Composition for support material and ink set for stereolithography
A composition for a support material according to the present invention is to be used in a support material for supporting a model material used to form a shaped article through ink-jet stereolithography and contains polyalkylene glycol having an oxybutylene group, a water-soluble monofunctional ethylenic unsaturated monomer, and a photopolymerization initiator, and the content of the polyalkylene glycol having an oxybutylene group is 15 parts by mass or more and 75 parts by mass or less with respect to the total mass of the composition for a support material taken as 100 parts by mass.
1. A composition for a support material to be used in a support material for supporting a model material used to form a shaped article through ink-jet stereolithography, the composition comprising:
polyalkylene glycol having an oxybutylene group,
wherein a content of the polyalkylene glycol having an oxybutylene group is 15 parts by mass or more and 75 parts by mass or less with respect to a total mass of the composition for a support material taken as 100 parts by mass.
2. The composition for a support material according to claim 1 , comprising:
the polyalkylene glycol having an oxybutylene group;
a water-soluble monofunctional ethylenic unsaturated monomer; and
a photopolymerization initiator.
3. The composition for a support material according to claim 2 ,
wherein a content of the water-soluble monofunctional ethylenic unsaturated monomer is 19 parts by mass or more and 80 parts by mass or less, and a content of the photopolymerization initiator is 2 parts by mass or more and 20 parts by mass or less, with respect to the total mass of the composition for a support material taken as 100 parts by mass.
4. The composition for a support material according to claim 2 , further comprising:
a surface controlling agent,
wherein a content of the surface controlling agent is 0.005 parts by mass or more and 3.0 parts by mass or less with respect to the total mass of the composition for a support material taken as 100 parts by mass.
5. The composition for a support material according to claim 2 , further comprising a water-soluble organic solvent,
wherein a content of the water-soluble organic solvent is 30 parts by mass or less with respect to the total mass of the composition for a support material taken as 100 parts by mass.
6. The composition for a support material according to claim 2 , further comprising a storage stabilizer.
7. An ink set for stereolithography comprising the composition for a support material according to claim 1 , and a composition for a model material.
8. The ink set for stereolithography according to claim 7 ,
wherein the composition for a model material includes:
a monofunctional ethylenic unsaturated monomer;
a polyfunctional ethylenic unsaturated monomer having two or more functional groups;
an oligomer;
a photopolymerization initiator, and
a surface controlling agent.
9. The ink set for stereolithography according to claim 7 ,
wherein a content of the monofunctional ethylenic unsaturated monomer is 19 to 49 parts by mass, a content of the polyfunctional ethylenic unsaturated monomer having two or more functional groups is 15 to 50 parts by mass, a content of the oligomer is 10 to 45 parts by mass, a content of the photopolymerization initiator is 3 to 15 parts by mass, and a content of the surface controlling agent is 0.005 to 3.0 parts by mass, with respect to the total mass of the composition for a model material taken as 100 parts by mass.