Group III nitride crystal substrate having a diameter of 4 inches or more and a curved c-plane with a radius of curvature of 15 m or more
There is provided a method of manufacturing a crystal substrate, including: preparing a first crystal body which is a substrate comprising a single crystal of group III nitride produced by a vapor phase method and having a first main surface, and in which c-plane of the single crystal is curved in a concave spherical shape with a predetermined curvature; and growing a second crystal body comprising a single crystal of group III nitride on the first main surface, in a mixed melt containing an alkali metal and a group III element.
1. A crystal substrate which is a substrate consisting of a single crystal of group III nitride, having a diameter of 4 inches or more, and in which c-plane of the single crystal is curved in a concave spherical shape toward inside of the substrate, when a main surface of the substrate is viewed from +c side with a radius of curvature of 15 m or more, the c-plane of the single crystal has a constant radius of curvature in a region of 80% or more of an area of the main surface viewed in plan view, and the substrate consists of a single domain,
wherein a thickness of the substrate is 0.2 mm or more, and
wherein the radius of curvature of the c-plane of the single crystal in a-axis direction is 27.2 m or more and the radius of curvature of the c-plane of the single crystal in m-axis direction is 35.6 m or more.
2. The crystal substrate according to claim 1 , wherein a largest dislocation density in the main surface is 3×10 6 /cm 2 or less.
3. The crystal substrate according to claim 1 , wherein a radius of curvature of the c-plane of the single crystal in a-axis direction is different from a radius of curvature of the c-plane of the single crystal in m-axis direction.