IP Library Granted Patent US 10,998,457
Granted Patent B2
US 10,998,457 · App. 16/339,838 · Granted May 4, 2021

Contacts for a photovoltaic cell with two active surfaces

Inventors: Pierre-Philippe Grand (Saint-Maximin la Sainte Baume, FR); Daniel Lincot (Antony, FR)
Assignees: ELECTRICITE DE FRANCE; CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE—CNRS—; PARIS SCIENCES ET LETTRES—QUARTIER LATIN
H01L31/022425C25D3/38C25D5/006C25D5/028C25D7/126C25D9/06C25D17/001H01L31/022466H01L31/022475H01L31/022483H01L31/0684H01L31/18H01L31/1884Y02E10/547
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Quick Facts
Patent No.
US 10,998,457
App. No.
16/339,838
Granted
May 4, 2021
Kind
B2
Abstract

Fabrication of a double-sided photovoltaic cell, with two opposite active surfaces, comprising a step of depositing, on each active surface, at least one electric contact. The deposition step comprises in particular a shared operation of depositing on each of the active surfaces, implemented by electrolysis in a shared electrolysis tank comprising: a first compartment for depositing a metal layer on a first active surface of the cell, for fabrication of a contact comprising said metal layer on the first active surface; and a second compartment for depositing, by oxidation, a metal oxide conductor layer on the second active surface of the cell, for the fabrication of a contact comprising said metal oxide layer on the second active surface.

Claims (18)

1. A method for fabrication of a double-sided photovoltaic cell, with two opposite active surfaces, comprising:

depositing, on each active surface, at least one electric contact, by electrolysis in a shared electrolysis tank,

said shared electrolysis tank comprising:

a first compartment for depositing a metal layer on a first active surface of the cell, for fabrication of a contact comprising said metal layer on the first active surface; and

a second compartment for depositing, by oxidation, a metal oxide conductor layer on the second active surface of the cell, for the fabrication of a contact comprising said metal oxide layer on the second active surface.

2. The method according to claim 1 , wherein the metal in the metal oxide layer is at least one element among Mn, Ni, Mo, Cd, Sn, In, Zn, Pb, Ag, Cu, W, Ta, Ga, Fe, Co, Cr and Ti.

3. The method according to claim 1 , wherein, during said depositing:

electrons are generated in the first compartment, opposite the first active surface, for enhancing the deposit of the metal layer; and

holes are generated in the second compartment, opposite the second active surface, for enhancing the deposit by oxidation of the metal oxide layer.

4. The method according to claim 1 , wherein the first and second compartments are separated by an ion exchange membrane that the electrolysis tank comprises.

5. The method according to claim 1 , wherein, the deposition of at least one of the metal layer on the first active surface and of the metal oxide layer on the second active surface is assisted by lighting of at least one of the first and second active surfaces.

6. The method according to claim 1 , wherein the depositing operation is assisted by application of a potential difference specific for generating at least negative charges on the first active surface.

7. The method according to claim 1 , wherein the depositing operation is assisted by application of a potential difference specific for generating positive charges on the second active surface.

8. The method according to claim 1 , wherein the photovoltaic cell is a double-sided homojunction with n + type on the first active surface and p + on the second active surface.

9. The method according to claim 1 , wherein the photovoltaic cell is silicon-based.

10. The method according to claim 1 , wherein the metal layer on the first active surface is nickel-based, and the step of depositing the electric contact on the first active surface is continued by depositing a layer comprising at least copper onto the metal layer, by electrolysis.

11. The method according to claim 1 , wherein the step of depositing the electric contact on the second active surface is continued by depositing a layer comprising at least copper onto the metal oxide layer, by electrolysis.

12. The method according to claim 1 , wherein depositing the contact is preceded by etching at least one electrically insulating layer, deposited on each active surface said etching exposes each active surface in a region in which the operation of depositing by electrolysis is applied.

Assignments (2)
CHANGE OF NAME Recorded Jan 19, 2022
From: PARIS SCIENCES ET LETTRES - QUARTIER LATIN
To: PARIS SCIENCES ET LETTRES
Reel/Frame 058772/0593 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 5, 2019
From: GRAND, PIERRE-PHILIPPE; LINCOT, DANIEL
To: ELECTRICITE DE FRANCE; CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS-; PARIS SCIENCES ET LETTRES - QUARTIER LATIN
Reel/Frame 048804/0715 →