Plasma spraying device and method for manufacturing battery electrode
There is provision of a plasma spraying device including a supplying section configured to convey feedstock powder with a plasma generating gas, and to inject the feedstock powder and the plasma generating gas from an opening of a tip; a plasma generating section configured to generate a plasma by decomposing the injected plasma generating gas using electric power of 500 W to 10 kW; and a chamber causing the supplying section and the plasma generating section to be an enclosed region, which is configured to deposit the feedstock powder on a workpiece by melting the feedstock powder by the plasma generated in the enclosed region. The feedstock powder is any one of lithium (Li), aluminum (Al), copper (Cu), silver (Ag), and gold (Au). A particle diameter of the feedstock powder is between 1 μm and 50 μm.
1. A method of manufacturing an electrode for a battery, the method comprising:
injecting feedstock powder and plasma generating gas from an opening of a tip by conveying the feedstock powder with the plasma generating gas, the feedstock powder being any one of lithium (Li), aluminum (Al), copper (Cu), silver (Ag), and gold (Au), and the feedstock powder having a particle diameter of 1 μm to 50 μm;
generating a plasma by decomposing the injected plasma generating gas using electric power of 500 W to 10 kW; and
depositing the feedstock powder on a surface of a substrate of the electrode for the battery, by melting the feedstock powder by the generated plasma.
2. The method according to claim 1 , wherein each of the injecting, the generating, and the depositing is performed in a chamber in which oxygen concentration is maintained to 10 ppm (10 −4 %) or less.
3. The method according to claim 1 , wherein the feedstock powder is any one of lithium (Li), aluminum (Al), copper (Cu), silver (Ag), and gold (Au), which is coated with organic or inorganic material, and a particle diameter of the feedstock powder coated with organic or inorganic material is between 1 μm and 200 μm.
4. The method according to claim 3 , wherein each of the injecting, the generating, and the depositing is performed in a chamber in which oxygen concentration is maintained to 100 ppm (10 −3 %) or less.
5. The method according to claim 3 , wherein, by the depositing being performed, necessity of pressing the deposited feedstock and removing the organic or inorganic material is eliminated.