Capacitive micromachined ultrasonic transducer and ultrasonic imaging apparatus using the same
A capacitive micromachined ultrasonic transducer 111 A includes: a silicon substrate 101; an insulating film 102 formed over the silicon substrate 101; a lower electrode 103 ; insulating films 104 and 106; a cavity 105 constituted by a void formed in a portion of the insulating film 106; an upper electrode 107; insulating films 108 and 114; and a protective film 109. In addition, the insulating film 106, upper electrode 107, insulating film 108 and insulating film 114 above the cavity 105 configure a vibration film 110, and the protective film 109 above the vibration film 110 is divided into a plurality of isolated patterns regularly arranged with a gap 115 having a constant spacing formed therebetween.
1. A capacitive micromachined ultrasonic transducer comprising:
a substrate;
a lower electrode formed on the substrate;
a cavity formed in a portion of a first insulating film formed over the lower electrode;
an upper electrode formed on the first insulating film;
a second insulating film formed over the upper electrode;
a protective film formed over the second insulating film; and
a vibration film constituted by the first insulating film, upper electrode and second insulating film above the cavity,
wherein the protective film above the vibration film is divided into a plurality of patterns arranged with a gap having a predetermined spacing formed therebetween, and
wherein a Young's modulus of the protective film above a peripheral portion of the vibration film is lower than a Young's modulus of the protective film above a center portion of the vibration film.
2. The capacitive micromachined ultrasonic transducer according to claim 1 ,
wherein a pattern density of the protective film above a peripheral portion of the vibration film is lower than a pattern density of the protective film above a center portion of the vibration film.
3. The capacitive micromachined ultrasonic transducer according to claim 1 ,
wherein a film thickness of the protective film above a peripheral portion of the vibration film is thinner than a film thickness of the protective film above a center portion of the vibration film.
4. An ultrasonic imaging apparatus comprising an ultrasonic probe that includes the capacitive micromachined ultrasonic transducer according to claim 1 .
5. The capacitive micromachined ultrasonic transducer according to claim 2 ,
wherein a planar size of the protective film above the peripheral portion of the vibration film is smaller than a planar size of the protective film above the center portion of the vibration film.
6. The capacitive micromachined ultrasonic transducer according to claim 2 ,
wherein the spacing of the gap in the protective film above the peripheral portion of the vibration film is larger than the spacing of the gap in the protective film above the center portion of the vibration film.