IP Library Granted Patent US 10,886,605
Granted Patent B2
US 10,886,605 · App. 16/430,311 · Granted Jan 5, 2021

Scattered void reservoir

Inventors: Cagdas Varel (Seattle, WA); Steven Howard Linn (Hillsboro, OR); Felix Chen (Kirkland, WA)
Assignee: KYMETA CORPORATION
H01Q1/364H01Q15/0086H03L7/099
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,886,605
App. No.
16/430,311
Granted
Jan 5, 2021
Kind
B2
Abstract

An antenna apparatus and method for using the same are disclosed. In one embodiment, the antenna comprises an antenna element array having a plurality of radiating radio-frequency (RF) antenna elements formed using portions of first and second substrates with a liquid crystal (LC) therebetween, the first substrate comprising a plurality of irises and the second substrate comprises a plurality of patches, wherein each of the patches is co-located over and separated from an iris in the plurality of irises with LC at least partially between each overlap region a patch and iris overlap; and a reservoir structure between the first and second substrates to hold LC and comprising areas around the RF antenna elements, the reservoir structure having a cavity large enough to accommodate thermal expansion of the LC and having one or more areas void of LC, wherein LC remains in patch/iris overlap regions of the plurality of radiating RF antenna elements even when additional LC could enter the one or more areas void of LC.

Claims (25)

1. An antenna comprising:

an antenna element array having a plurality of radiating radio-frequency (RF) antenna elements formed using portions of first and second substrates with a liquid crystal (LC) therebetween, the first substrate comprising a plurality of irises and the second substrate comprises a plurality of patches, wherein each of the patches is co-located over and separated from an iris in the plurality of irises with LC at least partially between each overlap region a patch and iris overlap; and

a reservoir structure between the first and second substrates to hold LC and comprising areas around the RF antenna elements, the reservoir structure having a cavity large enough to accommodate thermal expansion of the LC and having one or more areas void of LC, wherein LC remains in patch/iris overlap regions of the plurality of radiating RF antenna elements even when additional LC could enter the one or more areas void of LC.

2. The antenna defined in claim 1 wherein the one or more areas void of LC are created when initially wetting LC into the patch/iris overlap regions of the plurality of radiating RF elements.

3. The antenna defined in claim 1 wherein antenna element structures of one or more RF antenna elements cause LC to remain within each patch/iris overlap region of each of the plurality of radiating RF elements.

4. The antenna defined in claim 3 wherein the antenna element structures cause contact line pinning of the LC at one or more edges of each patch and iris at each patch/iris overlap region.

5. The antenna defined in claim 4 wherein the contact line pinning is due, at least in part, to an increase in wetting angle at patch and iris metal layers.

6. The antenna defined in claim 4 wherein contact line pinning occurs at the one or more edges of the patch and iris where a taper angle of a metal layer has a predetermined steepness to produce a wetting angle that causes formation of an energy barrier at said each patch/iris overlap region.

7. The antenna defined in claim 6 wherein the taper angle is at least 25°.

8. The antenna defined in claim 6 wherein each patch/iris overlap region includes an overlap of a patch metal layer and an iris metal layer, the patch metal layer having one or more additional materials layered on top of the patch metal layer except in a middle area of the patch/iris overlap region.

9. The antenna defined in claim 1 wherein at least one of the one or more areas void of LC is within an antenna element.

10. The antenna defined in claim 1 wherein the reservoir structure collects the LC due to LC expansion.

11. The antenna defined in claim 10 wherein the environmental changes include a change in pressure or temperature.

12. The antenna defined in claim 1 wherein each patch/slot pair is controlled by application of a voltage to the patch in the pair specified by a control pattern to control radiating RF antenna elements of the plurality of radiating RF antenna elements to form a beam for the frequency band for use in holographic beam steering.

13. An antenna comprising:

an antenna element array having a plurality of radiating radio-frequency (RF) antenna elements formed using portions of first and second substrates with a liquid crystal (LC) therebetween, the first substrate comprising a plurality of irises and the second substrate comprises a plurality of patches, wherein each of the patches is co-located over and separated from an iris in the plurality of irises with LC at least partially between each overlap region a patch and iris overlap; and

a reservoir structure between the first and second substrates to collect LC due to LC expansion and comprising areas around the RF antenna elements, the reservoir structure having a cavity large enough to accommodate thermal expansion of the LC and having one or more areas void of LC,

wherein antenna element structures of one or more RF antenna element cause a portion the LC to remain within each patch/iris overlap region of each of the plurality of radiating RF elements even when additional LC could enter the one or more areas void of LC.

14. The antenna defined in claim 13 wherein the one or more areas void of LC are created when initially wetting LC into the patch/iris overlap regions of the plurality of radiating RF elements.

15. The antenna defined in claim 13 wherein the antenna element structures cause contact line pinning of the LC at one or more edges of each patch and iris at each patch/iris overlap region.

16. The antenna defined in claim 15 wherein the contact line pinning is due, at least in part, to an increase in wetting angle at patch and iris metal layers.

17. The antenna defined in claim 15 wherein contact line pinning occurs at the one or more edges of the patch and iris where a taper angle of a metal layer has a predetermined steepness to produce a wetting angle that causes formation of an energy barrier at said each patch/iris overlap region.

18. The antenna defined in claim 17 wherein the taper angle is at least 25°.

19. The antenna defined in claim 17 wherein each patch/iris overlap region includes an overlap of a patch metal layer and an iris metal layer, the patch metal layer having one or more additional materials layered on top of the patch metal layer except in a middle area of the patch/iris overlap region.

20. The antenna defined in claim 13 wherein at least one of the one or more areas void of LC is within an antenna element.

Assignments (4)
SECURITY INTEREST Recorded Feb 7, 2025
From: KYMETA CORPORATION
To: GATES FRONTIER, LLC
Reel/Frame 070154/0001 →
SECURITY INTEREST Recorded Jul 11, 2024
From: KYMETA CORPORATION
To: TRINITY CAPITAL INC.
Reel/Frame 068276/0105 →
SECURITY INTEREST Recorded Apr 12, 2024
From: KYMETA CORPORATION
To: GATES FRONTIER, LLC
Reel/Frame 067095/0862 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 5, 2019
From: VAREL, CAGDAS; LINN, STEVEN HOWARD; CHEN, FELIX
To: KYMETA CORPORATION
Reel/Frame 049676/0380 →
Continuity (2)
Provisional Application 62681538 · Jun 6, 2018
Related Publication 20190379111A1 · Dec 12, 2019
Cited By (4)
US 12,306,055 US 12,332,130 US 12,596,039 US 12,656,193