claim 3 , wherein the substrate comprises a flexible substrate.
15. The semiconductor device according to claim 3 , wherein the micro conductors include metal or carbon.
16. The semiconductor device according to claim 3 , further comprising:
a metal film on a side opposite to the semiconductor element with respect to the substrate and configured to couple the plurality of micro conductors to a ground potential.