Display substrate, organic light emitting device and display device with vapor-deposited organic film layers

1. A display substrate comprising a display area and a non-display area surrounding the display area, wherein

at least one limit mark group is disposed in the non-display area, wherein each limit mark group includes a plurality of limit marks, and the plurality of limit marks in each limit mark group are configured to define positions of theoretical vapor deposition zones, and for any one of the limit mark groups, the theoretical vapor deposition zones defined by the plurality of limit marks are arranged in an array,

the display area has a plurality of sides, and rounded chamfers are formed between adjacent two sides of the display area,

the non-display area includes a frame part opposite to the sides of the display area and corner parts opposite to the rounded chamfers, and

the limit mark group is located at the corner part.

2. The display substrate according to claim 1 , wherein for any one of the limit mark groups, the limit marks and the theoretical vapor deposition zones enclose an alignment region, and sizes of the alignment region in a length direction and in a width direction of the display area range from 100 μm to 130 μm.

3. The display substrate according to claim 1 , wherein

the limit mark is in a strip shape, and

for any one of the limit mark groups, the plurality of limit marks include at least two first limit marks and two second limit marks, wherein the first limit mark extends in a first direction, the second limit mark extends in a second direction crossing the first direction; the two first limit marks are arranged in the second direction, the two second limit marks are arranged in the first direction, and the two second limit marks are located on both sides of a central connecting line of the two first limit marks.

4. The display substrate according to claim 3 , wherein

the plurality of limit marks in the limit mark group further includes a third limit mark, the third limit mark being strip-shaped and extending in the second direction, and

the third limit mark intersects one of the first limit marks.

5. The display substrate according to claim 1 , wherein

the display area is provided with a pixel defining layer, the pixel defining layer is provided with a plurality of pixel openings, and the display area is further provided with an electrode corresponding to the pixel opening;

the non-display area is provided with an epitaxial film layer, and the epitaxial film layer is provided with a through hole corresponding to the limit mark, and the limit mark is disposed in the through hole; and

the epitaxial film layer is disposed in the same layer and formed of the same material as the electrode, and the limit mark is disposed in the same layer and formed of the same material as the pixel defining layer.

6. The display substrate according to claim 5 , wherein

one of the epitaxial film layer and the limit mark is transparent, and the other one is opaque.

7. An organic light emitting device comprising a display substrate having a display area and a non-display area surrounding the display area, wherein

at least one limit mark group is disposed in the non-display area, wherein each limit mark group includes a plurality of limit marks, and the plurality of limit marks in each limit mark group are configured to define positions of theoretical vapor deposition zones, and for any one of the limit mark groups, the theoretical vapor deposition zones defined by the plurality of limit marks are arranged in an array,

the display area has a plurality of sides, and rounded chamfers are formed between adjacent two sides of the display area,

the non-display area includes a frame part opposite to the sides of the display area and corner parts opposite to the rounded chamfers,

the limit mark group is located at the corner part, and

the display area of the display substrate is provided with a plurality of organic film layers, and the non-display area of the display substrate is provided with an alignment pattern group corresponding to the limit mark group, the alignment pattern group being located at a corner part where the corresponding limit mark group is located.

8. The organic light emitting device according to claim 7 , wherein

each alignment pattern group includes a plurality of alignment patterns, and the plurality of alignment patterns in each alignment pattern group correspond to materials of the organic film layers; and

for any one of the alignment pattern groups, the plurality of alignment patterns in the alignment pattern group correspond to the theoretical vapor deposition zones defined by the limit mark group corresponding to the alignment pattern group.

9. A film vapor-deposition detecting method of an organic light emitting device, comprising:

providing the organic light emitting device according to claim 7 ; and

determining a vapor deposition offset of the organic film layer in the display area of the display substrate in according with the limit mark group and the corresponding alignment mark group.

10. The method according to claim 9 , wherein

each alignment pattern group includes a plurality of alignment patterns, and the plurality of alignment patterns in each alignment pattern group correspond to materials of the organic film layers; and for any one of the alignment pattern groups, the plurality of alignment patterns in the alignment pattern group correspond to the theoretical vapor deposition zones defined by the limit mark group corresponding to the alignment pattern group,

the step of determining a vapor deposition offset of the organic film layer in the display area of the display substrate in according with the limit mark group and the corresponding alignment mark group comprises:

for each limit mark group, determining positions of theoretical vapor deposition zones in accordance with limit marks in the limit mark group; and

detecting an offset of actual positions of alignment patterns with respect to the positions of the respective theoretical vapor deposition zones, and using a maximum offset of the alignment patterns corresponding to the same organic film layer as the vapor deposition offset of the organic film layer.

11. The method according to claim 10 , wherein the limit mark is in a strip shape; for any one of the limit mark groups, the plurality of limit marks include at least two first limit marks and two second limit marks, wherein the first limit mark extends in a first direction, the second limit mark extends in a second direction crossing the first direction; the two first limit marks are arranged in the second direction, the two second limit marks are arranged in the first direction, and the two second limit marks are located on both sides of a central connecting line of the two first limit marks,

the step of determining positions of theoretical vapor deposition zones in accordance with limit marks in the limit mark group comprises the following steps performed in each of the alignment regions:

obtaining a center position of each of the limit marks; and

obtaining positions of a plurality of intersection points, wherein the plurality of intersection points include intersection points formed by two first straight lines extending along a first direction and two second straight lines extending along a second direction and an intersection point of a central connecting line of the two first limit marks and a central connecting line of the two second limit marks, and using the positions of the plurality of intersection points as the positions of theoretical vapor deposition zones, respectively, wherein the two first straight lines pass through centers of the two first limit marks, respectively, and the two second straight lines pass through centers of the two second limit marks, respectively,

the step of detecting an offset of actual positions of alignment patterns with respect to the positions of the respective theoretical vapor deposition zones and using a maximum offset of the alignment patterns corresponding to the same organic film layer as the vapor deposition offset of the organic film layer comprises:

obtaining a center position of each of the alignment patterns; and

calculating an offset between the center position of each of the alignment patterns and the position of the respective theoretical vapor deposition zone.

12. The method according to claim 11 , wherein the non-display area is provided with an epitaxial film layer, the epitaxial film layer is provided with a through hole corresponding to the limit mark, the limit mark is disposed in the through hole,

the step of obtaining a center position of each of the limit marks comprises:

providing a first light source and a first light collecting member on both sides of the organic light emitting device, respectively, wherein light of the first light source passes through the epitaxial film layer and the alignment patterns and collected by the first light collecting member; and

determining edge positions of the limit marks according to the light collected by the first light collecting member, and calculating center positions of the respective limit marks according to the edge positions of the limit marks,

the step of obtaining a center position of each of the alignment patterns comprises:

providing a second light source on the same side of the first light collecting member, and providing a second light collecting member on the same side of the first light source, wherein the second light source is configured to excite the alignment patterns to emit light and the second light collecting member is configured to collect the light emitted by the alignment patterns; and

determining edge positions of the alignment patterns according to the light collected by the second light collecting member, and calculating center positions of the respective alignment patterns according to the edge positions of the alignment patterns.

13. A display device, comprising an organic light emitting device having a display substrate, the display substrate including a display area and a non-display area surrounding the display area, wherein

at least one limit mark group is disposed in the non-display area, the display area has a plurality of sides, and rounded chamfers are formed between adjacent two sides of the display area, the non-display area includes a frame part opposite to the sides of the display area and corner parts opposite to the rounded chamfers, the limit mark group is located at the corner part, wherein each limit mark group includes a plurality of limit marks, and the plurality of limit marks in each limit mark group are configured to define positions of theoretical vapor deposition zones, and for any one of the limit mark groups, the theoretical vapor deposition zones defined by the plurality of limit marks are arranged in an array, and

the display area of the display substrate is provided with a plurality of organic film layers, and the non-display area of the display substrate is provided with an alignment pattern group corresponding to the limit mark group, the alignment pattern group being located at a corner part where the corresponding limit mark group is located.