Semiconductor device and method of manufacturing the same
The semiconductor substrate may include an emitter region, an upper body region being in direct contact with the gate insulating film below the emitter region, an intermediate region being in direct contact with the gate insulating film below the upper body region, a lower body region being in direct contact with the gate insulating film below the intermediate region, a drift region being in direct contact with the gate insulating film below the lower body region, and a collector region being in direct contact with the drift region from below. The lower body region may include a first range and a second range that has a higher crystal defect density than the first range. The second range may be in direct contact with the gate insulating film. The first range may be in direct contact with the second range on a side opposed to the gate insulating film.
1. A semiconductor device comprising:
a semiconductor substrate;
a trench provided in an upper surface of the semiconductor substrate;
a gate insulating film covering an inner surface of the trench; and
a gate electrode disposed in the trench and insulated from the semiconductor substrate by the gate insulating film,
wherein
the semiconductor substrate comprises:
an emitter region of n-type disposed at the upper surface of the semiconductor substrate and being in direct contact with the gate insulating film;
an upper body region of p-type being in direct contact with the gate insulating film below the emitter region;
an intermediate region of n-type being in direct contact with the gate insulating film below the upper body region;
a lower body region of p-type being in direct contact with the gate insulating film below the intermediate region;
a drift region of n-type being in direct contact with the gate insulating film below the lower body region; and
a collector region of p-type being in direct contact with the drift region from below,
wherein
the lower body region includes a first range and a second range that has a higher crystal defect density than the first range,
the second range is in direct contact with the gate insulating film, and
the first range is in direct contact with the second range on a side opposed to the gate insulating film.
2. The semiconductor device of claim 1 , wherein
the intermediate region includes a third range and a fourth range that has a lower n-type impurity concentration than the third range,
the fourth range is in direct contact with the gate insulating film, and
the third range is in direct contact with the fourth range on a side opposed to the gate insulating film.
3. The semiconductor device of claim 1 , wherein
the drift region includes a fifth range and a sixth range that has a higher crystal defect density than the fifth range,
the sixth range is in direct contact with the gate insulating film, and
the fifth range surrounds the sixth range.
4. A method of manufacturing the semiconductor device of claim 3 , the method comprising:
forming the sixth range by injecting charged particles into the semiconductor substrate.
5. A method of manufacturing the semiconductor device of claim 1 , the method comprising:
forming the second range by injecting charged particles into the semiconductor substrate.