IP Library Granted Patent US 10,763,845
Granted Patent B2
US 10,763,845 · App. 16/314,783 · Granted Sep 1, 2020

Semiconductor device

Inventors: Shinichirou Wada (Tokyo, JP); Masahito Sonehara (Hitachinaka, JP)
Assignee: Hitachi Automotive Systems, Ltd.
H03K17/0822H01L21/822H01L27/0251H01L27/04H03K17/0814H03K2017/0806
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Quick Facts
Patent No.
US 10,763,845
App. No.
16/314,783
Granted
Sep 1, 2020
Kind
B2
Abstract

A semiconductor device capable of enhancing uniformity of temperatures of transistors in an active clamp state while maintaining current performance is provided. A power transistor is connected to a power transistor in parallel. An active clamp circuit is provided in a path from a connection point between the power transistors to a gate of the power transistor and is conducted in a case where a voltage of the connection point exceeds a first threshold. An active clamp cutoff circuit is provided in a path from the active clamp circuit to a gate of the power transistor and cuts off or suppresses a current flowing into the path.

Claims (33)

1. A semiconductor device comprising:

a first transistor including a first control electrode;

a second transistor connected to the first transistor in parallel and including a second control electrode;

an active clamp circuit configured to be provided in a first path from a first connection point between the first transistor and the second transistor to the first control electrode and to be conducted in a case where a voltage of the first connection point exceeds a first threshold; and

an active clamp cutoff circuit configured to be provided in a second path from the active clamp circuit to the second control electrode and to cut off or suppress a current flowing into the second path, wherein

the first control electrode and the second control electrode are gates.

2. The semiconductor device according to claim 1 , further comprising:

a semiconductor substrate, wherein

the first transistor is formed in a first region on the semiconductor substrate, and

the second transistor is formed in a second region adjacent to the first region.

3. The semiconductor device according to claim 2 , wherein

the first region includes two regions adjacent to the second region.

4. The semiconductor device according to claim 3 , wherein

the second region is positioned in a center part of the semiconductor substrate.

5. The semiconductor device according to claim 1 , further comprising:

a temperature detection circuit configured to detect a temperature of the second transistor, wherein

the active clamp cutoff circuit includes a third transistor which is turned on in a case where the temperature of the second transistor is equal to or lower than a second threshold and is turned off in a case where the temperature of the second transistor exceeds the second threshold.

6. The semiconductor device according to claim 5 , wherein

the active clamp cutoff circuit includes a resistor connected to the third transistor in parallel.

7. The semiconductor device according to claim 1 , further comprising:

an active clamp detection circuit configured to detect an active clamp state indicating a state where the active clamp circuit is conducted, wherein

the active clamp cutoff circuit includes a third transistor which is turned on in a case where the active clamp state is not detected and is turned off in a case where the active clamp state is detected.

8. The semiconductor device according to claim 4 , wherein

a temperature of the second transistor in a case where the second transistor is turned on is higher than a temperature of the first transistor in a case where the first transistor is turned on.

9. The semiconductor device according to claim 5 , wherein

the temperature detection circuit includes a thermal diode of which a forward voltage is decreased as a temperature increases and a comparator which compares the forward voltage of the thermal diode with a reference voltage.

10. The semiconductor device according to claim 2 , wherein

the first transistor includes first-group semiconductor elements arranged in parallel on the semiconductor substrate,

the second transistor includes second-group semiconductor elements arranged in parallel on the semiconductor substrate, and

the semiconductor element is a MOSFET or an IGBT.

11. The semiconductor device according to claim 1 , further comprising:

a first resistor connected between a second connection point between the first transistor and the second transistor and the first control electrode; and

a second resistor connected between the second connection point and the second control electrode.

Assignments (2)
CHANGE OF NAME Recorded Nov 30, 2021
From: HITACHI AUTOMOTIVE SYSTEMS, LTD.
To: HITACHI ASTEMO, LTD.
Reel/Frame 058481/0935 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 2, 2019
From: WADA, SHINICHIROU; SONEHARA, MASAHITO
To: HITACHI AUTOMOTIVE SYSTEMS, LTD.
Reel/Frame 047883/0380 →
Priority Claims (1)
JP 2016-170716 · Sep 1, 2016 · national
Continuity (1)
Related Publication 20190260371A1 · Aug 22, 2019
Cited By (1)
US 12,431,886