Solar cell and method for manufacturing the same

1. A solar cell comprising:

a semiconductor substrate containing impurities of a first conductive type;

a tunnel layer positioned on the semiconductor substrate;

an emitter region positioned on the tunnel layer and containing impurities of a second conductive type opposite the first conductive type;

a dopant layer positioned on the emitter region and formed of a dielectric material containing impurities of the second conductive type;

a hydrogen injection layer positioned on a back surface of the dopant layer and formed of a dielectric material containing hydrogen at a higher concentration than that of the dopant layer;

a first electrode connected to the semiconductor substrate, and including a plurality of first finger electrodes and a plurality of first bus bars crossing the plurality of first finger electrodes; and

a second electrode configured to pass through both the hydrogen injection layer and the dopant layer, and connected to the emitter region, and including a plurality of second finger electrodes and a plurality of second bus bars crossing the plurality of second finger electrodes,

wherein a doping concentration of the second conductive type impurities contained in the emitter region and a crystallinity of the emitter region increase in the emitter region going away from the tunnel layer.

2. The solar cell of claim 1 , wherein a first doping concentration of the second conductive type impurities in a first portion of the emitter region contacting the second electrode is 5*10 19 /cm 3 to 5*10 21 /cm 3 , and

wherein a second doping concentration of the second conductive type impurities in a second portion of the emitter region contacting the tunnel layer is lower than the first doping concentration, and is 5*10 18 /cm 3 to 5*10 20 /cm 3 .

3. The solar cell of claim 1 , wherein a doping concentration of the emitter region successively decreases linearly or nonlinearly in the emitter region going from a first portion of the emitter region contacting the second electrode to a second portion of the emitter region contacting the tunnel layer.

4. The solar cell of claim 1 , wherein a thickness of the emitter region is 50 nm to 150 nm, and

wherein a thickness of the dopant layer is 25 nm to 150 nm.

5. The solar cell of claim 1 , further comprising a front surface field region positioned on a front surface of the semiconductor substrate and containing impurities of the first conductive type at a higher concentration than that of the semiconductor substrate,

wherein the tunnel layer, the emitter region, and the dopant layer are positioned on a back surface of the semiconductor substrate.