Transparent self-healing omniphobic coatings
Processes for preparing oleophobic and hydrophobic coatings on a substrate. More particularly, the disclosure relates to omniphobic surface treatment of substrates such as glass, ceramic, glass-ceramic, and the like.
1. A process for obtaining an omniphobic coating on a substrate comprising:
a. activating a substrate by contacting the substrate with a plasma of a gas; and,
b. depositing a first layer of an omniphobic coating comprising at least one fluoride ion-encapsulated functionalized fluoropolyhedral oligomeric silsesquioxane, and at least one fluorocompound,
wherein the at least one fluoride ion encapsulated functionalized fluoropolyhedral oligomeric silsesquioxane (F@F-POSS) is a compound of the structural formula [1]:
wherein each R A is R f or R p , provided that at least one R A is R p ;
R f is F 3 C(CF 2 ) m (CH 2 ) n —;
R p is (HO) p (Y) 2-p P(O)(CH 2 ) q —;
Y is a hydrolysable group; m is an integer from 0 to about 15; n is an integer from 0 to about 5; p is 0, 1 or 2; and q is an integer from 0 to about 5.
2. The process of claim 1 , wherein the at least one fluorocompound is selected from the group consisting of a fluoroalkyl phosphonic acid (FAPA), a fluoroakyl phosphonate (FAPN), a fluoroalkyl silane (FAS), a fluoroalkyl halide (FAH), and combinations thereof.
3. The process of claim 1 , wherein the at least one fluorocompound is a compound selected from the group consisting of a compound of the formula
F 3 C(CF 2 ) m1 (CH 2 ) n1 P(O)(Y) 2-p1 (OH) p1
wherein m1 is an integer from 0 to 15; n1 is an integer from 0 to 5; p1 is 0, 1 or 2; and Y is a hydrolysable group; and a compound of the formula
F 3 C—(CF 2 ) m2 —(CH 2 ) n2 —Si(Z) 3-t (R) t
wherein m2 is an integer from 0 to 15; n2 is an integer from 0 to 5; t is and integer from 0 to 3; R is an alkyl group or a hydrogen atom; and Z is a hydrolysable group.
4. The process of claim 1 , wherein the step of depositing comprises applying a mixture containing the at least one fluoride ion-encapsulated functionalized fluoropolyhedral oligomeric silsesquioxane, the at least one fluorocompound, at least one polar solvent, and an aqueous acid or base.
5. The process of claim 3 , wherein the hydrolysable group is a halide group or an alkoxy group.
6. The process of claim 2 , wherein the at least one fluorocompound is a fluoroalkyl phosphonic acid (FAPA).
7. The process of claim 2 , wherein the at least one fluorocompound is a fluoroakyl phosphonate (FAPN).
8. The process of claim 2 , wherein the at least one fluorocompound is a fluoroalkyl silane (FAS).
9. The process of claim 2 , wherein the at least one fluorocompound is a fluoroalkyl halide (FAH).
10. The process of claim 3 , wherein the at least one fluorocompound is a compound selected from the group consisting of a compound of the formula
F 3 C(CF 2 ) m1 (CH 2 ) n1 P(O)(Y) 2-p1 (OH) p1
wherein m1 is an integer from 0 to 15; n1 is an integer from 0 to 5; p1 is 0, 1 or 2; and Y is a hydrolysable group.
11. The process of claim 3 , wherein the at least one fluorocompound is a compound of the formula
F 3 C—(CF 2 ) m2 —(CH 2 ) n2 —Si(Z) 3-t (R) t
wherein m2 is an integer from 0 to 15; n2 is an integer from 0 to 5; t is and integer from 0 to 3; R is an alkyl group or a hydrogen atom; and Z is a hydrolysable group.
12. The process of claim 1 , wherein the step of depositing is carried out by dip, spray, or thermal chemical vapor deposition (CVD).