Apparatus and method for cold plasma skin resurfacing
An apparatus and method for cold plasma skin resurfacing is provided. In one aspect, a mask for use in fractionated skin resurfacing is provided. The mask includes a plurality of apertures distributed across a surface of the mask. The mask may be made of a flexible material including an adhesive surface, such that the mask may be applied to a contoured surface of a patient's skin while remaining fixed in place. The material is resistant to the effects of a cold plasma beam. In this way, a cold plasma beam applicator may be used to scan or apply a cold plasma beam over a surface of the mask, such that only the portions of a patient's skin exposed by the apertures of the mask are treated by the cold plasma beam.
1 . A system for fractionated skin resurfacing comprising:
a mask including a top surface and a bottom surface with a plurality of apertures disposed therethrough, each of the plurality of apertures extending from the top surface to the bottom surface, wherein the mask is made of a non-conductive material and the bottom surface is configured to be applied to an area of skin of a patient to be treated; and
a cold plasma applicator configured to generate a cold plasma beam for a particular treatment and apply the cold plasma beam to the top surface of the mask,
wherein the plurality of apertures of the mask enable the cold plasma beam to contact portions of the area of skin exposed by the plurality of apertures and portions of the mask between each of the apertures produce untreated areas such that the area of skin exposed by the plurality of apertures is affected by the cold plasma beam and areas of skin under the portions of the mask between each of the apertures are untreated,
wherein the mask includes a first layer and a second layer,
the first layer including the top surface and a thermally insulating material, and
the second layer including the bottom surface and made from a material that retains temperatures of the mask below ambient temperature for a period of time, the bottom surface of the second layer contacting the area of skin to be treated,
wherein the first layer insulates the second layer from an environment surrounding the mask reducing absorption of heat in the second layer from the surrounding environment to retain the temperature of the second layer for the period of time.
2 . The system of claim 1 ,
wherein the mask has a predetermined thickness, a predetermined spacing between each of the plurality of apertures and the plurality of apertures each have a predetermined diameter, and
wherein each of the predetermined mask thickness, the predetermined aperture spacing and the predetermined aperture diameter are configured based on the diameter of the generated cold plasma beam.
3 . The system of claim 1 , wherein the mask is made of a plastic material.
4 . The system of claim 1 , wherein the first layer of the mask is made of at least one of polyethylene, polypropylene, polystyrene, polyester, polycarbonate, polyvinyl chloride, polysulfone, and/or polyether ether ketone.
5 . The system of claim 1 , wherein the bottom surface of the second layer includes an adhesive backing configured to enable the mask to adhere to the skin of the patient.
6 . The system of claim 1 , wherein the mask is configured to be flexible to adapt to the contours of the skin of the patient.
7 . The system of claim 1 , wherein second layer of the mask is made of a material that retains temperatures of the mask below a predetermined temperature setpoint for extended periods of time such that the skin remains cool during a particular treatment.
8 . The system of claim 7 , wherein the material is at least one of hydroxyethyl cellulose, sodium polyacrylate, and/or vinyl-coated silica gel.
9 . The system of claim 7 , wherein the temperature of the mask is lowered prior to applying the mask to the area of skin to be treated to keep the epidermal tissue of the area of skin below the predetermined temperature setpoint during treatment, the predetermined temperature setpoint being the surface temperature of the epidermal tissue of the area of skin to be treated.
10 . The system of claim 1 , wherein the mask is configured as at least one of a face mask, a sleeve, a glove, and/or a boot.
11 . The system of claim 2 , wherein the predetermined aperture spacing across a first portion of the mask is less than the predetermined aperture spacing across a second portion of the mask to adjust the amount of plasma per unit area applied to the first portion and the second portion.
12 . The system of claim 2 , wherein the predetermined diameter of each aperture across a first portion of the mask is smaller than the predetermined diameter of each aperture across a second portion of the mask to adjust the amount of plasma per unit area applied to the first portion and the second portion.
13 . The system of claim 1 , wherein the first layer of the mask is configured to enable the cold plasma beam to be applied over the top surface of the mask more than once.
14 . The system of claim 1 , wherein mask is a hand-held card-type mask configured to be held over the area of skin to be treated.
15 . The system of claim 14 , wherein the hand-held card-type mask includes a handle portion and at least a second portion, the handle portion configured to be gripped by a user and the second portion shaped to facilitate treatment of the skin around at least one body structure of the patient, the plurality of apertures disposed through the second portion.
16 . The system of claim 15 , wherein the second portion is shaped to facilitate treatment of the skin around at least one of the nose and eye of the patient.
17 . The system of claim 16 , wherein the hand-held card-type mask further includes a third portion shaped to facilitate treatment of the skin around at least one second body structure of the patient.
18 . A system for fractionated skin resurfacing comprising:
a mask including a plurality of apertures disposed through a surface, wherein the mask is made of a non-conductive material and configured to be applied to an area of skin of a patient to be treated;
a cold plasma applicator configured to apply a cold plasma beam to the surface of the mask, wherein the cold plasma beam contacts portions of the area of skin exposed by the plurality of apertures; and
a microneedling apparatus to be applied over the surface of the mask to create the plurality of apertures disposed through the surface of the mask and a second plurality of apertures disposed through the area of skin to be treated such that the plurality of apertures disposed through the surface of the mask and the second plurality of apertures disposed through the area of skin to be treated are aligned.
19 . The system of claim 18 , wherein the mask is configured as a fluid to be applied to the area of skin to be treated, the fluid configured to solidify over the area of skin to be treated after being applied such that the mask is formed.
20 . The system of claim 2 , wherein the mask is configured as a plurality of strips.
21 . The system of claim 2 , wherein the predetermined mask thickness is one tenth the diameter of the cold plasma beam, and the aperture spacing and the aperture diameter are less than ten diameters of the cold plasma beam.
22 . The system of claim 2 , wherein a lower limit of the predetermined mask thickness is based on a material of the mask.
23 . The system of claim 2 , wherein an upper limit of the predetermined aperture spacing and an upper limit of the predetermined aperture diameter is based on a tradeoff of enhanced recovery time versus achieving a desired physiological effect for the particular treatment.
24 . The system of claim 18 , wherein the mask includes a bottom surface configured to be applied to an area of skin of a patient to be treated and the bottom surface of the mask includes an adhesive backing configured to enable the mask to adhere to the skin of the patient.
25 . The system of claim 18 , wherein the microneedling apparatus further comprises a replaceable roller unit including a plurality of microneedle pins configured to create the apertures, wherein the microneedle pins are configured with a predetermined diameter and predetermined spacing between each microneedle pin.
26 . The system of claim 25 , wherein the microneedling apparatus further includes at least two different replaceable roller units, each roller unit having microneedle pins that are configured with a different predetermined diameter and different predetermined spacing from each other roller unit.
27 . The system of claim 18 , wherein the fluid is at least one of a spray and cream.