Quaternary amine formulations and uses thereof
The present disclosure relates to preservative compositions for and methods of preserving household formulations, such as detergents, or preserving topical cosmetic or toiletry formulations against microbiological contamination or growth. Specifically, the disclosure relates to preservative compositions comprising an effective amount of a quaternary amine compound, an effective amount of an antifungal, and a solvent. Further, the disclosure relates to cosmetic or toiletry formulations comprising such preservative compositions. The disclosure further relates to method of making and using such preservative compositions and such cosmetic or toiletry formulations comprising the same.
1. A preservative composition comprising
a. a quaternary amine compound comprising cetyl pyridinium chloride, and that is 10 wt % to 20 wt % of the preservative composition;
b. an antifungal agent comprising benzoic acid, and that is 20 wt % to 35 wt % of the preservative composition, and wherein the antifungal agent does not comprise an imidazole antifungal; and
c. a solvent comprising propylene glycol, and that is 55 wt % to 64 wt % of the preservative composition,
wherein the antifungal agent and the quaternary amine compound are in a ratio of about 2:1.
2. The preservative composition of claim 1 , wherein the quaternary amine compound is 12 wt % to 18 wt % of the preservative composition.
3. The preservative composition of claim 2 , wherein the antifungal agent is 20 wt % to 25 wt % of the preservative composition.
4. The preservative composition of claim 1 , wherein the preservative composition is substantially free of methylisothiazolinone.
5. A process of preparing a preservative composition comprising
a. mixing at least one quaternary amine compound comprising cetyl pyridinium chloride, and that is 10 wt % to 20 wt % of the preservative composition; at least one antifungal agent comprising benzoic acid, and that is 20 wt % to 35 wt % of the preservative composition, and wherein the antifungal agent does not comprise an imidazole antifungal; and at least one solvent comprising propylene glycol, and that is 55 wt % to 64 wt % of the preservative composition, at a temperature of 40 ° C. to 50 ° C.
6. A topical cosmetic of
a. the preservative composition according to claim
b. at least one surfactant.
7. The cosmetic or toiletry composition of claim 6 , wherein the surfactant comprises one or more of an anionic surfactant, an amphoteric surfactant, a non-ionic surfactant, or a cationic surfactant.
8. The cosmetic or toiletry composition of claim 6 , wherein the surfactant comprises an anionic surfactant selected from the group consisting of sodium lauryl ether sulfate, sodium lauryl sulfate, ammonium lauryl sulfate, sodium pareth sulfate, sodium lauroyl lactylate, sodium lauryl sulfoacetate, sodium alkyl (C 10 -C 16 ) sulfate and sodium laureth sulfosuccinate.
9. The cosmetic or toiletry composition of claim 6 , wherein the surfactant comprises an amphoteric surfactant selected from a group consisting of cocamidopropyl betaine, sodium cocoampoacetate, capryl/capramidopropyl betaine, cocamidopropyl hydroxysultaine, and sodium cocoamphoproprionate.
10. The cosmetic or toiletry composition of claim 6 , wherein the surfactant comprises a non-ionic surfactant selected from the group consisting of PEG- 6 cocamide, lauramide DEA/MEA, Cocamide DEA/MEA, decyl glucoside and alkyl polyglucoside.
11. The cosmetic or toiletry composition of claim 6 , wherein the surfactant comprises a cationic surfactant selected from the group consisting of stearalkonium chloride, olealkonium chloride, dipalmitoylethyl hydroxyethylmonium methosulfate, quatemium-82, a polyquaternium, cetrimonium chloride and PCA ethyl cocoyl arginate.
12. The cosmetic or toiletry composition of claim 6 , wherein the surfactant is in an amount of 8 to 15 wt % of the cosmetic or toiletry composition.
13. The cosmetic or toiletry composition of claim 12 , wherein the preservative composition is in an amount of 0.2 wt % to 2.0 wt % of the cosmetic or toiletry composition.
14. The cosmetic or toiletry composition of claim 13 , further comprising; EDTA in an amount of 0.02 wt % to 0.3 wt % of the cosmetic or toiletry composition.
15. The cosmetic or toiletry composition of claim 14 , wherein the preservative composition is substantially free of methylisothiazolinone.
16. A method of preserving a cosmetic or toiletry composition comprising
a. mixing an effective amount of the preservative composition of claim 1 into a cosmetic or toiletry formulation, wherein the a preservative composition is capable of inhibiting the growth of one or more microorganisms.
17. The method of claim 16 , wherein the one or more microorganisms is selected from the group consisting of Staphylococcus aureus, Escherichia coli, Pseudomonas aeruginosa, Candida albicans and Aspergillus brasiliensis.
18. The method of claim 16 , wherein the preservative composition is substantially free of methylisothiazolinone.