Methods and apparatuses for tuning a filter
The present application describes a method of tuning a printed device. The method includes measuring a frequency response of a target device and a device under tune (DUT). The method includes computing, based on the measured frequency response, a coupling matrix for the target device and a coupling matrix for the DUT. The method also includes extracting eigenvalues for the coupling matrix of the target device and a first set of eigenvalues for the coupling matrix of the DUT. The eigenvalues of the target device are different than the first set of eigenvalues of the DUT. The method further includes tuning the DUT with a material removal source. The method even further includes measuring a second set of eigenvalues of the DUT. The second set of eigenvalues is different from the first set of eigenvalues of the DUT. The method yet even further includes calculating a tune path for iterative convergence of the second or a subsequent set of eigenvalues of the DUT with the eigenvalues of the target device. The method still even further includes observing the iterative convergence of the DUT and the target device.
1. A method of tuning a printed device comprising:
measuring a frequency response of a target device and a device under tune (DUT);
computing, based on the measured frequency response, a coupling matrix for the target device and a coupling matrix for the DUT;
extracting eigenvalues for the coupling matrix of the target device and a first set of eigenvalues for the coupling matrix of the DUT, where the eigenvalues of the target device are different than the first set of eigenvalues of the DUT;
tuning the DUT with a material removal source;
measuring a second set of eigenvalues of the DUT, where the second set of eigenvalues is different from the first set of eigenvalues of the DUT;
calculating a tune path for iterative convergence of the second or a subsequent set of eigenvalues of the DUT with the eigenvalues of the target device; and
observing the iterative convergence of the DUT and the target device.
2. The method of claim 1 , further comprising:
extracting eigenvectors for the coupling matrix of the target device and a first set of eigenvectors for the coupling matrix of the DUT;
measuring a second set of eigenvectors of the DUT; and
calculating a tune path for iterative convergence of the second or a subsequent set of eigenvectors of the DUT with the eigenvectors of the target device.
3. The method of claim 1 , wherein the eigenvalues of the target device are based on a number of resonators of the target device plus 2.
4. The method of claim 1 , wherein the coupling matrices are representative of resonant center frequencies and resonator cross couplings.
5. The method of claim 1 , wherein the iterative convergence is exhibited in less than 5 minutes.
6. The method of claim 1 , wherein the iterative convergence is exhibited in less than about 1 minute.
7. The method of claim 1 , wherein the tuned device is employed in wireless communications devices.
8. The method of claim 1 , wherein the tuning step includes removing metal on pads of the DUT.
9. The method of claim 8 , wherein the DUT includes a recessed top pattern, and the tuning step is performed on the recessed top pattern.
10. The method of claim 1 , wherein the material removal source is a femto-second laser, and the femto-second laser emit pulses less than about 1 femto-second.
11. The method of claim 1 , wherein the DUT is a ceramic filter.
12. A system comprising:
a material removal source;
a mechanical tuning mechanism coupled to the material removal source;
a computer, coupled to the mechanical tuning mechanism and configured to operate the mechanical tuning mechanism and the material removal source, the computer including:
a non-transitory memory having instructions stored thereon for tuning a device under tune (DUT); and
a processor, operably coupled to the non-transitory memory, configured to execute the instructions including:
measuring a frequency response of a target device and the DUT;
computing a coupling matrix for the target device and a coupling matrix for the DUT;
extracting eigenvalues for the coupling matrix of the target device and a first set of eigenvalues for the coupling matrix of the DUT, where the eigenvalues of the target device are different than the first set of eigenvalues of the DUT;
positioning the material removal source to a first location of the DUT;
tuning the DUT with the material removal source;
measuring a second set of eigenvalues of the DUT; and
observing an iterative convergence of the DUT and the target device.
13. The system of claim 12 , wherein the material removal source is a femto-second laser, and the femto-second laser emit pulses less than about 1 pico-second.
14. The system of claim 12 , wherein the eigenvalues of the target filter are based on a number of resonators of the target filter plus 2.
15. The system of claim 12 , wherein the coupling matrices are representative of resonant center frequencies and resonator cross couplings.
16. The system of claim 12 , wherein the iterative convergence is exhibited in less than about 5 minutes.
17. The system of claim 16 , wherein the iterative convergence is exhibited in less than about 1 minute.
18. The system of claim 12 , wherein the DUT is a ceramic filter.
19. The system of claim 12 , wherein the tuning step includes removing metal on pads of the DUT.
20. The system of claim 12 , wherein the processor is further configured to execute the instructions of calculating a tune path for iterative convergence of the second or a subsequent set of eigenvalues of the DUT with the eigenvalues of the target device.