Systems and methods for generating nitric oxide
Systems and methods for nitric oxide generation are provided. In an embodiment, an NO generation system can include a controller and disposable cartridge that can provide nitric oxide to two different treatments simultaneously. The disposable cartridge has multiple purposes including preparing incoming gases for exposure to the NO generation process, scrubbing exhaust gases for unwanted materials, characterizing the patient inspiratory flow, and removing moisture from sample gases collected. Plasma generation can be done within the cartridge or within the controller. The system has the capability of calibrating NO and NO 2 gas analysis sensors without the use of a calibration gas.
1. A nitric oxide generation system, comprising:
one or more plasma chambers configured to ionize a reactant gas to generate a plasma for producing a product gas containing nitric oxide (NO) using a flow of the reactant gas through the one or more plasma chambers;
a controller configured to regulate the amount of nitric oxide in the product gas in the one or more plasma chambers using one or more parameters as input to a control algorithm, at least one of the one or more parameters being related to a target concentration of NO in a combination of the product gas and a medical gas into which the product gas flows;
a flow controller configured to provide a controlled variable flow of the reactant gas into the one or more plasma chambers based on a measurement associated with the medical gas; and
one or more scrubber paths configured to remove NO 2 from the product gas generated by the one or more plasma chambers,
wherein the target concentration of NO in the combination of the product gas and the medical gas is a variable target concentration,
wherein the measurement associated with the medical gas is the flow rate of the medical gas such that the flow of the reactant gas through the one or more plasma chambers is proportional to the flow rate of the medical gas.
2. The nitric oxide generation system of claim 1 , further comprising a reactant gas source that is configured to provide reactant gas flow to the one or more plasma chambers.
3. The nitric oxide generation system of claim 2 , wherein the reactant gas source is in the form of a pressurized reservoir.
4. The nitric oxide generation system of claim 2 , wherein the reactant gas source is in the form of a pump.
5. The nitric oxide generation system of claim 1 , wherein the flow controller is selected from the group consisting of one or more pumps, one or more proportional valves, one or more digital valves, and a combination of at least one proportional valve and at least one digital valve.
6. The nitric oxide generation system of claim 1 , further comprising one or more filters positioned to receive NO-enriched air from the one or more scrubber paths and configured to filter the NO-enriched air.
7. The nitric oxide generation system of claim 1 , further comprising a signal processor that generates a continuous, customizable control AC waveform as an input to a high voltage circuit.
8. The nitric oxide generation system of claim 7 , wherein the signal processor is configured to control the shape of the AC waveform by controlling at least one of its frequency and duty cycle.
9. A nitric oxide generation system, comprising:
one or more plasma chambers configured to ionize a reactant gas to generate a plasma for producing a product gas containing nitric oxide (NO) using a flow of the reactant gas through the one or more plasma chambers;
a controller configured to regulate the amount of nitric oxide in the product gas in the one or more plasma chambers using one or more parameters as input to a control algorithm, at least one of the one or more parameters being related to at least one of a target concentration of NO in a combination of the product gas and a medical gas into which the product gas flows and a gas flow rate measurement of at least one of the medical gas and the reactant gas; and
a flow controller configured to provide a controlled variable flow of the reactant gas based on a measurement associated with a medical gas into which the product gas flows,
wherein the gas flow rate measurement of the medical gas is the flow rate of the medical gas such that the air flow of the reactant gas through the one or more plasma chambers is proportional to the flow rate of the medical gas.
10. The nitric oxide generation system of claim 9 , further comprising one or more scrubber paths configured to remove NO 2 from the product gas generated by the one or more plasma chambers.
11. The nitric oxide generation system of claim 9 , further comprising a reactant gas source that is configured to provide reactant gas flow to the one or more plasma chambers.
12. The nitric oxide generation system of claim 11 , wherein the reactant gas source is in the form of a reservoir.
13. The nitric oxide generation system of claim 11 , wherein the reactant gas source is in the form of a pump.
14. The nitric oxide generation system of claim 11 , wherein the reactant gas source is a compressed gas source.
15. The nitric oxide generation system of claim 11 , wherein the reactant gas source is a ventilator.
16. The nitric oxide generation system of claim 9 , wherein the control algorithm input parameters are selected from the group consisting of concomitant treatment parameters, patient parameters, ambient environment parameters, device parameters, and NO treatment parameters.
17. The nitric oxide generation system of claim 16 , wherein the concomitant treatment parameters include flow, pressure, gas temperature, or gas humidity information relating to one or more devices being used in conjunction with the NO generation system.
18. The nitric oxide generation system of claim 16 , wherein the patient parameters include inspiratory flow rate, SpO 2 , breath timing, tidal volume, minute volume, or expiratory NO 2 .
19. The nitric oxide generation system of claim 16 , wherein the ambient environment parameters include ambient temperature, ambient pressure, ambient humidity, ambient NO, or ambient NO 2 .
20. The nitric oxide generation system of claim 16 , wherein the device parameters include plasma chamber pressure, plasma chamber flow, plasma chamber temperature, plasma chamber humidity, electrode temperature, electrode type, electrode gap, electrode age, internal enclosure humidity, or secondary circuit resonant frequency.
21. The nitric oxide generation system of claim 16 , wherein the NO treatment parameters include at least one of target NO concentration, measured NO concentration, indicated NO 2 concentration, and estimated NO production.
22. The nitric oxide generation system of claim 9 , further comprising one or more scrubber paths configured to remove NO 2 from the product gas generated by the one or more plasma chambers.
23. The nitric oxide generation system of claim 9 , wherein the reactant gas source is in the form of a reservoir.
24. The nitric oxide generation system of claim 9 , wherein the target concentration of NO in the combination of the product gas and the medical gas is a variable target concentration.