Gate structure and method for producing same
This invention concerns a gate structure and a process for its manufacturing. In particular, the present invention concerns the gate structuring of a field effect transistor with reduced thermo-mechanical stress and increased reliability (lower electromigration or diffusion of the gate metal). The gate structure according to the invention comprises a substrate; an active layer disposed on the substrate; an intermediate layer disposed on the active layer, the intermediate layer-having a recess extending through the entire intermediate layer towards the active layer; and a contact element which is arranged within the recess, the contact element completely filling the recess and extending to above the intermediate layer, the contact element resting at least in sections directly on the intermediate layer; the contact element being made of a Schottky metal and the contact element having an interior cavity completely enclosed by the Schottky metal.
1. A gate structure comprising:
a substrate;
an active layer disposed on the substrate;
an intermediate layer disposed on the active layer, wherein the intermediate layer has a recess extending through the entire intermediate layer towards the active layer;
a contact element which is arranged inside the recess, wherein the contact element completely fills the recess and extends to above the intermediate layer, wherein the contact element rests directly on the intermediate layer at least in sections or the contact element is separated from the active layer and the intermediate layer by a dielectric cladding,
wherein the contact element is made of a Schottky metal
having an interior cavity completely enclosed by the Schottky metal; and
a dielectric layer disposed directly between the active layer and the intermediate layer, the contact element directly contacting the dielectric layer.
2. The gate structure of claim 1 , wherein the intermediate layer is a passivation layer.
3. The gate structure of claim 1 , wherein the intermediate layer comprises at least a first intermediate layer and a second intermediate layer.
4. A gate structure comprising:
a substrate;
an active layer disposed on the substrate;
an intermediate layer disposed on the active layer, wherein the intermediate layer has a recess extending through the entire intermediate layer towards the active layer, the intermediate layer is a passivation layer, the intermediate layer comprises at least a first intermediate layer and a second intermediate layer;
a contact element which is arranged inside the recess, wherein the contact element completely fills the recess and extends to above the intermediate layer, wherein the contact element rests directly on the intermediate layer at least in sections or the contact element is separated from the active layer and the intermediate layer by a dielectric cladding,
wherein the contact element is made of a Schottky metal having an interior cavity completely enclosed by the Schottky metal,
wherein the contact element contacts the active layer directly, and
wherein the contact element above the intermediate layer is directly covered by a gate metal and the contact element with the gate metal above the intermediate layer is completely surrounded by a dielectric covering layer; and
a dielectric layer disposed directly between the active layer and the intermediate layer, the contact element directly contacting the dielectric layer.
5. A gate structure comprising:
a substrate;
an active layer disposed on the substrate;
an intermediate layer disposed on the active layer, wherein the intermediate layer has a recess extending through the entire intermediate layer towards the active layer; and
a contact element which is arranged inside the recess, wherein the contact element completely fills the recess and extends to above the intermediate layer, wherein the contact element rests directly on the intermediate layer at least in sections or the contact element is separated from the active layer and the intermediate layer by a dielectric cladding,
wherein the contact element is made of a Schottky metal having an interior cavity completely enclosed by the Schottky metal, and
wherein the contact element above the intermediate layer is directly covered by a gate metal and the contact element with the gate metal above the intermediate layer is completely surrounded by a dielectric covering layer.
6. The gate structure of claim 5 , wherein the contact element contacts the active layer directly.
7. The gate structure of claim 5 , wherein the intermediate layer is a passivation layer.
8. The gate structure of claim 5 , wherein the intermediate layer comprises at least a first intermediate layer and a second intermediate layer.