Light-emitting diode display panel with micro lens array

1. A method for fabricating a light-emitting diode (LED) display panel, comprising:

forming an LED array including a plurality of LED dies;

forming a transparent processing layer over the LED array; and

processing a portion of the transparent processing layer to transform the portion into a micro lens array having a plurality of micro lenses, each of the micro lenses corresponding to and arranged over at least one of the LED dies,

wherein forming the LED array comprises:

forming a dielectric isolation layer on a driver circuit wafer, the driver circuit wafer including a plurality of driver circuits arranged in an array, the dielectric isolation layer including first protrusion structures and second protrusion structures, each one of first protrusion structures being formed over one of the driver circuits and having a through hole formed from an upper surface of the first protrusion structure to a lower surface of the first protrusion structure, and each of the second protrusion structures surrounding one of the first protrusion structures to define a continuous recess surrounding the first protrusion structure;

forming a first pre-bonding metal layer over the driver circuit wafer;

patterning the first pre-bonding metal layer to form a plurality of first pre-bonding metal pads, each one of the first pre-bonding metal pads being arranged over one of the first protrusion structures, and at least a portion of the first pre-bonding metal pad being arranged in the through-hole of the first protrusion structure;

forming a second pre-bonding metal layer over a functional device wafer, the functional device wafer including a functional device epi-structure layer epitaxially grown on a growth substrate;

patterning the second pre-bonding metal layer to form a plurality of second pre-bonding metal pads;

bonding the functional device wafer onto the driver circuit wafer through the first and second pre-bonding metal layers to form a plurality of bonding metal pads;

removing the growth substrate to expose the functional device epi-structure layer; and

patterning the functional device epi-structure layer to form the plurality of LED dies.

2. The method of claim 1 , wherein processing the portion of the transparent processing layer includes processing the portion of the transparent processing layer such that each of the micro lenses is aligned with the corresponding one of the LED dies.

3. The method of claim 1 , wherein processing the portion of the transparent processing layer includes processing the portion of the transparent processing layer such that each of the micro lenses corresponds to and is arranged over two or more of the LED dies.

4. The method of claim 1 , wherein:

forming the transparent processing layer over the LED array includes:

forming a transparent material layer over the LED array; and

forming a polymer layer over the transparent material layer; and

processing the portion of the transparent processing layer includes processing the polymer layer to form the micro lens array.

5. The method of claim 4 , wherein:

forming the polymer layer includes forming a photo-sensitive polymer layer, and

processing the polymer layer to form the micro lens array includes:

patterning the photo-sensitive polymer layer by a photolithography process to form a plurality of polymer units separated from each other, and

conducting a reflow process at a temperature above a melting point or a glass transition point of the polymer to transform each of the polymer units into one of the micro lenses.

6. The method of claim 4 , wherein:

forming the polymer layer includes forming a photo-sensitive polymer layer, and

processing the polymer layer to form the micro lens array includes conducting a photolithography process on the photo-sensitive polymer through a grayscale mask having grayscale patterns corresponding to the micro lenses.

7. The method of claim 1 , wherein processing the portion of the transparent processing layer includes:

forming a photoresist layer over the transparent processing layer,

processing the photoresist layer to form a patterned photoresist layer including a plurality of dummy units, each of the dummy units having a size and a shape similar to a size and a shape of one of the micro lenses, and

conducting a plasma etching on the patterned photoresist layer and the portion of the transparent processing layer to transfer the shape of the dummy units to the portion of the transparent processing layer to convert the portion of the transparent processing layer into the micro lens array.

8. The method of claim 7 , wherein processing the photoresist layer includes:

patterning the photoresist layer to form a plurality of photoresist units, and

conducting a reflow process to convert the photoresist units to the dummy units.

9. The method of claim 7 , wherein processing the photoresist layer includes subjecting the photoresist layer to a photolithography process through a grayscale mask.

10. The method of claim 1 , wherein processing the portion of the transparent processing layer includes imprinting the portion of the transparent processing layer using an imprinting stamp having shapes corresponding to the micro lenses.