Corner-lock stitch patterns
Stitching patterns overlap to produce a corner-locked stitch pattern. The corner-locked stitch pattern includes one or more thread interlace points, and one or more overlays of threads from overlapping patterns. A network of corner-lock stitch patterns produces a mesh, which may be embroidered into a substrate, such as a medical textile or biotextile. Corner-lock stitch patterns resist puncture-induced and tension-induced deformation of mesh pores between corner-locked stitch patterns, and may be used to modulate compliance and enhance strength properties of a substrate into which they are sewn.
1. A mesh implant, comprising:
a substrate having a mesh formed therein, the mesh comprising a corner-lock stitch pattern where a second stitch pattern interlaces with a plurality of corners of a first stitch pattern, wherein the first stitch pattern includes a first upper thread or yarn and a first lower thread or yarn, and the second stitch pattern includes a second upper thread or yarn and a second lower thread or yarn, wherein the second upper thread or yarn and second lower thread or yarn envelope the first upper thread or yarn and the first lower thread or yarn at a vertex of at least one corner of the plurality of corners of the first stitch pattern.
2. The implant of claim 1 , wherein the second stitch pattern is threaded through the substrate adjacent to the vertex of the at least one corner of the plurality of corners of the first stitch pattern.
3. The implant of claim 1 , wherein the substrate comprises a plurality of layers.
4. The implant of claim 1 , wherein the corner-lock stitch pattern defines pores having a length, width, or diameter ranging from 0.1 mm to 10 mm.
5. The implant of claim 1 , wherein the second upper thread or yarn and second lower thread or yarn envelope the first upper thread and the first lower thread at the vertex of the at least one corner at least two times.
6. The implant of claim 1 , wherein the second upper thread or yarn passes over the first upper and lower threads or yarns at the vertex of the least one corner, and wherein the second lower thread or yarn pass under the first upper and lower threads or yarns at the vertex of the at least one corner.
7. The implant of claim 1 , wherein the first upper thread or yarn, the first lower thread or yarn, the second upper thread or yarn, and the second lower thread or yarn comprise a biocompatible material.
8. The implant of claim 7 , wherein the biocompatible material is resorbable.
9. The implant of claim 1 , wherein the first upper thread or yarn, the first lower thread or yarn, the second upper thread or yarn, and the second lower thread or yarn comprise a monofilament thread.
10. The implant of claim 9 , wherein the monofilament thread comprises a monofilament polyethylene thread.
11. A mesh implant, comprising:
a substrate having a mesh formed therein, the mesh comprising:
a first stitch pattern including a first upper thread and a first lower thread, the first stitch pattern having a plurality of corners; and
a second stitch pattern including a second upper thread and a second lower thread, wherein the second upper thread and the second lower thread encircle the first upper thread and the first lower thread at a vertex of at least one of the plurality of corners.
12. The implant of claim 11 , wherein the plurality of corners comprises one or more curves, one or more angles, or a combination of one or more curves and one or more angles.
13. The implant of claim 11 , wherein the plurality of corners forms a zigzag stitch pattern.
14. The implant of claim 11 , wherein the mesh comprises one or more of polydioxanone, polycarbonate, polyurethane, poly(alpha-ester) polyglycolide, poly(L-lactic acid), poly(D-lactic acid), poly(D,L-lactic acid), poly (4-hydroxybutyric acid), polycaprolactone, polyethylene, polypropylene, polyester, poly(propylene fumarate), polyanhydride, polyacetal, polycarbonate, poly(ortho ester) polyphosphazene, polyphosphoester, polytetrafluoroethylene, and polyethylene terephthalate.
15. The implant of claim 11 , wherein the second upper thread or yarn and second lower thread or yarn encircle the first upper thread and the first lower thread at the vertex of the at least one corner of the plurality of corners at least two times.
16. The implant of claim 11 , wherein the second upper thread or yarn and second lower thread or yarn encircle the first upper thread and the first lower thread at the vertex of the at least one corner of the plurality of corners at least three times.
17. The implant of claim 11 , wherein the mesh is configured to form pores having a length, width, or diameter ranging from 0.1 mm to 10 mm.
18. The implant of claim 11 , wherein the substrate comprises a biotextile comprising an extracellular matrix.
19. A mesh implant, comprising:
a substrate having a mesh formed therein, the mesh comprising:
a first stitch pattern including a first upper thread and a first lower thread, the first stitch pattern having a plurality of corners; and
a second stitch pattern including a second upper thread and a second lower thread, wherein the second upper thread and the second lower thread encircle the first upper thread and the first lower thread at a vertex of at least one of the plurality of corners, and wherein the second stitch pattern is threaded through the substrate adjacent to the vertex of the at least one of the plurality of corners.
20. The implant of claim 19 , wherein the second upper thread or yarn and second lower thread or yarn encircle the first upper thread and the first lower thread at the vertex of the at least one corner of the plurality of corners at least two times.