LED DBR structure with reduced photodegradation
A distributed Bragg reflector (DBR) structure on a substrate includes a high refractive index layer comprising titanium oxide (TiO2) and a low refractive index layer having a high carbon region and at least one low carbon region that contacts the high refractive index layer. Multiple layers of the high refractive index layer and the low refractive index layer are stacked. Typically, the multiple layers of the high refractive index layer and the low refractive index layer are stacked to a thickness of less than 10 microns. Each of the respective layers of the high refractive index layer and the low refractive index layer have a thickness of less than 0.2 microns.
1. A DBR structure on a substrate, comprising:
high refractive index layers each comprising titanium oxide (TiO 2 ); and
low refractive index layers each having a high carbon region and at least one low carbon region that contacts at least one of the high refractive index layers.
2. The DBR structure of claim 1 , wherein the high refractive index layers and the low refractive index layers are stacked to a thickness of less than 10 microns.
3. The DBR structure of claim 1 , wherein each of the respective layers of the high refractive index layers and the low refractive index layers have a thickness of less than 0.2 microns.
4. The DBR structure of claim 1 , wherein each of the low refractive index layers further comprises at least one of Al 2 O 3 and SiO 2 .
5. The DBR structure of claim 1 , wherein the high carbon region of the low refractive index layers further comprises Al 2 O 3 formed from an organometallic precursor.
6. The DBR structure of claim 1 , wherein the high carbon region of the low refractive index layers further comprises Al 2 O 3 formed from Trimethyl Aluminum.
7. The DBR structure of claim 1 , wherein the low carbon region of the low refractive index layers further comprises Al 2 O 3 formed from a halide precursor.
8. The DBR structure of claim 1 , wherein the low carbon region of the low refractive index layers further comprises Al 2 O 3 formed from AlCl 3 .
9. The DBR structure of claim 1 , wherein the substrate is sapphire.
10. An ALD process for forming a DBR structure on a substrate, comprising the steps of:
depositing a first low refractive index layer having a high carbon region;
depositing a first low refractive index layer with a low carbon region that contacts the high carbon region;
depositing a high refractive index layer comprising titanium oxide (TiO 2 ) that contacts the low carbon region of the first low refractive index layer;
depositing a second low refractive index layer with a low carbon region that contacts the high refractive index layer; and
depositing a second low refractive index layer having a high carbon region.
11. An ALD process for forming a DBR structure on a substrate of claim 10 , wherein the first and second low refractive index layers further comprise Al 2 O 3 .
12. An ALD process for forming a DBR structure on a substrate of claim 10 , wherein the high carbon region of the first and second low refractive index layers further comprises Al 2 O 3 formed from an organometallic precursor.
13. An ALD process for forming a DBR structure on a substrate of claim 10 , wherein the high carbon region first and second low refractive index layers further comprises Al 2 O 3 formed from Trimethyl Aluminum.
14. An ALD process for forming a DBR structure on a substrate of claim 10 , wherein the low carbon region of the first and second low refractive index layers further comprises Al 2 O 3 formed from a halide precursor.
15. An ALD process for forming a DBR structure on a substrate of claim 10 , wherein the low carbon region of the first and second low refractive index layers further comprises Al 2 O 3 formed from AlCl 3 .
16. An ALD process for forming a DBR structure on a substrate of claim 10 , wherein the substrate is sapphire.