Method for fabricating a layered structure using surface micromachining
Methods and techniques for fabricating layered structures using surface micromachining are described. A sacrificial layer is deposited on a substrate assembly that functions as a bottom electrode. The sacrificial layer is patterned into a first shape. A first polymer-based layer is deposited on the sacrificial layer. A top electrode is patterned on the first polymer-based layer above the sacrificial layer. A second polymer-based layer is deposited on the top electrode such that the top electrode is between the first and second polymer-based layers. The sacrificial layer is etched away to form a cavity under the top electrode.
1. A method for fabricating a layered structure, the method comprising:
(a) depositing a sacrificial layer on a substrate assembly that functions as a bottom electrode;
(b) patterning the sacrificial layer into a first shape;
(c) depositing a first polymer-based layer on the patterned sacrificial layer;
(d) patterning a top electrode on the first polymer-based layer above the patterned sacrificial layer;
(e) depositing a second polymer-based layer on the top electrode such that the top electrode is between the first and second polymer-based layers; and
(f) after the second polymer-based layer has been deposited on the top electrode, etching away the patterned sacrificial layer to form a cavity under the top electrode.
2. The method of claim 1 , wherein the first polymer-based layer comprises a conduit permitting etchant to flow from a top of the first polymer-based layer to the patterned sacrificial layer.
3. The method of claim 2 , wherein the second polymer-based layer is deposited to block the conduit, and further comprising etching away a portion of the second polymer-based layer that blocks the conduit, wherein etching away the patterned sacrificial layer comprises flowing the etchant through the conduit.
4. The method of claim 1 , wherein patterning the sacrificial layer into the first shape and etching away the patterned sacrificial layer to form the cavity are performed using organic and non-toxic solvents.
5. The method of claim 1 , wherein the layered structure comprises a capacitive micromachined ultrasound transducer, the first shape comprises a cavity of the transducer, and further comprising:
(a) patterning a via hole through the first polymer-based layer to the patterned sacrificial layer; and, wherein the etching is performed using the via hole to form the cavity; and
(b) closing the cavity.
6. The method of claim 5 , wherein patterning the sacrificial layer to be shaped as the cavity of the transducer, etching away the patterned sacrificial layer to form the cavity of the transducer, and patterning the via hole, are performed using organic and non-toxic solvents.
7. The method of claim 5 , wherein closing the cavity comprises encapsulating the first and second polymer-based layers with a bio-compatible material.
8. The method of claim 5 , wherein patterning the top electrode comprises patterning metallic connections to the top electrode, wherein the metallic connections are uncovered by the second polymer-based layer after the cavity is closed, and wherein closing the cavity comprises depositing the bio-compatible material over the metallic connections.
9. The method of claim 5 , wherein closing the cavity is done in a polymer evaporator chamber at pressure of no more than 0.001 Torr.
10. The method of claim 5 , wherein the top electrode is embedded within the first and second polymer-based layers.
11. The method of claim 1 , further comprising closing the cavity such that a watertight seal is formed around the cavity.
12. The method of claim 1 , wherein the sacrificial layer is photosensitive and wherein patterning the sacrificial layer to form the cavity comprises:
(a) cross-linking a portion of the sacrificial layer shaped as the first shape; and
(b) applying a developer to etch away a portion of the sacrificial layer that is not cross-linked.
13. The method of claim 1 , wherein the sacrificial layer is not photosensitive and wherein patterning the sacrificial layer to form the cavity comprises:
(a) depositing a positive photoresist layer on the sacrificial layer;
(b) cross-linking a portion of the positive photoresist layer corresponding to a portion of the sacrificial layer that is shaped as the cavity;
(c) applying a photoresist developer to etch away the photoresist layer that is not cross-linked and the sacrificial layer that underlies the photoresist layer that is not cross-linked; and
(d) after the photoresist layer and the sacrificial layer have been etched away, removing the photoresist layer that is cross-linked.
14. The method of claim 1 , wherein relative thickness of the second polymer-based layer to the first polymer-based layer is selected such that the top electrode resonates at a frequency of at least 1 MHz.
15. The method of claim 14 , wherein the second polymer-based layer is at least five times thicker than the first polymer-based layer.
16. The method of claim 1 , wherein the fabricating of the layered structure is performed at a temperature of no more than 150° C.
17. The method of claim 1 , wherein the substrate assembly is flexible.
18. The method of claim 1 , wherein the top electrode comprises a conductive polymer.
19. The method of claim 1 , wherein the substrate assembly comprises an optically-transparent material.
20. The method of claim 19 , wherein the substrate assembly further comprises an optically-transparent conductive bottom electrode on a substrate.
21. The method of claim 1 , further comprising, after the patterned sacrificial layer has been etched away, trapping charge in the first polymer-based layer by:
(a) applying a voltage across the top electrode and the substrate assembly such that a portion of the first polymer-based layer contacting the top electrode is pulled into contact with the substrate assembly;
(b) maintaining the portion of the first polymer-based layer contacting the top electrode and the substrate assembly in contact for a period of time; and then
(c) ceasing applying the voltage.
22. The method of claim 1 , wherein the sacrificial layer comprises a polymer, and wherein depositing the sacrificial layer comprises spin coating or spray coating the sacrificial layer on to the substrate assembly.
23. The method of claim 1 , wherein depositing the first polymer-based layer on the patterned sacrificial layer comprises covering all surfaces of the patterned sacrificial layer except a bottom surface contacting the substrate assembly with the first polymer-based layer.
24. The method of claim 1 , wherein the substrate assembly comprises a non-conductive substrate with a conductive bottom electrode on the substrate.
25. The method of claim 1 , wherein the patterned sacrificial layer is non-reactive when exposed to the first and second polymer-based layers and to a photoresist developer used during the patterning of the first and second polymer-based layers, and wherein the first and second polymer-based layers are non-reactive when exposed to an etchant used to etch away the patterned sacrificial layer.
26. The method of claim 1 , wherein the first and second polymer-based layers comprise SU8 photoresist.
27. The method of claim 1 , wherein the sacrificial layer comprises an OmniCoat™ composition.
28. The method of claim 1 , wherein the cavity has a height selected such that an operating voltage of the structure is no more than 50 Volts.
29. The method of claim 1 , wherein depositing the sacrificial layer comprises evaporating a composition that comprises a solvent, and then depositing the composition as the sacrificial layer, wherein at least 70% and no more than 90% of the solvent is evaporated.