INVISIBLE FINGERPRINT COATINGS AND PROCESS FOR FORMING SAME
A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate an alkyl silane, a POSS, or a mixture thereof.
1 . A fingerprint-resistant substrate made by a process comprising,
applying a formulation for a fingerprint-resistant coating onto a surface of a substrate,
wherein the fingerprint-resistant surface has a delta E of less than 2.
2 . The fingerprint-resistant substrate of claim 1 , wherein the fingerprint-resistant surface has an initial oil angle of less than about 40° and an initial water angle of greater than about 65°.
3 . The fingerprint-resistant substrate of claim 2 , wherein the formulation for a fingerprint-resistant coating comprises an alkyl silane of the formula
(R A ) 3 SiR B ,
wherein each R A is independently —OC 1 -C 6 alkyl, —OC 2 -C 6 alkenyl, or —OC 2 -C 6 alkynyl;
R B is C 1 -C 20 alkyl, C 2 -C 20 alkenyl, or C 2 -C 20 alkynyl; wherein each hydrogen atom in —OC 1 -C 6 alkyl, —OC 2 -C 6 alkenyl, —OC 2 -C 6 alkynyl, C 1 -C 20 alkyl, C 2 -C 20 alkenyl, or C 2 -C 20 alkynyl is independently optionally substituted with deuterium, halogen, —OH, —CN, —OR 1 , —CO 2 H, C(O)OR 1 , —C(O)OC 1 -C 20 —PO 3 H 2 , —C(O)NH 2 , C(O)NH(C 1 -C 6 alkyl), —C(O)N(C 1 -C 6 alkyl) 2 , SC 1 -C 6 alkyl, S(O)C 1 -C 6 alkyl, —S(O) 2 C 1 -C 6 alkyl, —S(O)NH(C 1 -C 6 alkyl), —S(O) 2 NH(C 1 -C 6 alkyl), S(O)N(C 1 C 6 alkyl) 2 , —S(O) 2 N(C 1 -C 6 alkyl) 2 , —NH 2 , NH(C 1 -C 6 alkyl), —N(H)C 1 -C 6 alkyl-NH 2 , N(H)C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(R 1 )C 1 -C 6 alkyl-N(R 1 )C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(H)C 1 -C 6 alkyl-OC 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(H)C 1 -C 6 alkyl-N(H)C 1 -C 6 alkyl-NH 2 , —P(C 1 -C 6 alkyl) 2 , —P(O)(C 1 -C 6 alkyl) 2 , —PO 3 H 2 , or Si(OC 1 -C 6 alkyl) 3 ; and wherein each hydrogen atom in C 1 -C 6 alkyl of —N(H)C 1 -C 6 alkyl-O—C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 is optionally substituted with hydroxy; and
R 1 is independently deuterium, C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2 C 6 alkynyl, C 3 -C 6 cycloalkyl, or —C 1 -C 6 alkyl-O—C 1 -C 6 alkyl, wherein each hydrogen atom in C 1 -C 6 alkyl is optionally substituted with hydroxy.
4 . The fingerprint-resistant substrate of claim 3 , wherein R B is C 6 -C 20 alkyl and each hydrogen atom in C 6 -C 20 alkyl is independently optionally substituted by halogen, —OH, —CN, —OR 1 , —CO 2 H, —NH 2 , NH(C 1 -C 6 alkyl), —N(C 1 -C 6 alkyl) 2 , —P(C 1 -C 6 alkyl) 2 , —P(O)(C 1 -C 6 alkyl) 2 , or —PO 3 H 2 , wherein R 1 is independently deuterium or —C 1 -C 6 alkyl-O—C 1 -C 6 alkyl.
5 . The fingerprint-resistant substrate of claim 4 , wherein the alkyl silane is selected from the group consisting of (chloroundecyl)(triethoxy)silane, (chloroundecyl)(trimethoxy)silane, (chlorohexyl)(triethoxy)silane, (chlorohexyl)(trimethoxy)silane, 11-(2-methoxyethoxy)undecyltrimethoxysilane, (aminoundecyl)(triethoxy)silane, (aminoundecyl)(trimethoxy)silane, (hydoxydecyl)(triethoxy)silane, (hydoxydecyl)(trimethoxy)silane, (11-undecylinicacid)(triethoxy)silane, (hydroxyheptyl)(triethoxy) silane, (hydroxyundecyl)(triethoxy)silane, and (11-phosphoundecyl)(triethoxy)silane.
6 . The fingerprint-resistant substrate of claim 1 , wherein the formulation for a fingerprint-resistant coating comprises a POSS of the formula
wherein R is —C 1 -C 6 alkyl, -A E -O—B F -C G -O-D H , or —O-Si(C 1 -C 6 alkyl) 3 , wherein A is C 1 -C 6 alkyl, B is —C 1 -C 6 alkyl-O—, C is C 1 -C 6 alkyl, D is C 1 -C 6 alkyl, O is oxygen, each of E, G, and H is at least 1, and F is an integer from 5 to 12, and wherein each hydrogen atom in C 1 C 6 alkyl is independently optionally substituted with deuterium, halogen, —OH, —CN, —OR 2 , OC 1 -C 6 alkyl, —NH 2 , NH(C 1 -C 6 alkyl), —NH(C 1 -C 6 alkyl), —N(H)C 1 -C 6 alkyl-NH 2 , —N(C 1 -C 6 alkyl) 2 , —P(C 1 -C 6 alkyl) 2 , —P(O)(C 1 -C 6 alkyl) 2 , or —OPO 3 H; and
wherein R 2 is independently deuterium, C 2 -C 6 alkenyl, C 2 -C 6 alkynyl, C 3 -C 6 cycloalkyl, or —CC 1 -C 6 alkyl-O—C 1 -C 6 alkyl.
7 . The fingerprint-resistant substrate of claim 6 , wherein R is -A E -O—B F -C G -O-D H or —O—Si(C 1 -C 6 alkyl) 3 .
8 . The fingerprint-resistant substrate of claim 1 , wherein the fingerprint-resistant substrate has a coefficient of friction less than about 0.2.
9 . The fingerprint-resistant substrate of claim 1 , wherein the substrate is comprises at least one material selected from the group consisting of glass, metal oxide, and acrylic polymer.
10 . The fingerprint-resistant substrate of claim 1 , wherein the fingerprint-resistant substrate has an initial oil angle of at least less than about 40°.
11 . The fingerprint-resistant substrate of claim 10 , wherein the fingerprint-resistant substrate has an initial water angle of about 70° to about 90°.
12 . A formulation for a fingerprint-resistant coating, the formulation comprising
an alkyl silane,
a POSS, and
a solvent,
wherein the alkyl silane is of the formula
(R A ) 3 SiR B ,
wherein each R A is independently —OC 1 -C 6 alkyl, —OC 2 -C 6 alkenyl, or —OC 2 -C 6 alkynyl;
R B is C 1 -C 20 alkyl, C 2 -C 20 alkenyl, or C 2 -C 20 alkynyl; wherein each hydrogen atom in —OC 1 -C 6 alkyl, —OC 2 -C 6 alkenyl, —OC 2 -C 6 alkynyl, C 1 -C 20 alkyl, C 2 -C 20 alkenyl, or C 2 -C 20 alkynyl is independently optionally substituted with deuterium, halogen, —OH, —CN, —OR 1 , —CO 2 H, C(O)OR 1 , —C(O)OC 1 -C 20 —PO 3 H 2 , —C(O)NH 2 , C(O)NH(C 1 -C 6 alkyl), —C(O)N(C 1 -C 6 alkyl) 2 , SC 1 -C 6 alkyl, S(O)C 1 -C 6 alkyl, —S(O) 2 C 1 -C 6 alkyl, —S(O)NH(C 1 -C 6 alkyl), —S(O) 2 NH(C 1 -C 6 alkyl), S(O)N(C 1 C 6 alkyl) 2 , —S(O) 2 N(C 1 -C 6 alkyl) 2 , —NH 2 , NH(C 1 -C 6 alkyl), —N(H)C 1 -C 6 alkyl-NH 2 , N(H)C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(R 1 )C 1 -C 6 alkyl-N(R)C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(H)C 1 -C 6 alkyl-OC 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(H)C 1 -C 6 alkyl-N(H)C 1 -C 6 alkyl-NH 2 , —P(C 1 -C 6 alkyl) 2 , —P(O)(C 1 -C 6 alkyl) 2 , —PO 3 H 2 , or Si(OC 1 -C 6 alkyl) 3 ; and wherein each hydrogen atom in C 1 -C 6 alkyl of —N(H)C 1 -C 6 alkyl-O—C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 is optionally substituted with hydroxy; and
R 1 is independently deuterium, C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2 C 6 alkynyl, C 3 -C 6 cycloalkyl, or —C 1 -C 6 alkyl-O—C 1 -C 6 alkyl, wherein each hydrogen atom in C 1 -C 6 alkyl is optionally substituted with hydroxy.
13 . The formulation of claim 12 , wherein R B is C 6 -C 20 alkyl and each hydrogen atom in C 6 -C 20 alkyl is independently optionally substituted by halogen, —OH, —CN, —OR 1 , —CO 2 H, —NH 2 , NH(C 1 -C 6 alkyl), —N(C 1 -C 6 alkyl) 2 , —P(C 1 -C 6 alkyl) 2 , —P(O)(C 1 -C 6 alkyl) 2 , —PO 3 H 2 , wherein R 1 is independently deuterium or —C 1 -C 6 alkyl-O—C 1 -C 6 alkyl.
14 . The formulation of claim 13 , wherein the alkyl silane is selected from the group consisting of (chloroundecyl)(triethoxy)silane, (chloroundecyl)(trimethoxy)silane, (chlorohexyl)(triethoxy)silane, (chlorohexyl)(trimethoxy) silane, 11-(2-methoxyethoxy)undecyltrimethoxysilane, (aminoundecyl)(triethoxy)silane, (aminoundecyl)(trimethoxy)silane, (hydoxydecyl)(triethoxy)silane, (hydoxydecyl)(trimethoxy)silane, (11undecylinicacid)(triethoxy)silane, (hydroxyheptyl)(triethoxy) silane, (hydroxyundecyl)(triethoxy)silane, and (11-phosphoundecyl)(triethoxy)silane.
15 . The formulation of claim 12 , wherein the POSS is of the formula
wherein R is —C 1 -C 6 alkyl, -A E -O—B F -C G -O-D H , or —O-Si(C 1 -C 6 alkyl) 3 , wherein A is C 1 -C 6 alkyl, B is —C 1 -C 6 alkyl-O—, C is C 1 -C 6 alkyl, D is C 1 -C 6 alkyl, O is oxygen, each of E, G, and H is at least 1, and F is an integer from 5 to 12, and wherein each hydrogen atom in C 1 C 6 alkyl is independently optionally substituted with deuterium, halogen, —OH, —CN, —OR 2 , OC 1 -C 6 alkyl, —NH 2 , NH(C 1 -C 6 alkyl), —NH(C 1 -C 6 alkyl), —N(H)C 1 -C 6 alkyl-NH 2 , —N(C 1 -C 6 alkyl) 2 , P(C 1 -C 6 alkyl) 2 , —P(O)(C 1 -C 6 alkyl) 2 , or —OPO 3 H; and
wherein R 2 is independently deuterium, C 2 -C 6 alkenyl, C 2 -C 6 alkynyl, C 3 -C 6 cycloalkyl, or —CC 1 -C 6 alkyl-O—C 1 -C 6 alkyl.
16 . The formulation of claim 12 , wherein the formulation comprises a PDMS.
17 . The formulation of claim 16 , wherein the PDMS is amino terminated.
18 . A process for forming a fingerprint-resistant coating on a substrate, the process comprising
applying a formulation for a fingerprint-resistant coating to a surface of the substrate, and
curing the formulation for a fingerprint-resistant coating on the surface of the substrate to form the fingerprint-resistant coating,
wherein the initial oil angle of the fingerprint-resistant coating is less than about 40° and the coefficient of friction of the fingerprint-resistant coating is less than about 0.15.
19 . The process of claim 18 , wherein the formulation for a fingerprint-resistant coating comprises an alkyl silane of the formula
(R A ) 3 SiR B ,
wherein each R A is independently —OC 1 -C 6 alkyl, —OC 2 -C 6 alkenyl, or —OC 2 -C 6 alkynyl;
R B is C 1 -C 20 alkyl, C 2 -C 20 alkenyl, or C 2 -C 20 alkynyl; wherein each hydrogen atom in —OC 1 -C 6 alkyl, —OC 2 -C 6 alkenyl, —OC 2 -C 6 alkynyl, C 1 -C 20 alkyl, C 2 -C 20 alkenyl, or C 2 -C 20 alkynyl is independently optionally substituted with deuterium, halogen, —OH, —CN, —OR 1 , —CO 2 H, C(O)OR 1 , —C(O)OC 1 -C 20 —PO 3 H 2 , —C(O)NH 2 , C(O)NH(C 1 -C 6 alkyl), —C(O)N(C 1 -C 6 alkyl) 2 , SC 1 -C 6 alkyl, S(O)C 1 -C 6 alkyl, —S(O) 2 C 1 -C 6 alkyl, —S(O)NH(C 1 -C 6 alkyl), —S(O) 2 NH(C 1 -C 6 alkyl), S(O)N(C 1 C 6 alkyl) 2 , —S(O) 2 N(C 1 -C 6 alkyl) 2 , —NH 2 , NH(C 1 -C 6 alkyl), —N(H)C 1 -C 6 alkyl-NH 2 , N(H)C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(R 1 )C 1 -C 6 alkyl-N(R)C 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(H)C 1 -C 6 alkyl-OC 1 -C 6 alkyl-Si(˜OC 1 -C 6 alkyl) 3 , —N(H)C 1 -C 6 alkyl-N(H)C 1 -C 6 alkyl-NH 2 , —P(C 1 -C 6 alkyl) 2 , —P(O)(C 1 -C 6 alkyl) 2 , —PO 3 H 2 , or Si(OC 1 -C 6 alkyl) 3 ; and wherein each hydrogen atom in C 1 -C 6 alkyl of —N(H)C 1 -C 6 alkyl-O—C 1 -C 6 alkyl-Si(—OC 1 -C 6 alkyl) 3 is optionally substituted with hydroxy; and
R 1 is independently deuterium, C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2 C 6 alkynyl, C 3 -C 6 cycloalkyl, or —C 1 -C 6 alkyl-O—C 1 -C 6 alkyl, wherein each hydrogen atom in C 1 -C 6 alkyl is optionally substituted with hydroxy.
20 . The process of claim 18 , wherein the step of applying is performed by chemical vapor deposition, physical vapor deposition, dipping, wiping, or spraying the formulation for a fingerprint-resistant coating onto the surface of the substrate.