IP Library Granted Patent US 10,964,883
Granted Patent B2
US 10,964,883 · App. 16/298,849 · Granted Mar 30, 2021

Magnetic storage device

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Quick Facts
Patent No.
US 10,964,883
App. No.
16/298,849
Granted
Mar 30, 2021
Kind
B2
Abstract

According to one embodiment, a magnetic storage device includes a magnetoresistive effect element. The magnetoresistive effect element including: a first ferromagnetic layer; a second ferromagnetic layer; a first non-magnetic layer between the first ferromagnetic layer and the second ferromagnetic layer; a second non-magnetic layer at an opposite side of the first non-magnetic layer relative to the first ferromagnetic layer; and a third non-magnetic layer at an opposite side of the first ferromagnetic layer relative to the second non-magnetic layer. The second non-magnetic layer including rare-earth oxide, and the third non-magnetic layer including ruthenium (Ru) or molybdenum (Mo).

Claims (45)

1. A magnetic storage device comprising:

a magnetoresistive effect element (MTJ),

the magnetoresistive effect element including:

a first ferromagnetic layer;

a second ferromagnetic layer;

a first non-magnetic layer between the first ferromagnetic layer and the second ferromagnetic layer;

a second non-magnetic layer provided at a side of the first ferromagnetic layer opposite to a side of the first ferromagnetic layer at which the first non-magnetic layer is provided; and

a third non-magnetic layer provided at a side of the second non-magnetic layer opposite to a side of the second non-magnetic layer at which the first ferromagnetic layer is provided,

wherein:

the second non-magnetic layer includes a rare-earth oxide, and

the third non-magnetic layer includes one of ruthenium (Ru) and molybdenum (Mo).

2. The device of claim 1 , wherein:

the third non-magnetic layer further includes at least one element selected from boron (B), silicon (Si), and carbon (C).

3. The device of claim 1 , wherein:

the third non-magnetic layer has an amorphous structure.

4. The device of claim 1 , wherein:

the third non-magnetic layer is in contact with the second non-magnetic layer.

5. The device of claim 1 , wherein:

a film thickness of the third non-magnetic layer is within a range from 0.5 nanometers to 3 nanometers.

6. The device of claim 1 , wherein:

the second non-magnetic layer includes at least one oxide of rare-earth element selected from scandium (Sc), yttrium (Y), lanthanum (La), neodymium (Nd), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), and dysprosium (Dy).

7. The device of claim 6 , wherein:

the second non-magnetic layer further includes boron (B).

8. The device of claim 7 , wherein:

the second non-magnetic layer further includes iron (Fe).

9. The device of claim 1 , wherein:

the second non-magnetic layer is in contact with the first ferromagnetic layer.

10. The device of claim 1 , wherein:

a film thickness of the second non-magnetic layer is within a range from 0.5 nanometers to 2 nanometers.

11. The device of claim 10 , wherein:

the film thickness of the second non-magnetic layer is within a range from 0.7 nanometers to 1.3 nanometers.

12. The device of claim 1 , wherein:

the first ferromagnetic layer includes at least one element selected from iron (Fe), cobalt (Co), and nickel (Ni).

13. The device of claim 1 , wherein:

the second ferromagnetic layer includes at least one element selected from iron (Fe), cobalt (Co), and nickel (Ni).

14. The device of claim 1 , wherein:

a magnetization of the first ferromagnetic layer is smaller than a magnetization of the second ferromagnetic layer.

15. The device of claim 1 , wherein:

a film thickness of the first ferromagnetic layer is within a range from 1 nanometer to 3 nanometers.

16. The device of claim 15 , wherein:

the film thickness of the first ferromagnetic layer is within a range from 1 nanometer to 2 nanometers.

17. The device of claim 1 , further comprising:

a switching element coupled to the magnetoresistive effect element.

18. The device of claim 1 , wherein:

the first ferromagnetic layer, the first non-magnetic layer, and the second ferromagnetic layer form a magnetic tunnel junction.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Jan 31, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 058905/0582 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2019
From: WATANABE, DAISUKE; NAGASE, TOSHIHIKO
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 049379/0397 →