Observation apparatus
An observation apparatus is provided with: an illumination optical system that emits illumination light upward from below a specimen; and an image-capture optical system that captures, below the specimen, transmitted light which is the illumination light that has been reflected above the specimen and passed through the specimen, wherein the illumination optical system is provided with a diffusion plate, the image-capture optical system is provided with an objective optical system, and, in the case in which an emission region in the illumination optical system is projected to a pupil of the image-capture optical system, predetermined conditions are satisfied so as to partially block the illumination light at an edge portion of the pupil of the objective optical system.
1. An observation apparatus comprising:
an illumination optical system that emits illumination light upward from below a specimen accommodated in a container; and
an image-capture optical system that captures, below the specimen, transmitted light which is the illumination light emitted from the illumination optical system that has been reflected above the specimen and passed through the specimen,
wherein the illumination optical system is provided with a diffusion member that spreads out the illumination light from an emission region having a specific area,
the image-capture optical system is provided with an objective optical system that collects the transmitted light, and
in the case in which the emission region in the illumination optical system is projected to a pupil of the objective optical system, the following conditions are satisfied so as to partially block the illumination light at an edge portion of the pupil of the objective optical system;
NA min>( D +FOVy)/(4 Ht min-4 Hb min+2WD)
NA min>(FOV y+T/ 2)/(2 Ht min-2 Hb min)
Y 2>NA(2 Ht max+ H″−Hb max)+(FOV y/ 2)
Y 1>NA(2 Ht min+ H″−Hb min)+(FOV y/ 2)
where NA min is a lowest value of a numerical aperture on a specimen side of the objective optical system required on the basis of an oblique-illumination condition; D is a diameter of a portion of a frame of the objective optical system close to the specimen; FOVy is an actual field of view of the objective optical system; Ht min is a lowest value of a height of a reflection surface for the illumination light above the specimen with respect to a container mounting surface; Hb min is a lowest value of a height of a surface at which the illumination light is incident on the specimen with respect to the container mounting surface; WD is a working distance of the objective optical system; T is a difference between the diameter of the portion of the frame of the objective optical system close to the specimen and a diameter of an effective luminous-flux of the objective optical system at that portion; Y 2 is a distance to an end in the emission region of the diffusion member, which is far from the objective optical system with respect to an optical axis of the objective optical system; Ht max is a highest value of the height of the reflection surface for the illumination light above the specimen with respect to the container mounting surface; H″ is a height of the container mounting surface with respect to the emission region of the diffusion member; Hb max is a highest value of the height of the surface at which the illumination light is incident on the specimen with respect to the container mounting surface; and Y 1 is the distance to an end in the emission region of the diffusion member close to the objective optical system with respect to the optical axis of the objective optical system.
2. An observation apparatus according to claim 1 , further comprising a stage configured to move the diffusion member in at least one of a direction along the optical axis of the objective optical system and a direction that intersects the optical axis.
3. An observation apparatus according to claim 1 , further comprising a height-correcting tool having the reflection surface and disposed above the specimen.