Membrane materials for photoreactive additive manufacturing
A photoreactive additive manufacturing system comprises a resin tub, a membrane, and a resin pool confined by the resin tub and the membrane. In some embodiments, the membrane comprises a polymeric blend comprising a first polymer and a second polymer, and the first polymer is a fluoropolymer. In some embodiments, the membrane comprises a polymer and an additive to control the free volume of the polymer.
1. A photoreactive additive manufacturing system comprising:
a resin tub;
a membrane comprising a polymeric blend comprising a first polymer phase and a second polymer phase; and
a resin pool confined by the resin tub and the membrane;
wherein:
the first polymer phase is a continuous matrix;
the second polymer phase is a discontinuous phase located within the continuous matrix of the first polymer phase;
the first polymer phase comprises a fluoropolymer; and
the second polymer phase comprises a polyacrylate, a polyurethane, or a polysulfide.
2. The photoreactive additive manufacturing system of claim 1 , wherein:
the polymeric blend further comprises a nucleating agent selected from the group consisting of oxide particles, salts, aromatic carboxylic acid salts, sodium benzoate, talc particles, modified sorbitol, sugar derivatives, highly dispersed silica particles, crystalline pigments, and aromatic heterocyclic phosphate.
3. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises polyhedral oligomeric silsesquioxane.
4. A photoreactive additive manufacturing system comprising:
a resin tub;
a membrane; and
a resin pool confined by the resin tub and the membrane;
wherein the membrane comprises:
a fluoropolymer; and
polyhedral oligomeric silsesquioxane, or a copolymer of vinylidene fluoride and hexafluoro propylene with a number of average molecular weight of approximately 3000, as an additive to control a free volume of the fluoropolymer.
5. The photoreactive additive manufacturing system of claim 4 , wherein:
the fluoropolymer further comprises a nucleating agent selected from the group consisting of oxide particles, salts, aromatic carboxylic acid salts, sodium benzoate, talc particles, modified sorbitol, sugar derivatives, highly dispersed silica particles, crystalline pigments, and aromatic heterocyclic phosphate.
6. The photoreactive additive manufacturing system of claim 1 , wherein the fluoropolymer comprises a copolymer with 87% 2,2-bistrifluoromethyl-4,5-difluoro-1,3-dioxole monomers and 13% tetrafluoroethylene monomers.
7. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises a copolymer of vinylidene fluoride and hexafluoro propylene with a number of average molecular weight of approximately 3000.
8. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises acrylate polymers.
9. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises acrylic urethane polymers.
10. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises cross-linked polysulfide polymers.
11. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises a bonding layer between the first polymer phase and the second polymer phase, wherein the bonding layer comprises titanium.
12. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises a bonding layer between the first polymer phase and the second polymer phase, wherein the bonding layer comprises chromium.
13. The photoreactive additive manufacturing system of claim 1 , wherein the polymeric blend further comprises a bonding layer between the first polymer phase and the second polymer phase, wherein the bonding layer comprises silicone.
14. The photoreactive additive manufacturing system of claim 1 , wherein the membrane further comprises greater than 80% transmission to light in a wavelength range from 300 nm to 500 nm when measured using ASTM D1003 methods.
15. The photoreactive additive manufacturing system of claim 1 , wherein the membrane further comprises a tensile modulus from 1.0 GPa to 3.0 GPa when measured using ASTM D638 methods.
16. The photoreactive additive manufacturing system of claim 1 , wherein the membrane further comprises a tensile strength from 10 MPa to 50 MPa when measured using ASTM D638 methods.
17. The photoreactive additive manufacturing system of claim 1 , wherein the membrane further comprises an elongation to break at 23° C. from 5% to 8% when measured using ASTM D638 methods.
18. The photoreactive additive manufacturing system of claim 1 , wherein the membrane further comprises Rockwell C scale hardness at 23° C. from 80 to 100 when measured using ASTM D785.
19. The photoreactive additive manufacturing system of claim 1 , wherein the membrane further comprises Shore D durometer hardness at 23° C. from 70 to 90 when measured using ASTM D1706 methods.
20. The photoreactive additive manufacturing system of claim 1 , wherein the membrane further comprises permeability to oxygen from 200 Barrer to 1050 Barrer.
21. The photoreactive additive manufacturing system of claim 4 , wherein the fluoropolymer comprises a copolymer with 87% 2,2-bistrifluoromethyl-4,5-difluoro-1,3-dioxole monomers and 13% tetrafluoroethylene monomers.
22. The photoreactive additive manufacturing system of claim 4 , wherein the membrane further comprises acrylate polymers.
23. The photoreactive additive manufacturing system of claim 4 , wherein the membrane further comprises acrylic urethane polymers.
24. The photoreactive additive manufacturing system of claim 4 , wherein the membrane further comprises cross-linked polysulfide polymers.
25. The photoreactive additive manufacturing system of claim 4 , wherein the membrane further comprises permeability to oxygen from 200 Barrer to 1050 Barrer.