Optical sensors in semiconductor devices
An optical sensor in an integrated Complementary Metal Oxide Semiconductor, CMOS, device, the sensor including a sensor element with an optical active region and a CMOS backend stack including one or more layers. The sensor further includes an optical lens formed in a layer of the one or more layers and arranged to direct light incident upon it towards the sensor element.
1. An optical sensor in an integrated Complementary Metal Oxide Semiconductor, CMOS, device, said sensor comprising:
a sensor element with an optical active region;
a CMOS backend stack comprising one or more layers; and
an optical lens formed in a layer of said one or more layers and arranged to direct light incident upon it towards said sensor element, wherein said optical lens is a binary lens having a binary structure in or on said layer of said one or more layers, and wherein said binary structure comprises a plurality of substantially concentric rings and a radius of an edge of one ring of said plurality of substantially concentric rings is given by
r
n
=
n
λ
f
+
n
2
λ
2
4
,
where r n is said radius of an n th edge of said binary structure, λ is a target wavelength, and f is a focal length.
2. An optical sensor according to claim 1 , wherein said binary structure has a Fresnel zone plate design.
3. An optical sensor according to claim 1 , wherein a depth of said plurality of substantially concentric rings is given by
Δ
h
=
λ
2
·
Δ
n
refractive
,
wherein Δh is said depth, λ is the target wavelength, and Δn refractive is a difference between a refractive index of said layer of said one or more layers and a refractive index of a material directly above said layer of said one or more layers.
4. An optical sensor according to claim 1 , wherein said binary structure comprises a plurality of nested rectangles with rounded corners.
5. An optical sensor according to claim 1 , wherein said one or more layers comprises a plurality of layers, and said binary structure extends through said layer of said one or more layers and into another layer of said plurality of layers.
6. An optical sensor according to claim 1 , wherein said one or more layers comprises a dielectric layer, and said optical lens is formed in said dielectric layer.
7. An optical sensor according to claim 6 , wherein said dielectric layer is a nitride passivation layer of said integrated CMOS device.
8. An optical sensor according to claim 6 , wherein said dielectric layer is an oxide layer.
9. An optical sensor according to claim 1 , wherein said one or more layers comprises a plurality of metallization layers including a metal top layer.
10. An optical sensor according to claim 9 , wherein said layer of said one or more layers having an optical lens formed therein is one of said metallization layers.
11. An optical sensor according to claim 9 , wherein said layer of said one or more layers having an optical lens formed therein is located above said metal top layer.