Increased particle loading by surface modification with polyethersilane

1. A modified colloidal silica produced by a process comprising:

mixing an alkyl silicate to form a colloidal silica and

treating a surface of the colloidal silica with an amount of a polyethersilane to form a modified colloidal silica with the surface modified, wherein the polyethersilane is 2-[methoxy(polyethyleneoxy)propyl]dimethylmethoxysilane.

2. The modified colloidal silica of claim 1 , wherein 0.1-10 wt % of the polyethersilane, based on the weight of a mother liquid of colloidal silane, is used to treat the mother liquid of the colloidal silica.

3. The modified colloidal silica of claim 1 , wherein the alkyl silicate is a tetraalkyl orthosilicate.

4. The modified colloidal silica of claim 3 , wherein the tetraalkyl orthosilicate is at least one selected from the group consisting of tetramethyl orthosilicate and tetraethyl orthosilicate.

5. A polishing material, comprising: the modified colloidal silica of claim 1 .

6. A method for producing a modified colloidal silica, comprising:

1) preparing a mother liquid comprising an alkali catalyst and water;

2) adding an amount of a hydrolyzed liquid obtained by hydrolyzing an alky] silicate to the mother liquid forming a colloidal silica; and

3) treating a surface of the colloidal silica with an amount of polyethersilane to form a modified colloidal silica with the surface modified, wherein the polyethersilane is 2-[methoxy(polyethyleneoxy)propyl]dimethylmethoxysilane.

7. The method of claim 6 , wherein 0.1-10 wt % of the polyethersilane, based on the weight of a mother liquid of colloidal silane, is used to treat the mother liquid of the colloidal silica.

8. The method of claim 6 , further comprising:

preparing the hydrolyzed liquid by hydrolyzing the alkyl silicate in absence of the catalyst.

9. The method of claim 6 , wherein the mother liquid further comprises seed particles.

10. The method of claim 6 , wherein the alkyl silicate is tetraalkyl orthosilicate.

11. The method of claim 10 , wherein the alkyl silicate is tetramethyl orthosilicate or tetraethyl orthosilicate.

12. The modified colloidal silica of claim 1 , wherein during the treating a methoxysilane group of the polyethersilane reacts with the surface of the colloidal silica causing the polyethersilane to graft on the colloidal silica surface.

13. An aqueous solution of the modified colloidal silica of claim 1 , wherein the aqueous solution has a solid content of 25 wt % to 40 wt %.

14. The method of claim 6 , wherein during the treating a methoxysilane group of the polyethersilane reacts with the surface of the colloidal silica causing the polyethersilane to graft on the colloidal silica surface.