Configuring optical layers in imprint lithography processes
An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
1. An imprint lithography method of configuring an optical layer, the imprint lithography method comprising:
depositing a set of droplets onto a substrate along a side of the substrate in a manner such that the set of droplets contacts the substrate but does not contact a functional pattern formed on the substrate; and
curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern,
wherein the set of droplets is a first set of droplets, the imprint lithography method further comprising:
depositing each drop of the first set of droplets directly on the side of the substrate;
curing the first set of droplets directly on the side of the substrate;
depositing a second set of droplets atop the side of the substrate such that each droplet of the second set of droplets is respectively dispensed directly atop a droplet of the first set of droplets; and
curing the second set of droplets directly atop the first set of droplets to increase a height of the spacer layer,
wherein a first number of droplets in the first set of droplets is not equal to a second number of droplets in the second set of droplets such that the spacer layer has a variable height.
2. The imprint lithography method of claim 1 , wherein each droplet of the set of droplets has a volume of about 1 pL to about 100 pL.
3. The imprint lithography method of claim 1 , further comprising generating a drop-on demand programming scheme.
4. The imprint lithography method of claim 1 , further comprising providing a printing screen.
5. The imprint lithography method of claim 1 , further comprising imprinting the functional pattern on the substrate.
6. The imprint lithography method of claim 1 , wherein depositing the set of droplets onto the substrate comprises dispensing droplet volumes of a polymerizable substance directly onto the substrate atop the side of the substrate.
7. The imprint lithography method of claim 1 , wherein each droplet of the first set of droplets has a cured height of about 0.5 μm to about 20.0 μm.
8. The imprint lithography method of claim 1 , wherein the spacer layer has a wedge shape.
9. The imprint lithography method of claim 1 , wherein the functional pattern is imprinted on the side of the substrate.
10. The imprint lithography method of claim 9 , wherein the functional pattern is imprinted along an interior region of the side of the substrate, the imprint lithography method further comprising depositing the set of droplets along a peripheral edge of the side of the substrate.
11. The imprint lithography method of claim 1 , wherein the side of the substrate is a first side of the substrate, and wherein the functional pattern is imprinted on a second side of the substrate that is opposite the first side of the substrate.
12. The imprint lithography method of claim 11 , further comprising depositing the set of droplets across an entirety of the first side of the substrate.
13. The imprint lithography method of claim 1 , further comprising attaching the substrate to the surface adjacent the substrate at the set of droplets such that the spacer layer forms a gap between the substrate and the surface.
14. The imprint lithography method of claim 1 , wherein the gap provides a low index region having an index of refraction in a range of about 1.0 to about 1.2.
15. The imprint lithography method of claim 14 , wherein the low index region comprises air.
16. The imprint lithography method of claim 14 , wherein the low index region has an index of refraction of 1.
17. An optical layer, comprising:
a substrate;
a functional pattern formed on the substrate;
a first cured set of droplets disposed on the substrate along a side of the substrate such that the first cured set of droplets is in contact with the substrate and spaced apart from the functional pattern, the first cured set of droplets forming a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the first cured set of droplets at a position spaced apart from the functional pattern; and
a second cured set of droplets atop the side of the substrate such that each droplet of the second cured set of droplets is directly atop a cured droplet of the first cured set of droplets, thereby increasing a height of the spacer layer relative to the first cured set of droplets,
wherein a number of droplets in the first set of cured droplets is not equal to a number of droplets in the second cured set of droplets, such that the spacer layer has a variable height.