IP Library Granted Patent US 10,718,733
Granted Patent B2
US 10,718,733 · App. 16/459,515 · Granted Jul 21, 2020

Methods and apparatus for measuring analytes

Inventors: Mark Milgrew (Branford, CT); Jonathan Rothberg (Guilford, CT); James Bustillo (Castro Valley, CA)
Assignee: Life Technologies Corporation
G01N27/4145C12Q1/6869C12Q1/6874G01N27/27G01N27/414Y10T29/49002
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Quick Facts
Patent No.
US 10,718,733
App. No.
16/459,515
Granted
Jul 21, 2020
Kind
B2
Abstract

Methods and apparatus relating to FET arrays for monitoring chemical and/or biological reactions such as nucleic acid sequencing-by-synthesis reactions. Some methods provided herein relate to improving signal (and also signal to noise ratio) from released hydrogen ions during nucleic acid sequencing reactions.

Claims (25)

1. A semiconductor device, comprising:

a sensor array formed in columns and rows, wherein each sensor in the sensor array comprises a two-transistor circuit that includes a chemically-sensitive field effect transistor (chemFET), and a row select transistor;

an array of microwells formed on the sensor array, wherein each microwell is capacitively coupled to at least one sensor;

circuitry for reading each chemFET in the sensor array; and

an analog-to-digital converter (ADC) for each column in the sensor array to convert an analog signal from each chemFET in each column to a digital form that is output from the semiconductor device.

2. The semiconductor device of claim 1 , wherein the circuitry for reading each chemFET in the sensor array includes a row-addressing circuit to provide a row address for each chemFET in the sensor array.

3. The semiconductor device of claim 1 , wherein the sensor array is subdivided into a plurality of sensor array sub-regions; each sensor array sub-region including:

circuitry for reading each chemFET in the sensor array sub-region; and

an ADC for each column in the sensor array sub-region to convert an analog signal from each chemFET in the sensor array sub-region to a digital form.

4. The semiconductor device of claim 3 , wherein the sensor array further comprises a first sensor array sub-region and a second sensor array sub-region.

5. The semiconductor device of claim 4 , wherein the semiconductor device further comprises a multiplexer to provide a single digital output stream.

6. The semiconductor device of claim 1 , wherein each chemFET is coupled to a reference electrode voltage circuit.

7. The semiconductor device of claim 1 , wherein the sensor array comprises at least 6.5 million sensors.

8. The semiconductor device of claim 1 , wherein each chemFET has a first terminal that is coupled to a first readout signal line common to each chemFET of a respective column.

9. The semiconductor device of claim 1 , wherein each chemFET in the sensor array further comprises a floating gate coupled to a chemically-sensitive passivation layer.

10. The semiconductor device of claim 9 , wherein the chemically-sensitive passivation layer is sensitive to ionic species.

11. The semiconductor device of claim 10 , wherein the chemically-sensitive passivation layer is sensitive to hydrogen ion.

12. The semiconductor device of claim 11 , wherein each chemFET in the sensor array has a pH range for measuring change in hydrogen ion concentration from pH 6 to pH 9.5.

13. The semiconductor device of claim 12 , wherein each chemFET in the sensor array has a pH range for measuring change in hydrogen ion concentration from pH 7 to pH 9.

14. The semiconductor device of claim 10 , wherein the chemically-sensitive passivation layer is sensitive to pyrophosphate.

15. The semiconductor device of claim 1 , wherein each microwell has a contiguous sidewall structure and a bottom surface defining each microwell.

16. The semiconductor device of claim 15 , wherein the bottom surface comprises a chemically-sensitive passivation layer coupled to a floating gate.

17. The semiconductor device of claim 16 , wherein the chemically-sensitive passivation layer is sensitive to hydrogen ion.

18. The semiconductor device of claim 16 , wherein the chemically-sensitive passivation layer is sensitive to pyrophosphate.

19. The semiconductor device of claim 15 , wherein the contiguous sidewall structure and the bottom surface defining each microwell includes a buffering inhibitor.