Low melting temperature metal purification and deposition
Implementations described herein generally relate to low melting temperature metal or alloy metal deposition and processing. More particularly, the implementations described herein relate to methods and systems for low melting temperature metal or alloy metal deposition and processing for printed electronics and electrochemical devices. In yet another implementation, a method is provided. The method comprises exposing a molten metal source to a purification process to remove unwanted quantities of contaminants, delivering the filtered molten metal to a three dimensional printing device, and forming a metal film on a substrate by printing the filtered molten metal on the substrate. The purification process comprises delivering the molten metal to a filter assembly, wherein the filter assembly includes at least one of: a skimmer device, a metal mesh filter, and a foam filter, and filtering the molten metal through the filter assembly.
1. A method of forming an anode electrode structure, comprising:
exposing a molten metal source to a purification process to remove unwanted quantities of contaminants, comprising:
delivering a molten metal from the molten metal source to a filter assembly, wherein the filter assembly comprises at least one of a skimmer device, a metal mesh filter, and a foam filter; and
filtering the molten metal through the filter assembly to form a filtered molten metal;
delivering the filtered molten metal to a three dimensional printing device; and
forming a metal film on a substrate by printing the filtered molten metal on the substrate, wherein the substrate is at least one of a polymeric separator film or a conductive current collector.
2. The method of claim 1 , wherein the molten metal has a melting temperature of 1,000 degrees Celsius or less.
3. The method of claim 2 , wherein the molten metal has a melting temperature of 800 degrees Celsius or less.
4. The method of claim 3 , wherein the molten metal has a melting temperature of 700 degrees Celsius or less.
5. The method of claim 1 , wherein the molten metal is selected from the group consisting of alkali metal, magnesium, zinc, cadmium, aluminum, gallium, indium, thallium, tin, lead, antimony, bismuth, tellurium, alkali earth metals, silver, and combinations thereof.
6. The method of claim 5 , wherein the metal mesh filter is composed of copper, aluminum, nickel, stainless steel, or combinations thereof.
7. The method of claim 6 , wherein the foam filter is composed of copper, copper-zinc, aluminum, nickel, stainless steel, or combinations thereof.
8. A method of forming an anode electrode structure, comprising:
exposing a molten lithium source to a purification process to remove unwanted quantities of contaminants, comprising:
delivering a molten lithium from the molten lithium source to a filter assembly, wherein the filter assembly comprises a skimmer device, a metal mesh filter, or a foam filter; and
filtering the molten lithium through the filter assembly to form a filtered molten lithium;
delivering the filtered molten lithium to a three dimensional printing device; and
forming a lithium metal film on a substrate by printing the filtered molten lithium on the substrate, wherein the substrate is at least one of a polymeric separator film or a conductive current collector.
9. The method of claim 8 , wherein the metal mesh filter is composed of copper, aluminum, nickel, stainless steel, or combinations thereof.
10. The method of claim 8 , wherein the foam filter is composed of copper, copper-zinc, aluminum, nickel, stainless steel, or combinations thereof.
11. The method of claim 8 , wherein the substrate is the conductive current collector and the conductive current collector is copper.
12. The method of claim 8 , wherein the substrate is the polymeric separator film and the polymeric separator film comprises a microporous polymeric substrate capable of conducting ions.
13. The method of claim 8 , wherein the lithium metal film has a thickness from about 5 micrometers to about 20 micrometers.
14. A method of forming an anode electrode structure, comprising:
forming a barrier film on a conductive current collector, wherein the barrier film is selected from titanium (Ti), molybdenum (Mo), tungsten (W), zirconium (Zr), hafnium (Hf), niobium (Nb), tantalum (Ta) and combinations thereof;
forming a wetting film on the barrier film, wherein the wetting film is selected from silicon (Si), tin (Sn), aluminum (Al), germanium (Ge), antimony (Sb), lead (Pb), bismuth (Bi), gallium (Ga), indium (In), zinc (Zn), cadmium (Cd), magnesium (Mg), oxides thereof, nitrides thereof, or combinations thereof; and
exposing molten lithium to a purification process to remove unwanted quantities of contaminants and form a purified molten lithium;
delivering the purified molten lithium to a three dimensional printing device; and
forming a lithium metal film on the wetting film by printing the purified molten lithium on the wetting film.
15. The method of claim 14 , further comprising forming a protective film on the lithium metal film, wherein the protective film is a lithium ion-conducting material or an interleaf film.
16. The method of claim 14 , wherein the conductive current collector is copper.
17. The method claim 14 , wherein the lithium metal film has a thickness from about 5 micrometers to about 20 micrometers.
18. The method of claim 14 , wherein the purification process comprises:
delivering the molten lithium to a filter assembly, wherein the filter assembly comprises a skimmer device, a metal mesh filter, or a foam filter; and
filtering the molten lithium through the filter assembly to purify the molten lithium.
19. The method of claim 18 , wherein the metal mesh filter is composed of copper, aluminum, nickel, stainless steel, or combinations thereof.
20. The method of claim 19 , wherein the foam filter is composed of copper, copper-zinc, aluminum, nickel, stainless steel, or combinations thereof.