Imprint device, imprint method and method of manufacturing semiconductor device
An imprint device, including a template which has a first surface and a second surface opposite to the first surface, and is provided with a pedestal portion on the first surface, the pedestal portion defining a pattern; a holding portion configured to hold the template; and a magnification adjustment unit disposed at a position corresponding to the pattern of the pedestal portion on a second surface side of the template without contacting the template.
1. An imprint device, comprising: a template which has a first surface and a second surface opposite to the first surface, and is provided with a pedestal portion on the first surface, the pedestal portion defining a pattern; a holding portion configured to hold the template; and a magnification adjustment unit disposed at a position corresponding to the pattern of the pedestal portion on a second surface side of the template without contacting the template; wherein the magnification adjustment unit comprises an electromagnetic wave generation source that includes: a frame; a plurality of heating wires; and a grip option configured to be gripped by the operation unit.
2. The imprint device according to claim 1 ,
wherein the template defines an opening on the second surface thereof, and
the magnification adjustment unit is disposed completely within the opening without contacting a bottom surface of the opening.
3. The imprint device according to claim 2 ,
wherein the magnification adjustment unit includes an electromagnetic wave generation source which is configured to generate electromagnetic waves with a wavelength longer than visible light.
4. The imprint device according to claim 2 , further comprising an air conditioner,
wherein the magnification adjustment unit includes an outlet through which air from the air conditioner is blown toward the bottom surface of the opening.
5. The imprint device according to claim 2 , further comprising:
an operation unit which is configured to switch between a first state where the magnification adjustment unit is disposed at a position corresponding to the pattern of the pedestal portion in the opening and a second state where the magnification adjustment unit is retracted from the opening.
6. The imprint device according to claim 2 , further comprising:
an operation unit which is configured to switch between a first state where the magnification adjustment unit is disposed at a position overlapping the pattern of the pedestal portion when viewed through the opening from a direction perpendicular to the first surface, and a second state where the magnification adjustment unit is retracted to a position not overlapping the pattern of the pedestal portion when viewed through the opening from the direction perpendicular to the first surface.
7. An imprint method, comprising: holding a template which has a first surface and a second surface opposite to the first surface and is provided with a pedestal portion defining a pattern on the first surface; disposing a magnification adjustment unit at a position corresponding to the pedestal portion on a second surface side of the template without contacting the template; and adjusting a magnification of the pedestal portion using the magnification adjustment unit; wherein the magnification adjustment unit comprises an electromagnetic wave generation source that includes: a frame; a plurality of heating wires; and a grip portion configured to be gripped by the operation unit.
8. The method according to claim 7 ,
wherein the template defines an opening on the second surface thereof, and
disposing the magnification adjustment unit comprises disposing the magnification adjustment unit completely within the opening without contacting a bottom surface of the opening.
9. The method according to claim 8 , further comprising generating electromagnetic waves with a wavelength longer than visible light using the magnification adjustment unit.
10. The method according to claim 8 , wherein the magnification adjustment unit includes an outlet, the method further comprising blowing air from an air conditioner through the outlet towards the bottom surface of the opening.
11. The method according to claim 8 , further comprising using an operation unit to switch between a first state where the magnification adjustment unit is disposed at a position corresponding to the pattern of the pedestal portion in the opening and a second state where the magnification adjustment unit is retracted from the opening.
12. The method according to claim 8 , further comprising using an operation unit to switch between a first state where the magnification adjustment unit is disposed at a position overlapping the pattern of the pedestal portion when viewed through the opening from a direction perpendicular to the first surface, and a second state where the magnification adjustment unit is retracted to a position not overlapping the pattern of the pedestal portion when viewed through the opening from the direction perpendicular to the first surface.
13. A method of manufacturing a semiconductor device, comprising:
supplying a photosensitive material onto a substrate;
adjusting magnification of a pedestal portion of a template by the imprint method according to claim 7 ;
pressing the adjusted pedestal portion of the template against the photosensitive material on the substrate;
curing the photosensitive material; and
releasing the template from the cured photosensitive material.
14. An imprint device, comprising: a template which has a first surface and a second surface opposite to the first surface, and is provided with a pedestal portion on the first surface, the pedestal portion defining a pattern; a magnification adjustment unit; and an operation unit configured to grip the template and to position the template at a position corresponding to the pattern of the pedestal portion on a second surface side of the template without contacting the magnification adjustment unit; wherein the magnification adjustment unit comprises an electromagnetic wave generation source that includes: a frame; a plurality of heating wires; and a grip portion configured to be gripped by the operation unit.
15. The imprint device of claim 14 further comprising: a power supply connected to the magnification adjustment unit by wirings; and a light source.
16. The imprint device of claim 15 , wherein the operation unit is configured to switch between a first state wherein the light source is retracted to a position that does not contact the wirings, and a second state wherein the light source positioned between the wirings and the template.
17. A method of manufacturing a semiconductor device, comprising:
supplying a photosensitive material onto a substrate;
adjusting magnification of a pedestal portion of a template using the imprint device of claim 14 ;
pressing the adjusted pedestal portion of the template against the photosensitive material on the substrate;
curing the photosensitive material; and
releasing the template from the cured photosensitive material.
18. The method of claim 17 , further comprising setting a control amount of magnification adjustment for the magnification adjustment unit.
19. The method of claim 18 , wherein the control amount relates to at least one of an electric power supplied from a power source to an electromagnetic wave generation source of the magnification adjustment unit, and a distance from the electromagnetic wave generation source to a bottom surface of an opening of the template.
20. The imprint device of claim 14 , wherein the magnification adjustment unit is configured to move in a vertical direction against the template.
21. The imprint device of claim 14 , wherein the magnification adjustment unit is configured to move in a horizontal direction against the template.