IP Library Granted Patent US 11,469,213
Granted Patent B2
US 11,469,213 · App. 16/325,970 · Granted Oct 11, 2022

Systems, methods, and apparatuses for implementing reduced height semiconductor packages for mobile electronics

Inventors: Georg Seidemann (Landshut, DE); Thomas Wagner (Regelsbach, DE); Klaus Reingruber (Langquaid, DE); Bernd Waidhas (Pettendorf, DE); Andreas Wolter (Regensburg, DE)
Assignee: Intel Corporation
H01L25/0657H01L23/00H01L23/31H01L23/49816H01L24/24H01L24/73H01L29/0657H01L24/16H01L24/48H01L2224/05H01L2224/13025H01L2224/16227H01L2224/244H01L2224/24051H01L2224/24147H01L2224/32145H01L2224/32225H01L2224/48091H01L2224/48148H01L2224/48227H01L2224/73204H01L2224/73257H01L2224/73259H01L2224/73265H01L2224/97H01L2225/0651H01L2225/06506H01L2225/06517H01L2225/06541H01L2225/06544H01L2225/06555H01L2924/10158H01L2924/13091H01L2924/15311
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Quick Facts
Patent No.
US 11,469,213
App. No.
16/325,970
Granted
Oct 11, 2022
Kind
B2
Abstract

In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for implementing reduced height semiconductor packages for mobile electronics. For instance, there is disclosed in accordance with one embodiment a stacked die package having therein a bottom functional silicon die; a recess formed within the bottom functional silicon die by a thinning etch partially reducing a vertical height of the bottom functional silicon die at the recess; and a top component positioned at least partially within the recess formed within the bottom functional silicon die. Other related embodiments are disclosed.

Claims (99)

1. A stacked die package, comprising:

a bottom functional silicon die, wherein the bottom functional silicon die comprises a plurality of Through Silicon Vias (TSVs);

a recess within the bottom functional silicon die, the recess having a perimeter, wherein the plurality of TSVs is outside of the perimeter of the recess, and wherein there are no TSVs in the bottom functional silicon die inside of the perimeter of the recess; and

a top component positioned at least partially within the recess within the bottom functional silicon die, wherein the top component is directly electrically connected to one or more of the plurality of TSVs outside of the perimeter of the recess.

2. The stacked die package of claim 1 , wherein the top component positioned at least partially within the recess within the bottom functional silicon die comprises a top functional silicon die positioned at least partially within the recess of the bottom functional silicon die.

3. The stacked die package of claim 1 , wherein the top component positioned at least partially within the recess within the bottom functional silicon die comprises a heat spreader to extract heat away from a logic device integrated within the bottom functional silicon die.

4. The stacked die package of claim 1 , wherein the top component positioned at least partially within the recess within the bottom functional silicon die comprises one of:

a passive device;

a memory chip, an upper functional silicon die,

a System on a Chip (SoC) device, a sensor unit, a receiver, a transmitter, or a transceiver.

5. The stacked die package of claim 1 , wherein the recess within the bottom functional silicon die is formed by a chemical wet etch process to open a trough within the bottom functional silicon die, wherein the trough forms the recess within which the top component is positioned.

6. The stacked die package of claim 1 , wherein the recess within the bottom functional silicon die is formed by a Reactive Ion Etching (ME) process to open the recess within the bottom functional silicon die within which the top component is positioned.

7. The stacked die package of claim 1 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die; and

wherein the bottom functional silicon die is electrically interfaced to the substrate via micro-balls of a Ball Grid Array or via a Flip-Chip Ball Grid Array (FCBGA) or via Copper pillar.

8. The stacked die package of claim 1 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die;

wherein the top component comprises an upper functional silicon die positioned at least partially within the recess of the bottom functional silicon die;

wherein the bottom functional silicon die is electrically interfaced to the substrate via micro-balls of a Ball Grid Array (BGA) or via a Flip-Chip Ball Grid Array (FCBGA) or via Copper pillar; and

wherein the upper functional silicon die is electrically interfaced to the substrate via wire bonds from contacts at a top surface of the upper functional silicon die over one or more sides of the bottom functional silicon die to the substrate.

9. The stacked die package of claim 1 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die;

wherein the top component comprises an upper functional silicon die positioned at least partially within the recess of the bottom functional silicon die;

wherein each of the TSVs providing an electrical pathway from a top surface of the bottom functional silicon die to a bottom surface of the bottom functional silicon die;

wherein the upper functional silicon die is electrically interfaced to the substrate via wire bonds from contacts at a top surface of the upper functional silicon die to the plurality of TSVs of the bottom functional silicon die, the TSVs of the bottom functional silicon die providing electrical connectivity from the top surface of the bottom functional silicon die to the bottom surface of the bottom functional silicon die; and

wherein the bottom surface of the functional silicon die is electrically interfaced to the substrate via micro-balls between the bottom surface of the functional silicon die and a top surface of the substrate.

10. The stacked die package of claim 1 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die;

wherein the top component comprises an upper functional silicon die positioned at least partially within the recess of the bottom functional silicon die;

wherein each of the TSVs provide an electrical pathway from a top surface of the bottom functional silicon die to a bottom surface of the bottom functional silicon die;

wherein the upper functional silicon die is electrically interfaced to the substrate using a Re-Distribution Layer (RDL) providing electrical connectivity from contacts at a top surface of the upper functional silicon die to the plurality of TSVs of the bottom functional silicon die, the TSVs of the bottom functional silicon die providing electrical connectivity from the top surface of the bottom functional silicon die to the bottom surface of the bottom functional silicon die; and

wherein the bottom surface of the functional silicon die is electrically interfaced to the substrate via micro-balls between the bottom surface of the functional silicon die and a top surface of the substrate.

11. The stacked die package of claim 1 , further comprising:

a substrate electrically interfaced with the bottom functional silicon die;

a plurality of micro-balls providing electrical connectivity between a bottom surface of the bottom functional semiconductor die and a top surface of the substrate of the stacked die package; and

solder balls at a bottom surface of the substrate to provide electrical connectivity from the substrate of the stacked die package to another circuit board, printed circuit board, assembly board, mother board, or sub-assembly board of a consumer electronics device.

12. The stacked die package of claim 1 :

wherein the top component has a height which is fully encompassed within a height of the recess within the bottom functional silicon die; and

wherein a top surface of the top component is planar with a top non-recessed surface of the bottom functional silicon die.

13. The stacked die package of claim 1 :

wherein the top component has a height which is greater than a height of the recess within the bottom functional silicon die; and

wherein a top surface of the top component protrudes beyond a top non-recessed surface of the bottom functional silicon die.

14. A method of manufacturing a stacked die package, comprising:

fabricating a bottom functional silicon die including opening a plurality of Through Silicon Vias (TSVs) vertically through the bottom functional silicon die;

etching a trough into the bottom functional silicon die partially reducing a vertical height of the bottom functional silicon die in a localized area at the trough to form a recess within the bottom functional silicon die, the recess having a perimeter, wherein the plurality of TSVs is outside of the perimeter of the recess, and wherein there are no TSVs in the bottom functional silicon die inside of the perimeter of the recess;

positioning a top component at least partially within the recess within the bottom functional silicon die; and

directly electrically connecting the top component to one or more of the plurality of TSVs outside of the perimeter of the recess.

15. The method of claim 14 , wherein positioning the top component at least partially within the recess within the bottom functional silicon die comprises:

positioning the top component via a pick and place operation; and

affixing the top component positioned within the recess of the bottom functional silicon die via a glue or a die attached film.

16. The method of claim 14 , wherein the stacked die package further comprises a substrate electrically interfaced with a bottom surface of the bottom function silicon die; wherein electrically interfacing the substrate to the bottom surface of the bottom functional silicon die comprises; affixing the substrate to the bottom surface of the bottom functional silicon die via micro-balls of a Ball Grid Array using a reflow operation.

17. The method of claim 14 , wherein etching the trough into the bottom functional silicon die comprises performing a chemical wet etch to open the trough within the bottom functional silicon die, wherein the trough forms the recess within which the top component is positioned.

18. The method of claim 14 , wherein etching the trough into the bottom functional silicon die comprises performing a Reactive Ion Etching (RIE) process to open the recess within the bottom functional silicon die within which the top component is positioned.

19. The method of claim 14 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die;

wherein the top component comprises an upper functional silicon die positioned at least partially within the recess of the bottom functional silicon die; and

wherein the method further comprises wire bonding contacts at a top surface of the upper functional silicon die to a top surface of the substrate over one or more sides of the bottom functional silicon die.

20. The method of claim 14 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die;

wherein the top component comprises an upper functional silicon die positioned at least partially within the recess of the bottom functional silicon die; and

wherein the method further comprises:

each of the TSVs providing an electrical pathway from a top surface of the bottom functional silicon die to a bottom surface of the bottom functional silicon die; and

electrically interfacing contacts at a top surface of the upper functional silicon die to the plurality of TSVs of the bottom functional silicon die, the TSVs of the bottom functional silicon die providing electrical connectivity from the top surface of the bottom functional silicon die to the bottom surface of the bottom functional silicon die; and

wherein the bottom surface of the functional silicon die is electrically interfaced to the substrate via micro-balls between the bottom surface of the functional silicon die and a top surface of the substrate.

21. The method of claim 14 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die;

wherein the top component comprises an upper functional silicon die positioned at least partially within the recess of the bottom functional silicon die; and

wherein the method further comprises:

opening the plurality of Through Silicon Vias (TSVs) vertically through the bottom functional silicon die, each of the TSVs providing an electrical pathway from a top surface of the bottom functional silicon die to a bottom surface of the bottom functional silicon die; and

depositing metal at a top surface of the upper functional silicon die forming a Re-Distribution Layer (RDL) providing electrical connectivity from contacts at the top surface of the upper functional silicon die to the plurality of TSVs of the bottom functional silicon die, the TSVs of the bottom functional silicon die providing electrical connectivity from the top surface of the bottom functional silicon die to the bottom surface of the bottom functional silicon die; and

wherein the bottom surface of the bottom functional silicon die is electrically interfaced to the substrate via micro-balls between the bottom surface of the bottom functional silicon die and a top surface of the substrate.

22. An electronics module comprising:

a printed circuit board;

a stacked die package;

a plurality of solder balls electrically interfacing the stacked die package with the printed circuit board; and

wherein the stacked die package comprises:

(i) a bottom functional silicon die, wherein the bottom functional silicon die comprises a plurality of Through Silicon Vias (TSVs);

(ii) a recess within the bottom functional silicon die, the recess having a perimeter, wherein the plurality of TSVs is outside of the perimeter of the recess and wherein there are no TSVs in the bottom functional silicon die inside of the perimeter of the recess; and

(iii) a top component positioned at least partially within the recess within the bottom functional silicon die, wherein the top component is directly electrically connected to one or more of the plurality of TSVs outside of the perimeter of the recess.

23. The electronics module of claim 22 :

wherein the stacked die package further comprises a substrate electrically interfaced with the bottom functional silicon die; and

wherein the bottom functional silicon die of the stacked die package is electrically interfaced to the substrate of the stacked die package via micro-balls of a Ball Grid Array or via a Flip-Chip Ball Grid Array (FCBGA) or via Copper pillar.

24. The electronics module of claim 22 , wherein the electronics module comprises one of:

a drone and robot control electronics module;

a smart phone electronics module;

a tablet electronics module;

a gesture control electronics module for a computer;

a 3D photography electronics module;

a 3D immersive gaming electronics module;

a face recognition electronics module to perform face recognition base security in-lieu of alphanumerical passwords;

an image capture device electronics module having one or more optical and Complementary metal-oxide-semiconductor (CMOS) components affixed to the printed circuit board as the top side or bottom side components;

a depth sensing camera electronics module to perform any of stereoscopic imaging depth sensing, coded light depth sensing, or laser time of flight depth sensing.

25. The electronics module of claim 22 , wherein the electronics module is embedded within a wearable technology to be worn as one of:

a clothing item;

sports attire;

a shoe;

fashion electronics to be worn as a clothing item or an accessory;

tech togs to be worn as a clothing item or an accessory; or

fashionable technology to be worn as a clothing item or an accessory.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2022
From: SEIDEMANN, GEORG; REINGRUBER, KLAUS; WAGNER, THOMAS; WAIDHAS, BERND; WOLTER, ANDREAS
To: INTEL CORPORATION
Reel/Frame 060962/0941 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 3, 2021
From: INTEL IP CORPORATION
To: INTEL CORPORATION
Reel/Frame 057061/0588 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 9, 2021
From: INTEL IP CORPORATION
To: INTEL CORPORATION
Reel/Frame 057254/0415 →
Continuity (1)
Related Publication 20190214369A1 · Jul 11, 2019