IP Library Granted Patent US 10,629,621
Granted Patent B2
US 10,629,621 · App. 16/239,446 · Granted Apr 21, 2020

Butted body contact for SOI transistor

Inventor: Simon Edward Willard (Irvine, CA)
Assignee: pSemi Corporation
H01L27/1203H01L27/0207H01L29/0649H01L29/0847H01L29/1095H01L29/42384H01L29/4916H01L29/78615H03F3/195H03F3/213H03F3/2171H03F2200/451
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Quick Facts
Patent No.
US 10,629,621
App. No.
16/239,446
Granted
Apr 21, 2020
Kind
B2
Abstract

Systems, methods, and apparatus for an improved body tie construction are described. The improved body tie construction is configured to have a lower resistance body tie exists when the transistor is “off” (Vg approximately 0 volts). When the transistor is “on” (Vg>Vt), the resistance to the body tie is much higher, reducing the loss of performance associated with presence of body tie. Space efficient Body tie constructions adapted for cascode configurations are also described.

Claims (24)

1. An amplifier comprising:

first and second transistors each defined by respective first and second body regions, the first and second transistors connected in series so that a source region of the first transistor and a drain region of the second transistor define a first common source/drain region,

a first non-conductive isolation region that divides the second body region in two separate body regions; and

at least one first body tab in contact with the first body region and extending across at least a portion of the first common source/drain region to make contact with at least one first body contact region that abuts the first non-conductive isolation region.

2. The amplifier of claim 1 , wherein the at least first body contact region is formed within the first common source/drain region and is separate from the first and the second body regions.

3. The amplifier of claim 1 , wherein the first non-conductive isolation region is configured such that a silicon region of the first common source/drain region extends to a silicon region past the two separate body regions.

4. The amplifier of claim 3 , wherein the at least one first body tab makes contact with the at least one first body contact region in an extended contiguous silicon region of the first common source/drain region.

5. The amplifier of claim 1 , wherein the first non-conductive isolation region divides a source region of the second transistor in two separate source regions.

6. The amplifier of claim 1 , wherein a length of the at least one first body tab is greater than a length defined by a spacing between the first body region and the second body region.

7. The amplifier of claim 1 , wherein the first body tab extends in a direction perpendicular to a direction defined by the first and the second body regions along a width of the body regions.

8. The amplifier of claim 1 , further comprising:

at least one second body tab in contact with one of the two separate body regions and extending into a source region of the second transistor to make contact with at least one second body contact region.

9. The amplifier of claim 8 , further comprising:

an additional second body tab in contact with the other of the two separate body regions and extending into the source region of the second transistor to make contact with an additional second body contact region.

10. The amplifier of claim 8 , wherein the at least one second body contact region is formed within the source region of the second transistor so that said contact region is laterally surrounded by said source region.

11. The amplifier of claim 8 , wherein the at least one second body contact region abuts the source region of the second transistor.

12. The amplifier of claim 1 , wherein the first and the second transistors are arranged in a cascode configuration.

13. The amplifier of claim 12 , further comprising additional one or more transistors in series connection with the first and second transistors, the first, second and additional one or more transistors being arranged in a cascode configuration.

14. The amplifier of claim 12 , wherein the transistors of the cascode configuration are metal-oxide-semiconductor field effect transistors (MOSFETs).

15. The amplifier of claim 14 , wherein the transistors are fabricated using a technology according to one of: a) silicon-on-insulator (SOI) technology, and b) silicon-on-sapphire (SOS) technology.

16. The amplifier claim 14 , wherein the amplifier is adapted for use as one or more of: a) a radio frequency (RF) amplifier, b) an RF power amplifier, c) a cellular RF power amplifier, d) a switching RF power amplifier, e) a CMOS (complementary metal-oxide-semiconductor) RF power amplifier, and f) a cellular CMOS RF power amplifier.

17. The amplifier according to claim 16 , wherein a class of operation of the amplifier is one or more of: i) linear class A, ii) linear class A/B, iii) saturated class B, iv) saturated class C, v) switching class D, vi) switching class E, and vii) switching class F.

18. An electronic module comprising the amplifier of claim 1 .

19. An electronic system comprising the electronic module of claim 18 , the electronic system configured to operate as: a) a television, b) a cellular telephone, c) a personal computer, d) a workstation, e) a radio, f) a video player, g) an audio player, h) a vehicle, i) a medical device, and j) other electronic systems.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2025
From: WILLARD, SIMON EDWARD
To: PEREGRINE SEMICONDUCTOR CORPORATION
Reel/Frame 071652/0457 →
CHANGE OF NAME Recorded Jul 9, 2025
From: PEREGRINE SEMICONDUCTOR CORPORATION
To: PSEMI CORPORATION
Reel/Frame 071890/0290 →
Continuity (4)
Continuation 15824932 · Nov 28, 2017
Continuation 15078930 · Mar 23, 2016
Continuation In Part 14945323 · Nov 18, 2015
Related Publication 20190198531A1 · Jun 27, 2019
Cited By (1)
US 12,205,954