Thin film transistor substrate, method of manufacturing the same, and display device including the same

1. A thin film transistor (TFT) substrate, comprising:

a base substrate;

a first active pattern disposed on the base substrate;

a first gate insulation layer at least partially covering the first active pattern;

a first gate electrode disposed on the first gate insulation layer, the first gate electrode forming a first thin film transistor with the first active pattern;

a second gate insulation layer at least partially covering the first gate electrode;

a second gate electrode disposed on the second gate insulation layer, the second gate electrode at least partially overlapping the first gate electrode;

a source connection electrode contacting a source region of the first active pattern;

a drain connection electrode contacting a drain region of the first active pattern;

a first insulation interlayer at least partially covering the second gate electrode;

a second active pattern disposed on the first insulation interlayer;

a third gate insulation layer at least partially covering the second active pattern;

a third gate electrode disposed on the third gate insulation layer, the third gate electrode forming a second thin film transistor with the second active pattern;

a second insulation interlayer at least partially covering the third gate electrode; and

a first source electrode, a first drain electrode, a second source electrode, and a second drain electrode each disposed on the second insulation interlayer, the first source electrode and the first drain electrode contacting the source connection electrode and the drain connection electrode, respectively, and the second source electrode and the second drain electrode contacting a source region and a drain region of the second active pattern, respectively,

wherein the source connection electrode and the drain connection electrode each originate at the first active pattern and terminate at a level that is either between a level of the first gate electrode and a level of the second gate electrode or at the level of the first gate electrode.

2. The TFT substrate of claim 1 , wherein the source connection electrode, the drain connection electrode, and the second gate electrode are all disposed within a common layer.

3. The TFT substrate of claim 1 , wherein the source connection electrode, the drain connection electrode, and the first gate electrode are all disposed within a common layer.

4. The TFT substrate of claim 1 , wherein: the source connection electrode is connected to the source region of the first active pattern through a first contact hole, and the drain connection electrode is connected to the drain region of the first active pattern through a second contact hole.

5. The TFT substrate of claim 4 , wherein: the first source electrode is connected to the source connection electrode through a third contact hole, and the first drain electrode is connected to the drain connection electrode through a fourth contact hole.

6. The TFT substrate of claim 5 , wherein a smallest width of the first contact hole and a smallest width of the second contact hole are greater than a largest width of the third contact hole and a largest width of the fourth contact hole, respectively.

7. The TFT substrate of claim 1 , wherein: one of the first active pattern and the second active pattern includes a polycrystalline silicon semiconductor, and the other of the first active pattern and the second active pattern includes an oxide semiconductor.

8. A display device, comprising:

a base substrate;

a first active pattern disposed on the base substrate;

a first gate insulation layer at least partially covering the first active pattern;

a first gate electrode disposed on the first gate insulation layer, the first gate electrode forming a first thin film transistor with the first active pattern;

a second gate insulation layer at least partially covering the first gate electrode;

a second gate electrode disposed on the second gate insulation layer, the second gate electrode at least partially overlapping the first gate electrode;

a source connection electrode contacting a source region of the first active pattern;

a drain connection electrode contacting a drain region of the first active pattern;

a first insulation interlayer at least partially covering the second gate electrode;

a second active pattern disposed on the first insulation interlayer;

a third gate insulation layer at least partially covering the second active pattern;

a third gate electrode disposed on the third gate insulation layer, the third gate electrode forming a second thin film transistor with the second active pattern;

a second insulation interlayer at least partially covering the third gate electrode;

a first source-drain pattern disposed on the second insulation interlayer, the first source-drain pattern including a first source electrode and a first drain electrode contacting the source connection electrode and the drain connection electrode, respectively, and a second source electrode and a second drain electrode contacting a source region and a drain region of the second active pattern, respectively;

a first planarization layer at least partially covering the first source-drain pattern; and

a light emitting structure disposed on the first planarization layer, the light emitting structure being electrically connected to the first thin film transistor,

wherein the source connection electrode and the drain connection electrode each originate at the first active pattern and terminate at a level that is either between a level of the first gate electrode and a level of the second gate electrode or at the level of the first gate electrode.

9. The display device of claim 8 , wherein the source connection electrode, the drain connection electrode, and the second gate electrode are all disposed within a common layer.

10. The display device of claim 8 , wherein the source connection electrode, the drain connection electrode, and the first gate electrode are all disposed within a common layer.

11. The display device of claim 8 , wherein: one of the first active pattern and the second active pattern includes a polycrystalline silicon semiconductor, and the other of the first active pattern and the second active pattern includes an oxide semiconductor.

12. The display device of claim 8 , wherein the light emitting structure includes:

a first electrode disposed on the first planarization layer, the first electrode being electrically connected to the first drain electrode;

an organic light emitting layer disposed on the first electrode; and

a second electrode disposed on the organic light emitting layer.

13. The display device of claim 12 , wherein the base substrate includes:

a first area;

a second area spaced apart from the first area; and

a bending area between the first area and the second area, wherein the first thin film transistor is disposed on the first area,

wherein the second thin film transistor is disposed on the first area, wherein a capacitor is disposed on the first area, the capacitor including the first gate electrode and the second gate electrode, and

wherein the light emitting structure is disposed on the first area.

14. The display device of claim 13 , further comprising an organic layer disposed on the base substrate within the bending area, wherein the first source-drain pattern further includes a first wiring disposed on the organic layer.

15. The display device of claim 14 , further comprising:

a second planarization layer disposed between the first planarization layer and the first electrode; and

a second source-drain pattern disposed between the first planarization layer and the second planarization layer, the second source-drain pattern including a pixel connection electrode electrically connecting the first drain electrode to the first electrode and a second wiring within the bending area, the second wiring being electrically connected to the first wiring.