IP Library Granted Patent US 11,357,102
Granted Patent B2
US 11,357,102 · App. 16/465,076 · Granted Jun 7, 2022

Method for forming non-flat devices

Inventor: Andres Felipe Vasquez Quintero (Antwerp, BE)
Assignees: IMEC VZW; Universiteit Gent
H05K1/0281B29D11/00038B29D11/00807H05K3/0014H05K3/0026B29K2701/12H05K2201/2009
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Quick Facts
Patent No.
US 11,357,102
App. No.
16/465,076
Granted
Jun 7, 2022
Kind
B2
Abstract

In a first aspect, the present disclosure relates to a method for designing a pattern of a stress relief layer for a flat device to be transformed into a shape-retaining non-flat device by deformation of the flat device. The flat device (and thus also the non-flat device) may comprise at least two components and at least one electrical interconnection between two components. In a second aspect, the present disclosure is related to a method of manufacturing a shape-retaining non-flat device by deformation of a flat device, wherein the flat device is attached to a patterned stress relief layer designed in accordance with the first aspect of the present disclosure. In preferred embodiments, the stress relief layer is a thermoplastic layer or a layer comprising a thermoplastic material and deformation of the flat device comprises deformation by a thermoforming process, after attachment of the flat device to the stress relief layer.

Claims (27)

1. A method for designing a pattern of a stress relief layer, wherein the stress relief layer comprises a layer of thermo-formable material and is designed for mechanical attachment to a flat device to be transformed by thermoforming into a shape-retaining non-flat device by deformation of the flat device after mechanical attachment of the stress relief layer, the flat device comprising at least two components and at least one electrical interconnection between the at least two components, the method comprising:

providing a layout of the flat device,

the layout comprising the at least two components and the at least one electrical interconnection,

the layout further comprising a patterned supporting layer having a first pattern comprising at least one first component island, at least one second component island, and at least one component interconnection track, the at least one first component island having a first component island pattern covering at least an area corresponding to the location of a first one of the at least two components, the at least one second component island having a second component island pattern covering at least an area corresponding to the location of another one of the at least two components, and the at least one component interconnection track having a component interconnection pattern covering at least an area corresponding to the location of the at least one electrical interconnection and providing a connection between the first component island and the second component island; and

thereafter defining a second pattern at least partially covering the first pattern, wherein defining the second pattern comprises:

defining an initial second pattern, wherein defining the initial second pattern comprises inserting a stress relief island for each component island, the stress relief island having a stress relief island pattern at least partially covering the corresponding component island pattern, and inserting a stress relief interconnection track for at least one component interconnection track, the stress relief interconnection track having a stress relief interconnection pattern fully covering the corresponding component interconnection pattern,

adapting the initial second pattern based on Finite Element simulations in view of optimizing stress distribution during thermoforming,

thereby obtaining an optimized second pattern, the optimized second pattern being the pattern of the stress relief layer.

2. The method for designing a pattern of a stress relief layer according to claim 1 , wherein defining the second pattern further comprises:

inserting an additional stress relief island for at least two component interconnection tracks, the stress relief island having a stress relief island pattern fully covering the corresponding at least two component interconnection patterns.

3. The method for designing a pattern of a stress relief layer according to claim 1 , wherein defining the second pattern further comprises:

inserting at least one beam-shaped stress relief element between the first stress relief island and the second stress relief island, wherein the at least one beam-shaped stress relief element forms a connection between the first stress relief island and the second stress relief island.

4. The method for designing a pattern of a stress relief layer according to claim 1 , wherein the non-flat device comprises a surface having a non-developable shape.

5. The method for designing a pattern of a stress relief layer according to claim 3 , wherein the non-flat device comprises a surface having a spherical shape.

6. The method for designing a pattern of a stress relief layer according to claim 5 , wherein at least part of the at least one beam-shaped stress relief elements is oriented along a longitudinal line of the spherical shape.

7. The method for designing a pattern of a stress relief layer according to claim 5 , wherein at least part of the at least one beam-shaped stress relief elements is oriented along a latitudinal line of the spherical shape.

8. The method for designing a pattern of a stress relief layer according to claim 3 , wherein the beam-shaped stress relief elements have straight boundary lines, non-straight boundary lines or a combination of straight and non-straight boundary lines.

9. A method of manufacturing a shape-retaining non-flat device by deformation of a flat device, the non-flat device comprising at least two components and at least one electrical interconnection between two components, the method comprising:

obtaining a second pattern of a stress relief layer according to claim 1 ;

obtaining the flat device;

providing a stress relief layer comprising a layer of thermoplastic material; mechanically attaching the flat device to the stress relief layer; and

patterning the stress relief layer according to the second pattern.

10. The method of manufacturing a shape-retaining non-flat device by deformation of a flat device according to claim 9 , further comprising:

deforming the stress relief layer with the flat device attached thereto into the non-flat device by a thermoforming process using a mold having a shape corresponding to the shape of the non-flat device.

11. The method of manufacturing a shape-retaining non-flat device by deformation of a flat device according to claim 9 , wherein mechanically attaching the flat device to the stress relief layer is done before patterning the stress relief layer.

12. The method of manufacturing a shape-retaining non-flat device by deformation of a flat device according to claim 9 , wherein mechanically attaching the flat device to the stress relief layer comprises embedding the flat device between a first stress relief layer and a second stress relief layer.

13. The method of manufacturing a shape-retaining non-flat device by deformation of a flat device according to claim 9 , wherein patterning the stress relief layer according to the second pattern comprises patterning by laser ablation.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 14, 2021
From: UNIVERSITEIT GENT
To: IMEC VZW
Reel/Frame 058380/0710 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 3, 2019
From: VASQUEZ QUINTERO, ANDRES FELIPE
To: IMEC VZW; UNIVERSITEIT GENT
Reel/Frame 049663/0852 →
Priority Claims (1)
EP 16201254 · Nov 29, 2016 · regional
Continuity (1)
Related Publication 20190387619A1 · Dec 19, 2019