Discharge chambers and ionization devices, methods and systems using them
View Patent ↗Certain configurations of plasma discharge chambers and plasma ionization sources comprising a plasma discharge chamber are described. In some examples, the discharge chamber comprises a conductive area and is configured to sustain a plasma discharge within the discharge chamber. In other examples, the discharge chamber comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber. Systems and methods using the discharge chambers are also described.
1. A plasma discharge ionization source comprising a discharge chamber comprising a first electrode configured to couple to a power source, wherein the discharge chamber is configured to sustain a plasma discharge within the discharge chamber and comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber, wherein the at least one inlet is present in a first region of the discharge chamber and the at least one outlet is outside the first region of the discharge chamber, and wherein the at least one inlet is coupled to the at least one outlet through a bend to remove interfering species from the ionized analyte.
2. The plasma discharge ionization source of claim 1 , wherein the first electrode is positioned within the at least one inlet of the discharge chamber.
3. The plasma discharge ionization source of claim 2 , wherein the discharge chamber comprises a conductive material.
4. The plasma discharge ionization source of claim 2 , wherein the at least one inlet is configured to simultaneously receive the plasma gas and a sample comprising an analyte.
5. The plasma discharge ionization source of claim 2 , further comprising a second inlet separate from the at least one inlet, wherein the second inlet is configured to provide a sample comprising an analyte into the discharge chamber.
6. The plasma discharge ionization source of claim 2 , wherein the discharge chamber further comprises a second region coupled to the first region and a third region coupled to the second region, wherein the at least one outlet is in the third region and the bend is in the second region.
7. The plasma discharge ionization source of claim 6 , wherein an average inner diameter of the third region is larger than an average inner diameter of the second region.
8. The plasma discharge ionization source of claim 7 , wherein an average inner diameter of the second region is larger than an average inner diameter of the first region.
9. The plasma discharge ionization source of claim 1 , further comprising a second electrode electrically coupled to the discharge chamber.
10. The plasma discharge ionization source of claim 1 , wherein the discharge chamber further comprises a second inlet configured to receive a second plasma gas.
11. The plasma discharge ionization source of claim 1 , wherein the discharge chamber is configured to sustain the plasma discharge without any inductive coupling.
12. The plasma discharge ionization source of claim 1 , wherein the discharge chamber is configured to receive two or more different plasma gases to selectively ionize different analyte species using the different plasma gases.
13. A plasma discharge ionization source comprising a discharge chamber comprising a conductive area, wherein the discharge chamber is configured to sustain a plasma discharge within the discharge chamber and comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber, wherein the discharge chamber further comprises at least one bend between the at least one inlet and the at least one outlet, and wherein the at least one bend is configured to reduce a number of metastable atoms and free electrons and photons exiting the discharge chamber through the at least one outlet.
14. The plasma discharge ionization source of claim 13 , in which the at least one bend is configured as about a ninety-degree bend.
15. The plasma discharge ionization source of claim 13 , further comprising a second bend positioned upstream of the at least one bend or positioned downstream of the at least one bend.
16. The plasma discharge ionization source of claim 13 , further comprising a second discharge chamber fluidically coupled to the discharge chamber, wherein the second discharge chamber comprises at least one bend between an inlet section of the second discharge chamber and an outlet section of the second discharge chamber.
17. The plasma discharge ionization source of claim 16 , wherein the at least one bend of the second discharge chamber comprises a different shape than the at least one bend of the discharge chamber.
18. The plasma discharge ionization source of claim 17 , further comprising an electrode electrically coupled to the second discharge chamber.
19. The plasma discharge ionization source of claim 18 , wherein the second discharge chamber is configured to sustain a plasma discharge with a second plasma gas different than the plasma gas.