Shelf-stable hydrogen peroxide antimicrobial compositions
A disinfecting solution includes hydrogen peroxide at a concentration of from about 1.5% w/w to 8% w/w; at least one readily biodegradable anionic surfactant in a concentration of from about 10% w/w to about 25% w/w; at least one of salicylic acid and salts thereof, in a concentration of from about 1% w/w to about 8% w/w; at least one chelating agent in a concentration of from about 0.005% w/w to about 10% w/w; and at least one low-corrosive non-surfactant sulfonic acid selected from benzenesulfonic acid, benzene disulfonic acid, xylene sulfonic acid, toluene sulfonic acid, cumene sulfonic acid, sulfosalicylic acid, naphthalene mono- or di-sulfonic acid, methane sulfonic acid, and isethionic acid in a concentration of from about 1% w/w to about 15% w/w. The solution is free of acetic acid, furoic acid, phenylacetic acid, cationic surfactants, amphoteric surfactants, aromatic alcohols, halogen acids, phenols, peracid activators, bleaches, and (optionally) benzoic acid.
1. A shelf-stable, concentrated antimicrobial solution having a pH of from about 0 to about 3.5, the solution comprising:
a. hydrogen peroxide at a concentration of from about 1.5% w/w to 8% w/w;
b. at least one readily biodegradable anionic surfactant in a concentration of from about 10% w/w to about 25% w/w;
c. at least one of salicylic acid and salts thereof, in a concentration of from about 1% w/w to about 8% w/w;
d. at least one chelating agent in a concentration of from about 0.005% w/w to about 10% w/w;
e. at least one acid selected from sulfuric acid, phosphoric acid, benzenesulfonic acid, benzene disulfonic acid, xylene sulfonic acid, toluene sulfonic acid, cumene sulfonic acid, sulfosalicylic acid, naphthalene mono- or di-sulfonic acid, methane sulfonic acid, isethionic acid, or any combination thereof, in a concentration of from about 1% w/w to about 15% w/w;
f. at least one nonionic surfactant in a concentration of from about 1% w/w to about 15% w/w;
g. at least one glycol ether solvent selected from tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, polyethylene glycol phenyl ether, dipropylene glycol methyl ether, propylene glycol n-propyl ether, propylene glycol monomethyl ether, dipropylene glycol monopropyl ether, propylene glycol mono n-butyl ether, dipropylene glycol mono n-butyl ether, dipropylene glycol dimethyl ether, diethylene glycol mono-methyl ether, diethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol phenyl ether, or any combination thereof; and
h. water q.s. to 100;
wherein the solution is substantially free of ingredients selected from the group consisting of peroxycarboxylic acids, acetic acid, furoic acid, phenylacetic acid, cationic surfactants, amphoteric surfactants, aromatic alcohols, halogen acids, phenols, peracid activators, and bleaches.
2. The solution of claim 1 , wherein the at least one glycol ether solvent is present in an amount of from about 10% w/w to about 30% w/w.
3. The solution of claim 1 , wherein the pH is at least about 0.5.
4. The solution of claim 3 , wherein the pH is from about 1.
5. The solution of claim 2 , wherein the at least one glycol ether solvent has a standard vapor pressure of less than 0.1 mm Hg.
6. The solution of claim 1 , having a standard reduction potential (SRP) of from about 200 to about 400 mV.
7. The solution of claim 1 , wherein the hydrogen peroxide is present in a concentration of from about 5 to about 8% w/w.
8. The solution of claim 1 , wherein the at least one anionic surfactant is selected from alkyl aryl sulfonic acids.
9. The solution of claim 8 , wherein the at least one anionic surfactant is a C8 to C18 alkyl benzenesulfonic acid.
10. The solution of claim 1 , wherein the chelating agent is selected from the group consisting of etidronic acid (1-hydroxyethane 1,1-diphosphonic acid or HEDP), L-glutamic acid N,N-diacetic acid, methylglycine diacetic acid, and salts thereof.
11. The solution of claim 1 , wherein the at least one acid is chosen from benzenesulfonic acid, naphthalene disulfonic acid, and toluene sulfonic acid.
12. The solution of claim 1 diluted with water in a ratio of from 1:10 to 1:300 (solution:diluent).
13. The solution of claim 12 diluted with water in a ratio of from 1:16 to 1:256 (solution:diluent).
14. The solution of claim 1 , wherein the solution further comprises at least one additional ingredient selected from corrosion inhibitor, hydrotrope, dye, defoamer, peroxide stabilizer, foam booster, fragrance, viscosity modifier, soil suspender, anti-redeposition agent, anti-freeze agent, additional antimicrobial agents, diluents, or any combination thereof.
15. The solution of claim 1 , wherein the at least one nonionic surfactant comprises alcohol ethoxylates, block copolymers, or a mixture thereof.
16. The solution of claim 1 , wherein the solution is free of Volatile Organic Compounds (VOCs).
17. The solution of claim 1 , wherein the at least one chelating agent is chosen from the group consisting of tertiary amine-based chelating agents, phosphonate-based chelating agents, and salts thereof.
18. The solution of claim 1 , wherein the at least one readily biodegradable anionic surfactant is chosen from the group comprising alkyl sulfonic acids, alkyl aryl sulfonic acids, alkyl sulfuric acids, sulfonated carboxylic acids, alkyl sulfonic acids, and alkyl or alkenyl esters or diesters of sulfosuccinic acids, and alkali metal, ammonium, calcium and magnesium salts thereof.
19. The solution of claim 18 , wherein the at least one readily biodegradable anionic surfactant is chosen from the group comprising alkyl sulfonic acids, alkyl aryl sulfonic acids, alkyl sulfates, and salts thereof.
20. The solution of claim 1 , wherein the solution is also free of benzoic acid.
21. A method for disinfecting a hard or soft surface, the method comprising applying to said hard or soft surface a solution according to claim 1 , wherein the solution provides at least a two-log reduction of a bacteria at a maximum contact time of 5 minutes at room temperature and at a maximum 1:64 (solution:diluent) dilution using test method ASTM E1153.
22. The method of claim 21 , wherein the solution also provides at least a one-log reduction of mycobacteria at a maximum contact time of 5 minutes at room temperature and at a maximum 1:40 (solution:diluent) dilution using test method AOAC 965.12.
23. A ready-to-use antimicrobial solution produced by combining a solution according to claim 1 with a diluent at a ratio of from 1:2 to 1:256 (solution:diluent).
24. A dry composition which, when combined with a liquid diluent produces a solution according to claim 1 .
25. A dry composition which, when combined with a liquid diluent, produces a solution according to claim 23 .