IP Library Granted Patent US 11,228,843
Granted Patent B2
US 11,228,843 · App. 16/334,678 · Granted Jan 18, 2022

Electrically isolated device for providing a sub-threshold conduction path for leakage current across a piezoelectric transducer

Inventors: Ronald Gagnon (Boston, MA); Chen-Wei Huang (Boston, MA)
Assignee: Vesper Technologies Inc.
H04R17/02H01L41/042H03F3/187H04R3/00H03F2200/03
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,228,843
App. No.
16/334,678
Granted
Jan 18, 2022
Kind
B2
Abstract

A device includes: a piezoelectric transducer; a field effect transistor (FET) configured to provide a sub-threshold conduction path for leakage current across the piezoelectric transducer; wherein the FET comprises a gate; wherein each of a width and a length of the gate has a size in accordance with the sub-threshold conduction path being configured to substantially maintain an input voltage to the piezoelectric transducer across a path of the leakage current of the piezoelectric transducer.

Claims (48)

1. A device comprising:

a piezoelectric transducer;

a field effect transistor (FET) configured to provide a sub-threshold conduction path for leakage current across the piezoelectric transducer;

wherein the FET comprises a gate;

wherein each of a width and a length of the gate has a size in accordance with the sub-threshold conduction path being configured to substantially maintain an input voltage to the piezoelectric transducer across a path of the leakage current of the piezoelectric transducer.

2. The device of claim 1 , wherein the piezoelectric transducer is associated with a leakage resistance (R m ) that produces the leakage current, when in operation;

wherein each of the width and the length of gate is of a size for producing a sub-threshold drain current (I D ) of the FET that is substantially in accordance with the leakage current.

3. The device of claim 2 , wherein the FET is configured to provide the sub-threshold conduction by each of the width and the length of the gate being of a size for producing the sub-threshold drain current (I D ) of the FET that is substantially in accordance with the leakage current.

4. The device of claim 1 , wherein the FET is configured to act as a switch with an on state and an off state.

5. The device of claim 4 , wherein the FET is configured, when in the on state, to provide a lower impedance path between the input voltage and a reference voltage, relative to an impedance of the path between the input voltage and the reference voltage, when the FET is in the off state, to provide for charging of the piezoelectric transducer.

6. The device of claim 4 , wherein the FET is configured, when in the off state, to provide the sub-threshold conduction path.

7. The device of claim 1 , further comprising:

a reference voltage source for providing a reference voltage; and

an amplifier configured for operation at the reference voltage or at another voltage within a predefined range of the reference voltage;

wherein each of the width and the length of the gate have a size in accordance with the sub-threshold conduction path being configured to substantially maintain the input voltage at the reference voltage.

8. The device of claim 1 , wherein the piezoelectric transducer comprises a beam with a first electrode layer, a piezoelectric layer and a second electrode layer, wherein a top surface of the beam is associated with surface conduction that causes the leakage current across the piezoelectric transducer when the piezoelectric transducer is under bias.

9. The device of claim 7 , wherein a leakage current across the piezoelectric transducer is associated with the reference voltage.

10. The device of claim 1 , wherein the piezoelectric transducer comprises a first plate and a second plate, and wherein a leakage current is associated with a voltage differential across the first and second plates.

11. The device of claim 1 , wherein the piezoelectric transducer comprises a beam with a first electrode layer, a piezoelectric layer and a second electrode layer, wherein a material property of the piezoelectric layer causes the leakage current across the piezoelectric transducer.

12. The device of claim 1 , wherein the piezoelectric transducer comprises:

a piezoelectric sensor;

a piezoelectric resonant sensor;

an acoustic transducer;

a pressure sensor;

a chemical sensor;

an ultrasonic sensor; or

an inertial sensor.

13. The device of claim 1 , wherein the device comprises an acoustic device, a microphone or a hydrophone.

14. The device of claim 1 , further comprising:

a gate drive circuit configured to deliver a voltage to gate of the FET to charge a capacitance of the piezoelectric transducer.

15. The device of claim 1 , further comprising:

an amplifier; and

one or more electrostatic discharge (ESD) diodes to protect the amplifier from ESD.

16. A device comprising:

an integrated circuit;

a piezoelectric transducer on the integrated circuit; and

input bias circuitry on the integrated circuit, wherein the input bias circuitry is electrically isolated from the piezoelectric transducer, and wherein the input bias circuitry is configured to maintain one or more steady state operating characteristics of the piezoelectric transducer by providing a sub-threshold conduction path for sub-threshold current of the piezoelectric transducer.

17. The device of claim 16 , wherein at least one of the one or more steady state operating characteristics includes an input voltage of the piezoelectric transducer being in accordance with a reference voltage of the device.

18. The device of claim 16 , wherein the input voltage of the piezoelectric transducer being in accordance with the reference voltage of the device comprises the input voltage of the piezoelectric transducer being substantially equal to a reference voltage of the device.

19. A method comprising:

providing, by a field effect transistor, a sub-threshold conduction path for leakage current across a piezoelectric transducer; and

maintaining an input voltage to the piezoelectric transducer across a path of the leakage current of the piezoelectric transducer;

wherein each of a width and a length of a gate of the field effect transistor has a size in accordance with the sub-threshold conduction path being configured to substantially maintain the input voltage to the piezoelectric transducer across the path of the leakage current of the piezoelectric transducer.

20. The method of claim 19 , further comprising:

causing the leakage current to flow through the sub-threshold conduction path.

21. The method of claim 19 , wherein maintaining comprises:

supplying a reference voltage to the field effect transistor; and

maintaining the input voltage to be in accordance with the reference voltage.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 3, 2025
From: QUALCOMM TECHNOLOGIES, INC.
To: QUALCOMM INCORPORATED
Reel/Frame 069818/0431 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 13, 2022
From: VESPER TECHNOLOGIES INC.
To: QUALCOMM TECHNOLOGIES, INC.
Reel/Frame 061424/0533 →
EMPLOYMENT AGREEMENT Recorded Jul 5, 2022
From: HUANG, CHEN-WEI
To: VESPER TECHNOLOGIES INC.
Reel/Frame 060400/0616 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 8, 2021
From: GAGNON, RONALD
To: VESPER TECHNOLOGIES INC.
Reel/Frame 058335/0745 →
Continuity (2)
Provisional Application 62405597 · Oct 7, 2016
Related Publication 20210306759A1 · Sep 30, 2021