Multi-photodiode pixel cell

1. An apparatus comprising:

a semiconductor substrate including:

a front side surface,

a first photodiode to generate a first charge,

a second photodiode to generate a second charge,

a barrier layer between the first photodiode and the second photodiode and configured to control flow of the second charge from the second photodiode to the first photodiode, and

a drain region to store the first charge and at least a first part of the second charge;

a gate on the front side surface over a first channel region between the first photodiode and the drain region to control the flow of the first charge and the at least the first part of the second charge to the drain region; and

a second channel region to conduct at least a second part of the second charge away from the second photodiode and the barrier layer when the second photodiode saturates.

2. The apparatus of claim 1 , wherein the second channel region is part of the semiconductor substrate and intersects the barrier layer.

3. The apparatus of claim 2 , wherein the second channel region connects between the second photodiode and the drain region.

4. The apparatus of claim 3 , wherein:

each of the drain region and the second channel region comprises an N-type semiconductor material; and

the second channel region is connected to an N-type region of the second photodiode.

5. The apparatus of claim 4 , wherein the semiconductor substrate further comprises a P-well that surrounds the N-type region of the second photodiode; and

wherein the N-type second channel region is formed in the P-well.

6. The apparatus of claim 4 , wherein a first dopant concentration of the second channel region is lower than a second dopant concentration of the N-type region of the second photodiode.

7. The apparatus of claim 3 , wherein:

the drain region is a first drain region;

the semiconductor substrate further comprises a second drain region; and

the second channel region connects between the second photodiode and the second drain region.

8. The apparatus of claim 1 , wherein the second channel region is formed by an ion implantation process.

9. The apparatus of claim 1 , wherein the second photodiode is sandwiched between the barrier layer and the second channel region.

10. The apparatus of claim 9 , wherein:

the drain region is a first drain region;

the semiconductor substrate further comprises a second drain region; and

the second channel region is sandwiched between the second photodiode and the second drain region.

11. The apparatus of claim 10 , wherein the second channel region comprises an epitaxy layer formed on a back side surface of the semiconductor substrate, the back side surface being opposite to the front side surface of the semiconductor substrate.

12. The apparatus of claim 10 , wherein:

the semiconductor substrate further comprises a first conductive region and a second conductive region extending from the front side surface configured to receive, respectively, a first voltage and a second voltage;

the first conductive region extends from the front side surface to the second channel region and is configured to bias the second channel region at the first voltage; and

the second conductive region extends from the front side surface to the second drain region and is configured to bias the second drain region at the second voltage.

13. The apparatus of claim 10 , wherein the second channel region comprises a P-type semiconductor material; and

wherein the second drain region comprises an N-type semiconductor material.

14. The apparatus of claim 1 , wherein:

the semiconductor substrate includes a back side surface opposite to the front side surface configured as a light receiving surface;

the first photodiode is configured to convert a first component of light within an infra-red light wavelength range to the first charge; and

the second photodiode is configured to convert a second component of light within a visible light wavelength range to the second charge.

15. The apparatus of claim 1 , wherein:

the front side surface is configured as a light receiving surface;

the first photodiode is configured to convert a first component of light within a visible light wavelength range to the first charge; and

the second photodiode is configured to convert a second component of light within an infra-red light wavelength range to the second charge.

16. The apparatus of claim 1 , wherein the first channel region comprises a buried layer.

17. The apparatus of claim 16 , further comprising a conductive deep trench isolation (C-DTI) structure that extends from the front side surface and across an N-type region of the first photodiode and the barrier layer; and

wherein the C-DTI structure is configured to receive a voltage and to bias the barrier layer based on the voltage.

18. The apparatus of claim 17 , wherein the C-DTI structure extends across the an N-type region of the second photodiode.

19. The apparatus of claim 1 , further comprising:

a back side surface opposite to the front side surface; and

a C-DTI structure that extends from the back side surface and across an N-type region of the second photodiode and the barrier layer,

wherein the C-DTI structure is configured to receive a voltage signal and to bias the barrier layer based on the voltage signal.

20. The apparatus of claim 1 , wherein:

the gate is a first gate;

the apparatus further comprises a second gate that extends from the front side surface to reach the barrier layer; and

the second gate is configured to receive a voltage signal and to bias the barrier layer based on the voltage signal.