Semiconductor device
A semiconductor device may include a first insulated substrate, a first semiconductor chip and a second semiconductor chip disposed on the first insulated substrate, a second insulated substrate opposed to the first insulated substrate with the first semiconductor chip interposed therebetween, and a third insulated substrate opposed to the first insulated substrate with the second semiconductor chip interposed therebetween and located side by side with the second insulated substrate.
1. A semiconductor device comprising:
a first insulated substrate;
a first semiconductor chip and a second semiconductor chip disposed on the first insulated substrate;
a second insulated substrate opposed to the first insulated substrate with the first semiconductor chip interposed therebetween; and
a third insulated substrate opposed to the first insulated substrate with the second semiconductor chip interposed therebetween and located side by side with the second insulated substrate,
wherein
the first insulated substrate comprises a first insulator layer, a first inner conductor layer provided on one side of the first insulator layer and electrically connected to the first semiconductor chip and the second semiconductor chip, and a first outer conductor layer provided on another side of the first insulator layer,
the second insulated substrate comprises a second insulator layer, a second inner conductor layer provided on one side of the second insulator layer and electrically connected to the first semiconductor chip, and a second outer conductor layer provided on another side of the second insulator layer,
the third insulated substrate comprises a third insulator layer, a third inner conductor layer provided on one side of the third insulator layer and electrically connected to the second semiconductor chip, and a third outer conductor layer provided on another side of the third insulator layer,
each of the first semiconductor chip and the second semiconductor chip is a switching element comprising a front electrode and a back electrode and configured to electrically connect and disconnect the front electrode and the back electrode,
the front electrode of the first semiconductor chip is electrically connected to the first inner conductor layer of the first insulated substrate,
the back electrode of the first semiconductor chip is electrically connected to the second inner conductor layer of the second insulated substrate,
the front electrode of the second semiconductor chip is electrically connected to the third inner conductor layer of the third insulated substrate,
the back electrode of the second semiconductor chip is electrically connected to the first inner conductor layer of the first insulated substrate,
each of the switching elements is an Insulated Gate Bipolar Transistor (IGBT),
the front electrode is an emitter electrode, and
the back electrode is a collector electrode.
2. The semiconductor device according to claim 1 , wherein a size of the second insulated substrate is different from a size of the third insulated substrate.
3. The semiconductor device according to claim 2 , wherein the size of the second insulated substrate is smaller than the size of the third insulated substrate.
4. The semiconductor device according to claim 2 , wherein the size of the second insulated substrate is larger than the size of the third insulated substrate.
5. The semiconductor device according to claim 1 , further comprising:
an encapsulant encapsulating the first semiconductor chip and the second semiconductor chip,
wherein the first inner conductor layer of the first insulated substrate is soldered directly to the first semiconductor chip and the second semiconductor chip,
the second inner conductor layer of the second insulated substrate is soldered directly to the first semiconductor chip, and
the third inner conductor layer of the third insulated substrate is soldered directly to the second semiconductor chip.
6. A semiconductor device comprising:
a first insulated substrate;
a first semiconductor chip and a second semiconductor chip disposed on the first insulated substrate;
a second insulated substrate opposed to the first insulated substrate with the first semiconductor chip interposed therebetween; and
a third insulated substrate opposed to the first insulated substrate with the second semiconductor chip interposed therebetween and located side by side with the second insulated substrate,
wherein
the first insulated substrate comprises a first insulator layer, a first inner conductor layer provided on one side of the first insulator layer and electrically connected to the first semiconductor chip and the second semiconductor chip, and a first outer conductor layer provided on another side of the first insulator layer,
the second insulated substrate comprises a second insulator layer, a second inner conductor layer provided on one side of the second insulator layer and electrically connected to the first semiconductor chip, and a second outer conductor layer provided on another side of the second insulator layer,
the third insulated substrate comprises a third insulator layer, a third inner conductor layer provided on one side of the third insulator layer and electrically connected to the second semiconductor chip, and a third outer conductor layer provided on another side of the third insulator layer,
each of the first semiconductor chip and the second semiconductor chip is a switching element comprising a front electrode and a back electrode and configured to electrically connect and disconnect the front electrode and the back electrode,
the front electrode of the first semiconductor chip is electrically connected to the first inner conductor layer of the first insulated substrate,
the back electrode of the first semiconductor chip is electrically connected to the second inner conductor layer of the second insulated substrate,
the front electrode of the second semiconductor chip is electrically connected to the third inner conductor layer of the third insulated substrate,
the back electrode of the second semiconductor chip is electrically connected to the first inner conductor layer of the first insulated substrate,
each of the switching elements is a Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET),
the front electrode is a source electrode, and
the back electrode is a drain electrode.
7. A semiconductor device comprising:
a first insulated substrate;
a first semiconductor chip and a second semiconductor chip disposed on the first insulated substrate;
a second insulated substrate opposed to the first insulated substrate with the first semiconductor chip interposed therebetween; and
a third insulated substrate opposed to the first insulated substrate with the second semiconductor chip interposed therebetween and located side by side with the second insulated substrate,
wherein
the first insulated substrate comprises a first insulator layer, a first inner conductor layer provided on one side of the first insulator layer and electrically connected to the first semiconductor chip and the second semiconductor chip, and a first outer conductor layer provided on another side of the first insulator layer,
the second insulated substrate comprises a second insulator layer, a second inner conductor layer provided on one side of the second insulator layer and electrically connected to the first semiconductor chip, and a second outer conductor layer provided on another side of the second insulator layer,
the third insulated substrate comprises a third insulator layer, a third inner conductor layer provided on one side of the third insulator layer and electrically connected to the second semiconductor chip, and a third outer conductor layer provided on another side of the third insulator layer,
each of the first semiconductor chip and the second semiconductor chip is a switching element comprising a front electrode and a back electrode and configured to electrically connect and disconnect the front electrode and the back electrode,
the front electrode of the first semiconductor chip is electrically connected to the first inner conductor layer of the first insulated substrate,
the back electrode of the first semiconductor chip is electrically connected to the second inner conductor layer of the second insulated substrate,
the front electrode of the second semiconductor chip is electrically connected to the third inner conductor layer of the third insulated substrate,
the back electrode of the second semiconductor chip is electrically connected to the first inner conductor layer of the first insulated substrate,
each of the first semiconductor chip and the second semiconductor chip further comprises a signal electrode provided on a side thereof where the front electrode is provided,
the first inner conductor layer of the first insulated substrate comprises a main region and a signal region that are separated from each other on the first insulator layer,
the main region is electrically connected to the front electrode of the first semiconductor chip and the back electrode of the second semiconductor chip, and
the signal region is electrically connected to the signal electrode of the first semiconductor chip.
8. The semiconductor device according to claim 7 , wherein
the first inner conductor layer of the first insulated substrate further comprises a floating region electrically insulated from the first semiconductor chip and the second semiconductor chip, and
the floating region is located close to an outer edge of the first insulator layer such that the signal region is located between the main region and the floating region.
9. The semiconductor device according to claim 8 , wherein a dummy terminal is joined on the floating region.
10. The semiconductor device according to claim 8 , wherein in a plan view of the first insulated substrate, a part of an outer edge of the floating region overlaps an outer edge of the first outer conductor layer.
11. The semiconductor device according to claim 7 , wherein
the third inner conductor layer of the third insulated substrate comprises a main region and a signal region that are separated from each other on the third insulator layer,
the main region of the third inner conductor layer is electrically connected to the front electrode of the second semiconductor chip, and
the signal region of the third inner conductor layer is electrically connected to the signal electrode of the second semiconductor chip.
12. The semiconductor device according to claim 11 , wherein
the third inner conductor layer of the third insulated substrate further comprises a floating region electrically insulated from the first semiconductor chip and the second semiconductor chip, and
in the third insulated substrate, the floating region is located close to an outer edge of the third insulator layer such that the signal region is located between the main region and the floating region.
13. The semiconductor device according to claim 1 , further comprising:
a first power terminal joined on the first inner conductor layer of the first insulated substrate between the first insulated substrate and the third insulated substrate,
wherein the third inner conductor layer is not provided within a region of the third insulated substrate that is opposed to the first power terminal.
14. The semiconductor device according to claim 1 , further comprising:
a second power terminal joined on the second inner conductor layer of the second insulated substrate between the first insulated substrate and the second insulated substrate,
wherein the first inner conductor layer is not provided within a region of the first insulated substrate that is opposed to the second power terminal.
15. The semiconductor device according to claim 1 , further comprising:
a third power terminal joined on the third inner conductor layer of the third insulated substrate between the first insulated substrate and the third insulated substrate,
wherein the first inner conductor layer is not provided within a region of the first insulated substrate that is opposed to the third power terminal.
16. The semiconductor device according to claim 15 , wherein the third power terminal includes a bending portion bending along a direction parallel to the third insulated substrate.