Methods for using remote plasma chemical vapor deposition (RP-CVD) and sputtering deposition to grow layers in light emitting devices
Described herein are methods for using remote plasma chemical vapor deposition (RP-CVD) and sputtering deposition to grow layers for light emitting devices. A method includes growing a light emitting device structure on a growth substrate, and growing a tunnel junction on the light emitting device structure using at least one of RP-CVD and sputtering deposition. The tunnel junction includes a p++ layer in direct contact with a p-type region, where the p++ layer is grown by using at least one of RP-CVD and sputtering deposition. Another method for growing a device includes growing a p-type region over a growth substrate using at least one of RP-CVD and sputtering deposition, and growing further layers over the p-type region. Another method for growing a device includes growing a light emitting region and an n-type region using at least one of RP-CVD and sputtering deposition over a p-type region.
1. A method for growing a light emitting device comprising a n-type region, a light emitting region and a p-type region, the method comprising:
growing a light emitting device structure on a growth substrate using a metal-organic chemical vapor deposition (MOCVD); and
growing at least a portion of a hydrogen-free layer of a tunnel junction on the light emitting device by using at least one of remote plasma chemical vapor deposition (RP-CVD) and sputtering deposition.
2. The method of claim 1 , wherein the growing at least a portion of a hydrogen-free layer of a tunnel junction further comprises:
directly contacting a p++ layer with the p-type region, wherein the p++ layer is more heavily doped than the p-type region; and
contacting a n++ layer with the p++ layer, wherein the at least a portion of the layer of the tunnel junction is the p++ layer,
the light emitting device structure and tunnel junction being made of III-nitride material.
3. The method of claim 2 , wherein:
the growing the light emitting device structure further comprises:
growing the n-type region, the light emitting layer, and the p-type region by (MOCVD);
annealing the n-type region, the light emitting region, and the p-type region; and
the growing at least a portion of the layer of the tunnel junction further comprises:
after said annealing, growing the p++ layer on the p-type region.
4. The method of claim 2 , wherein the tunnel junction further comprises an additional layer disposed between the p++ layer and the n++ layer, and the additional layer is a different composition from either the p++ layer or the n++ layer.
5. The method of claim 1 , wherein the growing the light emitting device structure further comprises:
growing the n-type region, the light emitting region, and a first portion of the p-type region by metal organic chemical vapor deposition (MOCVD);
annealing the n-type region, the light emitting region, and the first portion of the p-type region; and
after said annealing, growing a hydrogen-free_second portion of the p-type region by the at least one of RP-CVD and sputtering deposition.
6. The method of claim 1 , further comprising:
forming a first metal contact in direct contact with the n-type region and a second metal contact in direct contact with the n-type contact layer.
7. The method of claim 6 , further comprising:
growing another light emitting device structure on the tunnel junction.
8. The method of claim 1 , the p-type region, the light emitting region and the n-type region being made from III-nitride materials.
9. A method for growing a device, comprising:
growing a hydrogen-free III-nitride p-type region over a growth substrate by at least one of RP-CVD and sputtering deposition;
growing an III-nitride light emitting region over the III-nitride p-type region; and
growing an III-nitride n-type region over the light emitting region using metal organic chemical vapor deposition (MOCVD).
10. The method of claim 9 , further comprising:
disposing a GaN film on a non III nitride material of the growth substrate; and
growing the GaN film by metal organic chemical vapor deposition (MOCVD).
11. The method of claim 9 , further comprising:
disposing a GaN film on a non III nitride material of the growth substrate; and
growing the GaN film by the at least one of RP-CVD and sputtering deposition.
12. The method of claim 9 , wherein the growing the light emitting region over the III-nitride p-type region comprises:
growing a hydrogen-free first portion of the light emitting region by the at least one of RP-CVD and sputtering deposition and;
growing a second portion of the light emitting region by MOCVD.
13. The method of claim 9 , wherein the growing the light emitting region over the III-nitride p-type region comprises:
growing the III-nitride light emitting region by the at least one of RP-CVD and sputtering deposition.
14. A method for growing a device, comprising:
growing a p-type region over a growth substrate;
annealing the p-type region after growing the p-type region by MOCVD;
growing, by at least one of RP-CVD and sputtering deposition, a light emitting region over the p-type region; and
growing, by at least one of RP-CVD and sputtering deposition, an n-type region over the light emitting region.
15. The method of claim 14 , wherein the p-type region, the light emitting region and the n-type region are made from III-nitride materials.
16. The method of claim 14 , the p-type region, the light emitting region and the n-type region being made from III-nitride materials.
17. A device comprising:
a light emitting structure on a growth substrate;
a tunnel junction;
a hydrogen-free layer of the tunnel junction, the hydrogen-free layer comprising trace amounts of at least one of oxygen and carbon; and
a magnesium doped layer of the tunnel junction.
18. The device of claim 17 , wherein the magnesium doped layer comprises trace amounts of hydrogen.
19. The device of claim 17 , wherein the hydrogen-free layer and the magnesium doped layer are the same layer.